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Tokyo, JP
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last 30 patents
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Patent Grant
TiO2-containing silica glass for optical member for EUV lithography
Patent number
8,039,409
Issue date
Oct 18, 2011
Asahi Glass Company, Limited
Kenta Saitou
Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Patents Applications
last 30 patents
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Patent Application
TIO2-CONTAINING SILICA GLASS FOR OPTICAL MEMBER FOR EUV LITHOGRAPHY
Publication number
20110028299
Publication date
Feb 3, 2011
ASAHI GLASS COMPANY, LIMITED
Kenta SAITOU
Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...