Kentaro Harada

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Ibaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Ruthenium sputtering target and ruthenium alloy sputtering target
- Patent number 10,943,773
- Issue date Mar 9, 2021
- JX Nippon Mining & Metals Corporation
- Kentaro Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ruthenium sputtering target and ruthenium alloy sputtering target
- Patent number 10,319,571
- Issue date Jun 11, 2019
- JX Nippon Mining & Metals Corporation
- Kentaro Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Ruthenium Sputtering Target and Ruthenium Alloy Sputtering Target
- Publication number 20190259589
- Publication date Aug 22, 2019
- JX NIPPON MINING & METALS CORPORATION
- Kentaro Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ruthenium Sputtering Target and Ruthenium Alloy Sputtering Target
- Publication number 20150129422
- Publication date May 14, 2015
- JX NIPPON MINING & METALS CORPORATION
- Kentaro Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fe-Al Based Alloy Sputtering Target
- Publication number 20140166481
- Publication date Jun 19, 2014
- JX NIPPON MINING & METALS CORPORATION
- Kentaro Harada
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...