Kentarou Gotou

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 11,681,222
- Issue date Jun 20, 2023
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 11,036,133
- Issue date Jun 15, 2021
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 10,620,534
- Issue date Apr 14, 2020
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 10,082,733
- Issue date Sep 25, 2018
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 9,500,950
- Issue date Nov 22, 2016
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 9,213,236
- Issue date Dec 15, 2015
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive-tone radiation-sensitive resin composition
- Patent number 7,335,457
- Issue date Feb 26, 2008
- JSR Corporation
- Daisuke Shimizu
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20220137508
- Publication date May 5, 2022
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20210278764
- Publication date Sep 9, 2021
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20200124961
- Publication date Apr 23, 2020
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20190278175
- Publication date Sep 12, 2019
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20190025695
- Publication date Jan 24, 2019
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20170199453
- Publication date Jul 13, 2017
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20160062237
- Publication date Mar 3, 2016
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-tone radiation-sensitive resin composition
- Publication number 20060078821
- Publication date Apr 13, 2006
- Daisuke Shimizu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Kentarou Gotou

Person

Patents Grantslast 30 patents

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Positive-tone radiation-sensitive resin composition

Patents Applicationslast 30 patents

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

Positive-tone radiation-sensitive resin composition