Kerstin Seibold

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Dresden, DE

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Patents Grantslast 30 patents

Information Patent Grant
Process for modifying resist structures and resist films from the a...
- Patent number 6,899,997
- Issue date May 31, 2005
- Infineon Technologies AG
- Siew Siew Yip
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer material having a low glass transition temperature for use...
- Patent number 6,890,699
- Issue date May 10, 2005
- Infineon Technologies AG
- Kerstin Seibold
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Process for modifying resist structures and resist films from the a...
- Publication number 20030211422
- Publication date Nov 13, 2003
- Siew Siew Yip
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Polymer material having a low glass transition temperature for use...
- Publication number 20030162411
- Publication date Aug 28, 2003
- Kerstin Seibold
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY