Kensaku NARUSHIMA

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and film forming system
- Patent number 11,984,319
- Issue date May 14, 2024
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Raw material supply apparatus and film forming apparatus
- Patent number 11,873,556
- Issue date Jan 16, 2024
- Tokyo Electron Limited
- Tomohisa Kimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow rate control method, flow rate control device, and film formin...
- Patent number 11,753,719
- Issue date Sep 12, 2023
- Tokyo Electron Limited
- Kennan Mo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming tungsten film and controller
- Patent number 11,629,404
- Issue date Apr 18, 2023
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas supply device, gas supply method and film forming method
- Patent number 11,155,923
- Issue date Oct 26, 2021
- Tokyo Electron Limited
- Katsumasa Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method
- Patent number 10,910,225
- Issue date Feb 2, 2021
- Tokyo Electron Limited
- Kensaku Narushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 10,872,814
- Issue date Dec 22, 2020
- Tokyo Electron Limited
- Kensaku Narushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas supply method and film forming method
- Patent number 10,870,919
- Issue date Dec 22, 2020
- Tokyo Electron Limited
- Katsumasa Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method
- Patent number 10,829,854
- Issue date Nov 10, 2020
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of filling recesses in substrate with tungsten
- Patent number 10,316,410
- Issue date Jun 11, 2019
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Raw material gas supply apparatus, raw material gas supply method a...
- Patent number 10,256,101
- Issue date Apr 9, 2019
- Tokyo Electron Limited
- Hironori Yagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation device
- Patent number 10,221,478
- Issue date Mar 5, 2019
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method, etching apparatus and storage medium
- Patent number 9,646,848
- Issue date May 9, 2017
- Tokyo Electron Limited
- Satoshi Toda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten film forming method
- Patent number 9,536,745
- Issue date Jan 3, 2017
- Tokyo Electron Limited
- Kensaku Narushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, storage medium and etching apparatus
- Patent number 9,390,933
- Issue date Jul 12, 2016
- Tokyo Electron Limited
- Kensaku Narushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film-forming method and film-forming apparatus
- Patent number 8,334,208
- Issue date Dec 18, 2012
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ti-based film forming method and storage medium
- Patent number 8,263,181
- Issue date Sep 11, 2012
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ti-containing film formation method and storage medium
- Patent number 8,257,790
- Issue date Sep 4, 2012
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and substrate processing apparatus
- Patent number 7,981,794
- Issue date Jul 19, 2011
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas treatment method and computer readable storage medium
- Patent number 7,906,442
- Issue date Mar 15, 2011
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming Ti film and TiN film, contact structure, compute...
- Patent number 7,737,005
- Issue date Jun 15, 2010
- Tokyo Electron Limited
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20240337022
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FORMING RUTHENIUM SILICIDE FILM ON SURFACE...
- Publication number 20230245893
- Publication date Aug 3, 2023
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND DEVICE FOR FORMING TUNGSTEN FILM, AND DEVICE FOR FORMING...
- Publication number 20230212738
- Publication date Jul 6, 2023
- Tokyo Electron Limited
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE,...
- Publication number 20230076867
- Publication date Mar 9, 2023
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20220396876
- Publication date Dec 15, 2022
- TOKYO ELECTRON LIMITED
- Takuya KAWAGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY DEVICE AND GAS SUPPLY METHOD
- Publication number 20220356581
- Publication date Nov 10, 2022
- Tokyo Electron Limited
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RAW MATERIAL SUPPLY APPARATUS AND FILM FORMING APPARATUS
- Publication number 20210324513
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Tomohisa KIMOTO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210010130
- Publication date Jan 14, 2021
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Method and Film Forming System
- Publication number 20200258747
- Publication date Aug 13, 2020
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20200098624
- Publication date Mar 26, 2020
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming Tungsten Film and Controller
- Publication number 20190292656
- Publication date Sep 26, 2019
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLOW RATE CONTROL METHOD, FLOW RATE CONTROL DEVICE, AND FILM FORMIN...
- Publication number 20190284698
- Publication date Sep 19, 2019
- TOKYO ELECTRON LIMITED
- Kennan MO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Method
- Publication number 20190164768
- Publication date May 30, 2019
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY DEVICE, GAS SUPPLY METHOD AND FILM FORMING METHOD
- Publication number 20180251894
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Katsumasa YAMAGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY DEVICE, GAS SUPPLY METHOD AND FILM FORMING METHOD
- Publication number 20180251898
- Publication date Sep 6, 2018
- TOKYO ELECTRON LIMITED
- Katsumasa Yamaguchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD
- Publication number 20180237911
- Publication date Aug 23, 2018
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Filling Recesses in Substrate with Tungsten
- Publication number 20180073141
- Publication date Mar 15, 2018
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RAW MATERIAL GAS SUPPLY APPARATUS, RAW MATERIAL GAS SUPPLY METHOD A...
- Publication number 20170092549
- Publication date Mar 30, 2017
- TOKYO ELECTRON LIMITED
- Hironori YAGI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN FILM FORMING METHOD
- Publication number 20160233099
- Publication date Aug 11, 2016
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film Formation Device
- Publication number 20160083837
- Publication date Mar 24, 2016
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD, ETCHING APPARATUS AND STORAGE MEDIUM
- Publication number 20160005621
- Publication date Jan 7, 2016
- TOKYO ELECTRON LIMITED
- Satoshi TODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD, STORAGE MEDIUM AND ETCHING APPARATUS
- Publication number 20150187593
- Publication date Jul 2, 2015
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-REA...
- Publication number 20150184294
- Publication date Jul 2, 2015
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE TREATMENT METHOD, SHOWER HEAD, PROCESSING CONTAINER, AND PR...
- Publication number 20120115400
- Publication date May 10, 2012
- TOKYO ELECTRON LIMITED
- Takashi KAKEGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING METAL NITRIDE FILM
- Publication number 20120034793
- Publication date Feb 9, 2012
- TOKYO ELECTRON LIMITED
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20110237076
- Publication date Sep 29, 2011
- TOKYO ELECTRON LIMITED
- Kensaku NARUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-REA...
- Publication number 20110159188
- Publication date Jun 30, 2011
- TOKYO ELECTRON LIMITED
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE TREATMENT METHOD, SHOWER HEAD, PROCESSING CONTAINER, AND PR...
- Publication number 20110061432
- Publication date Mar 17, 2011
- TOKYO ELECTRON LIMITED
- Takashi KAKEGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20100304561
- Publication date Dec 2, 2010
- Tokyo Electron Limited
- Kensaku Narushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND APPARATUS UTILIZING PLASMA CVD
- Publication number 20100240216
- Publication date Sep 23, 2010
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kensaku NARUSHIMA

Person

Patents Grantslast 30 patents

Substrate processing method and film forming system

Raw material supply apparatus and film forming apparatus

Flow rate control method, flow rate control device, and film formin...

Method of forming tungsten film and controller

Gas supply device, gas supply method and film forming method

Film forming method

Film forming method and film forming apparatus

Gas supply method and film forming method

Film forming method

Method of filling recesses in substrate with tungsten

Raw material gas supply apparatus, raw material gas supply method a...

Film formation device

Etching method, etching apparatus and storage medium

Tungsten film forming method

Etching method, storage medium and etching apparatus

Film-forming method and film-forming apparatus

Ti-based film forming method and storage medium

Ti-containing film formation method and storage medium

Film forming method and substrate processing apparatus

Gas treatment method and computer readable storage medium

Method for forming Ti film and TiN film, contact structure, compute...

Patents Applicationslast 30 patents

FILM FORMING APPARATUS AND FILM FORMING METHOD

METHOD AND APPARATUS FOR FORMING RUTHENIUM SILICIDE FILM ON SURFACE...

METHOD AND DEVICE FOR FORMING TUNGSTEN FILM, AND DEVICE FOR FORMING...

FILM FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE,...

SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUS

GAS SUPPLY DEVICE AND GAS SUPPLY METHOD

RAW MATERIAL SUPPLY APPARATUS AND FILM FORMING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Substrate Processing Method and Film Forming System

FILM FORMING METHOD AND FILM FORMING APPARATUS

Method of Forming Tungsten Film and Controller

FLOW RATE CONTROL METHOD, FLOW RATE CONTROL DEVICE, AND FILM FORMIN...

Film Forming Method

GAS SUPPLY DEVICE, GAS SUPPLY METHOD AND FILM FORMING METHOD

GAS SUPPLY DEVICE, GAS SUPPLY METHOD AND FILM FORMING METHOD

FILM FORMING METHOD

Method of Filling Recesses in Substrate with Tungsten

RAW MATERIAL GAS SUPPLY APPARATUS, RAW MATERIAL GAS SUPPLY METHOD A...

TUNGSTEN FILM FORMING METHOD

Film Formation Device

ETCHING METHOD, ETCHING APPARATUS AND STORAGE MEDIUM

ETCHING METHOD, STORAGE MEDIUM AND ETCHING APPARATUS

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-REA...

SURFACE TREATMENT METHOD, SHOWER HEAD, PROCESSING CONTAINER, AND PR...

METHOD FOR FORMING METAL NITRIDE FILM

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-REA...

SURFACE TREATMENT METHOD, SHOWER HEAD, PROCESSING CONTAINER, AND PR...

FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS

FILM FORMATION METHOD AND APPARATUS UTILIZING PLASMA CVD