Kerry L. Spurgin

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Hillsboro, OR, US

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Patents Grantslast 30 patents

Information Patent Grant
Atomic layer deposited tantalum containing adhesion layer
- Patent number 7,605,469
- Issue date Oct 20, 2009
- Intel Corporation
- Steven W. Johnston
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposited tantalum containing adhesion layer
- Patent number 7,601,637
- Issue date Oct 13, 2009
- Intel Corporation
- Steven W. Johnston
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench isolation process using nitrogen preconditioning to reduce c...
- Patent number 6,118,168
- Issue date Sep 12, 2000
- Intel Corporation
- Peter K. Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench isolation process using nitrogen preconditioning to reduce c...
- Patent number 5,985,735
- Issue date Nov 16, 1999
- Intel Corporation
- Peter K. Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench isolation with planar topography and method of fabrication
- Patent number 5,358,891
- Issue date Oct 25, 1994
- Intel Corporation
- Chi-Hwa Tsang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Atomic layer deposited tantalum containing adhesion layer
- Publication number 20090155998
- Publication date Jun 18, 2009
- Steven W. Johnston
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic layer deposited tantalum containing adhesion layer
- Publication number 20060003581
- Publication date Jan 5, 2006
- Steven W. Johnston
- H01 - BASIC ELECTRIC ELEMENTS