Kenta Furusawa

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for processing silicon wafer
- Patent number 9,040,431
- Issue date May 26, 2015
- Canon Kabushiki Kaisha
- Hirohisa Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing liquid-discharge-head substrate
- Patent number 8,951,815
- Issue date Feb 10, 2015
- Canon Kabushiki Kaisha
- Ryotaro Murakami
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Processing method for an ink jet head substrate
- Patent number 8,858,812
- Issue date Oct 14, 2014
- Canon Kabushiki Kaisha
- Kenta Furusawa
- B44 - DECORATIVE ARTS
Information Patent Grant
Method of producing substrate for liquid ejection head
- Patent number 8,771,531
- Issue date Jul 8, 2014
- Canon Kabushiki Kaisha
- Kenta Furusawa
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Liquid composition, method of producing silicon substrate, and meth...
- Patent number 8,492,281
- Issue date Jul 23, 2013
- Canon Kabushiki Kaisha
- Hiroyuki Abo
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Method of manufacturing liquid discharge head
- Patent number 8,429,820
- Issue date Apr 30, 2013
- Canon Kabushiki Kaisha
- Shuji Koyama
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING CHAMBER AND METHOD OF MANUFACTURING SUBSTRATE
- Publication number 20150325460
- Publication date Nov 12, 2015
- Canon Kabushiki Kaisha
- Kenta Furusawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING SILICON WAFER
- Publication number 20140004629
- Publication date Jan 2, 2014
- Hirohisa Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING INKJET HEAD SUBSTRATE
- Publication number 20130316473
- Publication date Nov 28, 2013
- Canon Kabushiki Kaisha
- Taichi Yonemoto
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PROCESSING METHOD FOR AN INK JET HEAD SUBSTRATE
- Publication number 20130161286
- Publication date Jun 27, 2013
- Canon Kabushiki Kaisha
- Kenta Furusawa
- B44 - DECORATIVE ARTS
Information Patent Application
METHOD FOR PRODUCING LIQUID-DISCHARGE-HEAD SUBSTRATE
- Publication number 20120329181
- Publication date Dec 27, 2012
- Canon Kabushiki Kaisha
- Ryotaro Murakami
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LIQUID COMPOSITION, METHOD OF PRODUCING SILICON SUBSTRATE, AND METH...
- Publication number 20120289055
- Publication date Nov 15, 2012
- Canon Kabushiki Kaisha
- Hiroyuki Abo
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
METHOD OF PRODUCING SUBSTRATE FOR LIQUID EJECTION HEAD
- Publication number 20120267342
- Publication date Oct 25, 2012
- Canon Kabushiki Kaisha
- Kenta Furusawa
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD
- Publication number 20120047738
- Publication date Mar 1, 2012
- Canon Kabushiki Kaisha
- Shuji Koyama
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
LIQUID COMPOSITION, METHOD OF PRODUCING SILICON SUBSTRATE, AND METH...
- Publication number 20110183448
- Publication date Jul 28, 2011
- Canon Kabushiki Kaisha
- Hiroyuki Abo
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Kenta Furusawa

Person

Patents Grantslast 30 patents

Method for processing silicon wafer

Method for producing liquid-discharge-head substrate

Processing method for an ink jet head substrate

Method of producing substrate for liquid ejection head

Liquid composition, method of producing silicon substrate, and meth...

Method of manufacturing liquid discharge head

Patents Applicationslast 30 patents

ETCHING CHAMBER AND METHOD OF MANUFACTURING SUBSTRATE

METHOD FOR PROCESSING SILICON WAFER

METHOD OF PROCESSING INKJET HEAD SUBSTRATE

PROCESSING METHOD FOR AN INK JET HEAD SUBSTRATE

METHOD FOR PRODUCING LIQUID-DISCHARGE-HEAD SUBSTRATE

LIQUID COMPOSITION, METHOD OF PRODUCING SILICON SUBSTRATE, AND METH...

METHOD OF PRODUCING SUBSTRATE FOR LIQUID EJECTION HEAD

METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD

LIQUID COMPOSITION, METHOD OF PRODUCING SILICON SUBSTRATE, AND METH...