Kenta Yasuda

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Miyagi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,170,284
- Issue date Jan 1, 2019
- Tokyo Electron Limited
- Kenta Yasuda
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Substrate cleaning apparatus and vacuum processing system
- Patent number 9,214,364
- Issue date Dec 15, 2015
- Tokyo Electron Limited
- Kazuya Dobashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 9,209,034
- Issue date Dec 8, 2015
- Tokyo Electron Limited
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20170004956
- Publication date Jan 5, 2017
- TOKYO ELECTRON LIMITED
- Kenta YASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20150024603
- Publication date Jan 22, 2015
- TOKYO ELECTRON LIMITED
- Akinori Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND VACUUM PROCESSING SYSTEM
- Publication number 20120247670
- Publication date Oct 4, 2012
- IWATANI CORPORATION
- Kazuya DOBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...