Kerstin HILD

Person

Schwaebisch Gmuend, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Mirror, in particular for a microlithographic projection exposure s...
- Patent number 11,366,395
- Issue date Jun 21, 2022
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure s...
- Patent number 11,360,393
- Issue date Jun 14, 2022
- Carl Zeiss SMT GmbH
- Ben Wylie-Van Eerd
- G02 - OPTICS
Information Patent Grant
Method for treating a reflective optical element for the EUV wavele...
- Patent number 11,328,831
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Christian Grasse
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror for a microlithographic projection exposure apparatus, and m...
- Patent number 11,187,990
- Issue date Nov 30, 2021
- Carl Zeiss SMT GmbH
- Johannes Lippert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical arrangement for EUV radiation with a shield for protection...
- Patent number 11,137,687
- Issue date Oct 5, 2021
- Carl Zeiss SMT GmbH
- Bjoern Liebaug
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element, and method for correcting the wavefront effect of...
- Patent number 11,029,515
- Issue date Jun 8, 2021
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G02 - OPTICS
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 10,908,509
- Issue date Feb 2, 2021
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, and method
- Patent number 10,852,643
- Issue date Dec 1, 2020
- Carl Zeiss SMT GmbH
- Dirk Juergens
- G02 - OPTICS
Information Patent Grant
Mirror arrangement for lithography exposure apparatus and optical s...
- Patent number 10,684,466
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Wouter Bernardus Johannes Hakvoort
- G02 - OPTICS
Information Patent Grant
Mirror, in particular for a microlithographic projection exposure a...
- Patent number 10,331,048
- Issue date Jun 25, 2019
- Carl Zeiss SMT GmbH
- Oliver Dier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing an optical element for an optical system, in p...
- Patent number 10,146,138
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Kerstin Hild
- G02 - OPTICS
Information Patent Grant
Mirror, more particularly for a microlithographic projection exposu...
- Patent number 9,785,054
- Issue date Oct 10, 2017
- Carl Zeiss SMT GmbH
- Toralf Gruner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF PRODUCING AN OPTICAL ELEMENT FOR A LITHOGRAPHY APPARATUS
- Publication number 20240025003
- Publication date Jan 25, 2024
- Carl Zeiss SMT GMBH
- Conrad Wolke
- B24 - GRINDING POLISHING
Information Patent Application
A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE
- Publication number 20230142187
- Publication date May 11, 2023
- Carl Zeiss SMT GMBH
- Johannes Lippert
- G02 - OPTICS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20230122333
- Publication date Apr 20, 2023
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR MICROLITHOGRAPHY
- Publication number 20230088791
- Publication date Mar 23, 2023
- Carl Zeiss SMT GMBH
- Jan HORN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MIRROR ASSEMBLY HAVING A HYDROGEN BARRIER AND OPTICAL ASSEMBLY
- Publication number 20220206401
- Publication date Jun 30, 2022
- Carl Zeiss SMT GMBH
- Alexandra PAZIDIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ASSEMBLY AND OPTICAL ASSEMBLY COMPRISING SAME
- Publication number 20220187516
- Publication date Jun 16, 2022
- Carl Zeiss SMT GMBH
- Alexandra PAZIDIS
- G02 - OPTICS
Information Patent Application
MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND M...
- Publication number 20210149310
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...
- Publication number 20210055662
- Publication date Feb 25, 2021
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL ELEMENT, AND METHOD FOR CORRECTING THE WAVEFRONT EFFECT OF...
- Publication number 20200393673
- Publication date Dec 17, 2020
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...
- Publication number 20200174379
- Publication date Jun 4, 2020
- Carl Zeiss SMT GMBH
- Ben WYLIE-VAN EERD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ARRANGEMENT FOR EUV RADIATION WITH A SHIELD FOR PROTECTION...
- Publication number 20200166847
- Publication date May 28, 2020
- Carl Zeiss SMT GMBH
- Bjoern LIEBAUG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, AND METHOD
- Publication number 20200073252
- Publication date Mar 5, 2020
- Carl Zeiss SMT GMBH
- Dirk Juergens
- G02 - OPTICS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20200026195
- Publication date Jan 23, 2020
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...
- Publication number 20190035512
- Publication date Jan 31, 2019
- Carl Zeiss SMT GMBH
- Christian Grasse
- G02 - OPTICS
Information Patent Application
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...
- Publication number 20180217507
- Publication date Aug 2, 2018
- Carl Zeiss SMT GMBH
- Oliver DIER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MIRROR ARRANGEMENT FOR LITHOGRAPHY EXPOSURE APPARATUS AND OPTICAL S...
- Publication number 20180164581
- Publication date Jun 14, 2018
- Carl Zeiss SMT GMBH
- Wouter Bernardus Johannes HAKVOORT
- G02 - OPTICS
Information Patent Application
Method For Producing An Optical Element For An Optical System, In P...
- Publication number 20170315452
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Kerstin HILD
- G02 - OPTICS
Information Patent Application
MIRROR, MORE PARTICULARLY FOR A MICROLITHOGRAPHIC PROJECTION EXPOSU...
- Publication number 20160209751
- Publication date Jul 21, 2016
- Carl Zeiss SMT GMBH
- Toralf GRUNER
- G02 - OPTICS

Kerstin HILD

Person

Patents Grantslast 30 patents

Mirror, in particular for a microlithographic projection exposure s...

Mirror, in particular for a microlithographic projection exposure s...

Method for treating a reflective optical element for the EUV wavele...

Mirror for a microlithographic projection exposure apparatus, and m...

Optical arrangement for EUV radiation with a shield for protection...

Optical element, and method for correcting the wavefront effect of...

Mirror, in particular for a microlithographic projection exposure a...

Optical system, and method

Mirror arrangement for lithography exposure apparatus and optical s...

Mirror, in particular for a microlithographic projection exposure a...

Method for producing an optical element for an optical system, in p...

Mirror, more particularly for a microlithographic projection exposu...

Patents Applicationslast 30 patents

METHOD OF PRODUCING AN OPTICAL ELEMENT FOR A LITHOGRAPHY APPARATUS

A PROJECTION OBJECTIVE INCLUDING AN OPTICAL DEVICE

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

MIRROR, IN PARTICULAR FOR MICROLITHOGRAPHY

MIRROR ASSEMBLY HAVING A HYDROGEN BARRIER AND OPTICAL ASSEMBLY

MIRROR ASSEMBLY AND OPTICAL ASSEMBLY COMPRISING SAME

MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND M...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...

OPTICAL ELEMENT, AND METHOD FOR CORRECTING THE WAVEFRONT EFFECT OF...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE S...

OPTICAL ARRANGEMENT FOR EUV RADIATION WITH A SHIELD FOR PROTECTION...

OPTICAL SYSTEM, AND METHOD

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

METHOD FOR TREATING A REFLECTIVE OPTICAL ELEMENT FOR THE EUV WAVELE...

MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE A...

MIRROR ARRANGEMENT FOR LITHOGRAPHY EXPOSURE APPARATUS AND OPTICAL S...

Method For Producing An Optical Element For An Optical System, In P...

MIRROR, MORE PARTICULARLY FOR A MICROLITHOGRAPHIC PROJECTION EXPOSU...