Kentarou HARADA

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Tokyo, JP

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Patents Grantslast 30 patents

Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 8,697,343
- Issue date Apr 15, 2014
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive type radiation-sensitive resin composition
- Patent number 7,488,566
- Issue date Feb 10, 2009
- JSR Corporation
- Takayuki Tsuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20140162190
- Publication date Jun 12, 2014
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION SENSITIVE RESIN COMPOSITION AND POLYMER
- Publication number 20100255420
- Publication date Oct 7, 2010
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20090202945
- Publication date Aug 13, 2009
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Positive type radiation-sensitive resin composition
- Publication number 20060223010
- Publication date Oct 5, 2006
- Takayuki Tsuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY