Kensuke Demura

Person

Kanagawa-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,165,886
- Issue date Dec 10, 2024
- Shibaura Mechatronics Corporation
- Kensuke Demura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment device
- Patent number 12,138,671
- Issue date Nov 12, 2024
- Shibaura Mechatronics Corporation
- Minami Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment device
- Patent number 12,109,597
- Issue date Oct 8, 2024
- Shibaura Mechatronics Corporation
- Daisuke Matsushima
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus
- Patent number 12,097,541
- Issue date Sep 24, 2024
- Shibaura Mechatronics Corporation
- Kensuke Demura
- B08 - CLEANING
Information Patent Grant
Substrate treatment device
- Patent number 12,074,055
- Issue date Aug 27, 2024
- Shibaura Mechatronics Corporation
- Masaya Kamiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment device
- Patent number 12,005,482
- Issue date Jun 11, 2024
- Shibaura Mechatronics Corporation
- Kensuke Demura
- B08 - CLEANING
Information Patent Grant
Cooling device, substrate treatment device, cooling method, and sub...
- Patent number 11,948,812
- Issue date Apr 2, 2024
- Shibaura Mechatronics Corporation
- Kensuke Demura
- B08 - CLEANING
Information Patent Grant
Substrate treatment device
- Patent number 11,784,040
- Issue date Oct 10, 2023
- Shibaura Mechatronics Corporation
- Kensuke Demura
- B08 - CLEANING
Information Patent Grant
Reflective mask cleaning apparatus and reflective mask cleaning method
- Patent number 11,609,491
- Issue date Mar 21, 2023
- Shibaura Mechatronics Corporation
- Daisuke Matsushima
- B08 - CLEANING
Information Patent Grant
Substrate treatment device and substrate treatment method
- Patent number 11,355,337
- Issue date Jun 7, 2022
- Shibaura Mechatronics Corporation
- Masaya Kamiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Imprint template manufacturing apparatus and imprint template manuf...
- Patent number 10,773,425
- Issue date Sep 15, 2020
- Shibaura Mechatronics Corporation
- Kensuke Demura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate treatment device and substrate treatment method
- Patent number 10,734,217
- Issue date Aug 4, 2020
- Shibaura Mechatronics Corporation
- Masaya Kamiya
- B08 - CLEANING
Information Patent Grant
Imprint template treatment apparatus
- Patent number 10,668,496
- Issue date Jun 2, 2020
- Shibaura Mechatronics Corporation
- Satoshi Nakamura
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,111,313
- Issue date Oct 23, 2018
- Shibaura Mechatronics Corporation
- Takeharu Motokawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for manufacturing reflective mask and apparatus for manufact...
- Patent number 9,513,557
- Issue date Dec 6, 2016
- Shibaura Mechatronics Corporation
- Katsuhiro Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing reflective mask and apparatus for manufact...
- Patent number 8,999,612
- Issue date Apr 7, 2015
- Shibaura Mechatronics Corporation
- Katsuhiro Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240096653
- Publication date Mar 21, 2024
- SHIBAURA MECHATRONICS CORPORATION
- Kensuke DEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230271231
- Publication date Aug 31, 2023
- SHIBAURA MECHATRONICS CORPORATION
- Kensuke DEMURA
- B08 - CLEANING
Information Patent Application
SUBSTRATE TREATMENT DEVICE
- Publication number 20220310417
- Publication date Sep 29, 2022
- SHIBAURA MECHATRONICS CORPORATION
- Minami NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT DEVICE
- Publication number 20220270914
- Publication date Aug 25, 2022
- SHIBAURA MECHATRONICS CORPORATION
- Masaya KAMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20220080468
- Publication date Mar 17, 2022
- SHIBAURA MECHATRONICS CORPORATION
- Kensuke DEMURA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20220068671
- Publication date Mar 3, 2022
- SHIBAURA MECHATRONICS CORPORATION
- Kensuke DEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING DEVICE, SUBSTRATE TREATMENT DEVICE, COOLING METHOD, AND SUB...
- Publication number 20210366739
- Publication date Nov 25, 2021
- SHIBAURA MECHATRONICS CORPORATION
- Kensuke DEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT DEVICE
- Publication number 20210323036
- Publication date Oct 21, 2021
- SHIBAURA MECHATRONICS CORPORATION
- Daisuke MATSUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT DEVICE
- Publication number 20210299713
- Publication date Sep 30, 2021
- SHIBAURA MECHATRONICS CORPORATION
- Kensuke DEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT DEVICE
- Publication number 20210276055
- Publication date Sep 9, 2021
- SHIBAURA MECHATRONICS CORPORATION
- Minami NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT DEVICE
- Publication number 20210265159
- Publication date Aug 26, 2021
- SHIBAURA MECHATRONICS CORPORATION
- Kensuke DEMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD
- Publication number 20200335324
- Publication date Oct 22, 2020
- SHIBAURA MECHATRONICS CORPORATION
- Masaya Kamiya
- B08 - CLEANING
Information Patent Application
REFLECTIVE MASK CLEANING APPARATUS AND REFLECTIVE MASK CLEANING METHOD
- Publication number 20200124960
- Publication date Apr 23, 2020
- SHIBAURA MECHATRONICS CORPORATION
- Daisuke Matsushima
- B08 - CLEANING
Information Patent Application
IMPRINT TEMPLATE MANUFACTURING APPARATUS AND IMPRINT TEMPLATE MANUF...
- Publication number 20180117795
- Publication date May 3, 2018
- SHIBAURA MECHATRONICS CORPORATION
- Kensuke Demura
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT TEMPLATE MANUFACTURING APPARATUS AND IMPRINT TEMPLATE MANUF...
- Publication number 20180117796
- Publication date May 3, 2018
- SHIBAURA MECHATRONICS CORPORATION
- Kensuke Demura
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD
- Publication number 20180047559
- Publication date Feb 15, 2018
- SHIBAURA MECHATRONICS CORPORATION
- Masaya Kamiya
- B08 - CLEANING
Information Patent Application
TEMPLATE FOR IMPRINT
- Publication number 20180022016
- Publication date Jan 25, 2018
- SHIBAURA MECHATRONICS CORPORATION
- Satoshi NAKAMURA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
IMPRINT TEMPLATE MANUFACTURING APPARATUS
- Publication number 20180016673
- Publication date Jan 18, 2018
- SHIBAURA MECHATRONICS CORPORATION
- Satoshi NAKAMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPRINT TEMPLATE MANUFACTURING APPARATUS
- Publication number 20180015497
- Publication date Jan 18, 2018
- SHIBAURA MECHATRONICS CORPORATION
- Satoshi Nakamura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
REFLECTIVE MASK CLEANING APPARATUS AND REFLECTIVE MASK CLEANING METHOD
- Publication number 20170017151
- Publication date Jan 19, 2017
- SHIBAURA MECHATRONICS CORPORATION
- Daisuke Matsushima
- B08 - CLEANING
Information Patent Application
Mounting Stage and Plasma Processing Apparatus
- Publication number 20150380219
- Publication date Dec 31, 2015
- SHIBAURA MECHATRONICS CORPORATION
- Kensuke Demura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...
- Publication number 20150177624
- Publication date Jun 25, 2015
- SHIBAURA MECHATRONICS CORPORATION
- Katsuhiro Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130256270
- Publication date Oct 3, 2013
- Kabushiki Kaisha Toshiba
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...
- Publication number 20130260292
- Publication date Oct 3, 2013
- Katsuhiro Yamazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kensuke Demura

Person

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Substrate treatment device

Substrate treatment device

Substrate processing apparatus

Substrate treatment device

Substrate treatment device

Cooling device, substrate treatment device, cooling method, and sub...

Substrate treatment device

Reflective mask cleaning apparatus and reflective mask cleaning method

Substrate treatment device and substrate treatment method

Imprint template manufacturing apparatus and imprint template manuf...

Substrate treatment device and substrate treatment method

Imprint template treatment apparatus

Plasma processing apparatus and plasma processing method

Method for manufacturing reflective mask and apparatus for manufact...

Method for manufacturing reflective mask and apparatus for manufact...

Patents Applicationslast 30 patents

SUBSTRATE TREATMENT APPARATUS AND METHOD FOR TREATING SUBSTRATE

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE TREATMENT DEVICE

SUBSTRATE TREATMENT DEVICE

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

COOLING DEVICE, SUBSTRATE TREATMENT DEVICE, COOLING METHOD, AND SUB...

SUBSTRATE TREATMENT DEVICE

SUBSTRATE TREATMENT DEVICE

SUBSTRATE TREATMENT DEVICE

SUBSTRATE TREATMENT DEVICE

SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD

REFLECTIVE MASK CLEANING APPARATUS AND REFLECTIVE MASK CLEANING METHOD

IMPRINT TEMPLATE MANUFACTURING APPARATUS AND IMPRINT TEMPLATE MANUF...

IMPRINT TEMPLATE MANUFACTURING APPARATUS AND IMPRINT TEMPLATE MANUF...

SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD

TEMPLATE FOR IMPRINT

IMPRINT TEMPLATE MANUFACTURING APPARATUS

IMPRINT TEMPLATE MANUFACTURING APPARATUS

REFLECTIVE MASK CLEANING APPARATUS AND REFLECTIVE MASK CLEANING METHOD

Mounting Stage and Plasma Processing Apparatus

METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR MANUFACTURING REFLECTIVE MASK AND APPARATUS FOR MANUFACT...