Kensuke Saisyo

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Kawasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 7,972,762
- Issue date Jul 5, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Muroi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of producing positive resist composition, positive resist co...
- Patent number 7,879,527
- Issue date Feb 1, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Muroi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Copolymer for semiconductor lithography and process for production...
- Patent number 7,695,889
- Issue date Apr 13, 2010
- Maruzen Petrochemical Co., LTD
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20090233220
- Publication date Sep 17, 2009
- Masaaki Muroi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF PRODUCING POSITIVE RESIST COMPOSITION, POSITIVE RESIST CO...
- Publication number 20090092924
- Publication date Apr 9, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Masaaki Muroi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Copolymer for semiconductor lithography and process for production...
- Publication number 20060257784
- Publication date Nov 16, 2006
- Takanori Yamagishi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...