Keun Kyu Kong

Person

Seoul, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor integrated circuit device with a surface and method o...
- Patent number 9,947,546
- Issue date Apr 17, 2018
- SK hynix Inc.
- Jae Hee Sim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor of semiconductor device and method for fabricating the same
- Patent number 7,749,895
- Issue date Jul 6, 2010
- Hynix Semiconductor, Inc
- Keun Kyu Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming fine patterns of a semiconductor device
- Patent number 7,674,708
- Issue date Mar 9, 2010
- Hynix Semiconductor Inc.
- Keun Kyu Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating capacitor of semiconductor memory device usi...
- Patent number 7,582,525
- Issue date Sep 1, 2009
- Hynix Semiconductor Inc.
- Keun-Kyu Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning solution for removing photoresist
- Patent number 7,563,753
- Issue date Jul 21, 2009
- Hynix Semiconductor Inc.
- Geun Su Lee
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method for forming fine pattern in semiconductor device
- Patent number 7,510,973
- Issue date Mar 31, 2009
- Hynix Semiconductor Inc.
- Keun Kyu Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a pattern on a semiconductor device and semicond...
- Patent number 7,510,979
- Issue date Mar 31, 2009
- Hynix Semiconductor Inc.
- Jae-chang Jung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Process for forming a fine pattern using a top-coating composition...
- Patent number 7,329,477
- Issue date Feb 12, 2008
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light absorbent agent polymer useful for organic anti-reflective co...
- Patent number 7,285,370
- Issue date Oct 23, 2007
- Hynix Semiconductor Inc.
- Jae Chang Jung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Cross-linking monomers for photoresist, and process for preparing p...
- Patent number 7,208,260
- Issue date Apr 24, 2007
- Hynix Semiconductor Inc.
- Jae Chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Light absorbent agent polymer useful for organic anti-reflective co...
- Patent number 7,186,496
- Issue date Mar 6, 2007
- Hynix Semiconductor Inc.
- Jae Chang Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Light absorbent agent polymer useful for organic anti-reflective co...
- Patent number 7,160,668
- Issue date Jan 9, 2007
- Hynix Semiconductor Inc.
- Jae-chang Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Light absorbent agent polymer for organic anti-reflective coating a...
- Patent number 7,033,729
- Issue date Apr 25, 2006
- Hynix Semiconductor Inc.
- Jae-chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Top-coating composition for photoresist and process for forming fin...
- Patent number 6,984,482
- Issue date Jan 10, 2006
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern width slimming-inhibiting method of photoresist pattern usi...
- Patent number 6,787,285
- Issue date Sep 7, 2004
- Hynix Semiconductor Inc.
- Keun Kyu Kong
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Organic polymer for organic anti-reflective coating layer and prepa...
- Patent number 6,770,720
- Issue date Aug 3, 2004
- Hyundai Electronics Industries Co., Ltd.
- Jae-chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Over-coating composition for photoresist, and processes for forming...
- Patent number 6,764,806
- Issue date Jul 20, 2004
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of inhibiting pattern collapse using a relacs material
- Patent number 6,703,323
- Issue date Mar 9, 2004
- Hynix Semiconductor Inc.
- Keun Kyu Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming photoresist pattern by using gas phase amine tr...
- Patent number 6,664,031
- Issue date Dec 16, 2003
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic polymer for organic anti-reflective coating layer and prepa...
- Patent number 6,593,446
- Issue date Jul 15, 2003
- Hyundai Electronics Industries Co., Ltd.
- Jae-Chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Additives for improving post exposure delay stability of photoresist
- Patent number 6,514,665
- Issue date Feb 4, 2003
- Hyundai Electronics Co., Ltd.
- Jae Chang Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist cross-linker and photoresist composition comprising the...
- Patent number 6,482,565
- Issue date Nov 19, 2002
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist monomers having stability to post exposure delay, polym...
- Patent number 6,455,225
- Issue date Sep 24, 2002
- Hyundai Electronics Industries Co., Ltd.
- Keun Kyu Kong
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist cross-linker and photoresist composition comprising the...
- Patent number 6,399,792
- Issue date Jun 4, 2002
- Hyundai Electronics Industries Co., Ltd.
- Keun Kyu Kong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition containing photo base generator with photo...
- Patent number 6,395,451
- Issue date May 28, 2002
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist cross-linker and photoresist composition comprising the...
- Patent number 6,368,773
- Issue date Apr 9, 2002
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist cross-linker and photoresist composition comprising the...
- Patent number 6,322,948
- Issue date Nov 27, 2001
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist cross-linker and photoresist composition comprising the...
- Patent number 6,312,868
- Issue date Nov 6, 2001
- Hyundai Electronics Industries Co., Ltd.
- Keun Kyu Kong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomers for photoresist, polymers thereof, and photoresist composi...
- Patent number 6,291,131
- Issue date Sep 18, 2001
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Maleimide or alicyclic olefin-based monomers, copolymer resin of th...
- Patent number 6,165,672
- Issue date Dec 26, 2000
- Hyundai Electronics Industries Co., Ltd.
- Jae Chang Jung
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR COATING PHOTORESIST PATTERN AND METHOD FOR FORMING...
- Publication number 20180120707
- Publication date May 3, 2018
- SK hynix Inc.
- Sung Jae LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE WITH A SURFACE AND METHOD O...
- Publication number 20170207098
- Publication date Jul 20, 2017
- SK HYNIX INC.
- Jae Hee SIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR COATING PHOTORESIST PATTERN AND METHOD FOR FORMING...
- Publication number 20170102619
- Publication date Apr 13, 2017
- SK HYNIX INC.
- Sung Jae LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR COATING PHOTORESIST PATTERN AND METHOD FOR FORMING...
- Publication number 20170032960
- Publication date Feb 2, 2017
- SK HYNIX INC.
- Sung Jae Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20080200024
- Publication date Aug 21, 2008
- Hynix Semiconductor Inc.
- Keun Kyu KONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid Composition for Immersion Lithography and Lithography Method...
- Publication number 20080176047
- Publication date Jul 24, 2008
- Hynix Semiconductor Inc.
- Keun Kyu Kong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming fine pattern in semiconductor device
- Publication number 20080160772
- Publication date Jul 3, 2008
- Hynix Semiconductor Inc.
- Keun Kyu Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A PATTERN ON A SEMICONDUCTOR DEVICE AND SEMICOND...
- Publication number 20080020592
- Publication date Jan 24, 2008
- Hynix Semiconductor Inc.
- Jae-chang Jung
- G02 - OPTICS
Information Patent Application
METHOD FOR FORMING FINE PATTERNS OF A SEMICONDUCTOR DEVICE
- Publication number 20080009137
- Publication date Jan 10, 2008
- Hynix Semiconductor Inc.
- Keun Kyu KONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIGHT ABSORBENT AGENT POLYMER USEFUL FOR ORGANIC ANTI-REFLECTIVE CO...
- Publication number 20070265406
- Publication date Nov 15, 2007
- Hynix Semiconductor Inc.
- Jae-chang Jung
- G02 - OPTICS
Information Patent Application
Method for fabricating capacitor of semiconductor memory device usi...
- Publication number 20060141736
- Publication date Jun 29, 2006
- Hynix Semiconductor Inc.
- Keun-Kyu Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Light absorbent agent polymer useful for organic anti-reflective co...
- Publication number 20060004161
- Publication date Jan 5, 2006
- Hynix Semiconductor Inc.
- Jae-chang Jung
- G02 - OPTICS
Information Patent Application
Liquid composition for immersion lithography and lithography method...
- Publication number 20050260528
- Publication date Nov 24, 2005
- Hynix Semiconductor Inc.
- Keun Kyu Kong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Light absorbent agent polymer useful for organic anti-reflective co...
- Publication number 20050130061
- Publication date Jun 16, 2005
- Hynix Semiconductor Inc.
- Jae-Chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Light absorbent agent polymer useful for organic anti-reflective co...
- Publication number 20050085078
- Publication date Apr 21, 2005
- Hynix Semiconductor Inc.
- Jae Chang Jung
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Light absorbent agent polymer useful for organic anti-reflective co...
- Publication number 20050084798
- Publication date Apr 21, 2005
- Hynix Semiconductor Inc.
- Jae-chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for forming a fine pattern using a top-coating composition...
- Publication number 20050069816
- Publication date Mar 31, 2005
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of inhibiting pattern collapse using a relacs material
- Publication number 20030143489
- Publication date Jul 31, 2003
- Keun Kyu Kong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cleaning solution for removing photoresist
- Publication number 20030130148
- Publication date Jul 10, 2003
- Geun Su Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Top-coating composition for photoresist and process for forming fin...
- Publication number 20030108815
- Publication date Jun 12, 2003
- Hynix Semiconductor Inc.
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Organic polymer for organic anti-reflective coating layer and prepa...
- Publication number 20030100695
- Publication date May 29, 2003
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Jae-chang Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Cross-linking monomers for photoresist, and process for preparing p...
- Publication number 20020177069
- Publication date Nov 28, 2002
- HYUNDAI ELECTRONICS INDUSTRIES CO., LTD.
- Jae Chang Jung
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Pattern width slimming-inhibiting method of photoresist pattern usi...
- Publication number 20020081504
- Publication date Jun 27, 2002
- Keun Kyu Kong
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Novel photoresist cross-linker and photoresist composition comprisi...
- Publication number 20020019560
- Publication date Feb 14, 2002
- Keun Kyu Kong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for forming photoresist pattern by using gas phase amine tr...
- Publication number 20010053590
- Publication date Dec 20, 2001
- Jae Chang Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Over-coating composition for photoresist, and processes for forming...
- Publication number 20010003030
- Publication date Jun 7, 2001
- Jae Chang Jung
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Keun Kyu Kong

Person

Patents Grantslast 30 patents

Semiconductor integrated circuit device with a surface and method o...

Capacitor of semiconductor device and method for fabricating the same

Method for forming fine patterns of a semiconductor device

Method for fabricating capacitor of semiconductor memory device usi...

Cleaning solution for removing photoresist

Method for forming fine pattern in semiconductor device

Method for forming a pattern on a semiconductor device and semicond...

Process for forming a fine pattern using a top-coating composition...

Light absorbent agent polymer useful for organic anti-reflective co...

Cross-linking monomers for photoresist, and process for preparing p...

Light absorbent agent polymer useful for organic anti-reflective co...

Light absorbent agent polymer useful for organic anti-reflective co...

Light absorbent agent polymer for organic anti-reflective coating a...

Top-coating composition for photoresist and process for forming fin...

Pattern width slimming-inhibiting method of photoresist pattern usi...

Organic polymer for organic anti-reflective coating layer and prepa...

Over-coating composition for photoresist, and processes for forming...

Method of inhibiting pattern collapse using a relacs material

Process for forming photoresist pattern by using gas phase amine tr...

Organic polymer for organic anti-reflective coating layer and prepa...

Additives for improving post exposure delay stability of photoresist

Photoresist cross-linker and photoresist composition comprising the...

Photoresist monomers having stability to post exposure delay, polym...

Photoresist cross-linker and photoresist composition comprising the...

Photoresist composition containing photo base generator with photo...

Photoresist cross-linker and photoresist composition comprising the...

Photoresist cross-linker and photoresist composition comprising the...

Photoresist cross-linker and photoresist composition comprising the...

Monomers for photoresist, polymers thereof, and photoresist composi...

Maleimide or alicyclic olefin-based monomers, copolymer resin of th...

Patents Applicationslast 30 patents

COMPOSITION FOR COATING PHOTORESIST PATTERN AND METHOD FOR FORMING...

SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE WITH A SURFACE AND METHOD O...

COMPOSITION FOR COATING PHOTORESIST PATTERN AND METHOD FOR FORMING...

COMPOSITION FOR COATING PHOTORESIST PATTERN AND METHOD FOR FORMING...

Semiconductor device and method for fabricating the same

Liquid Composition for Immersion Lithography and Lithography Method...

Method for forming fine pattern in semiconductor device

METHOD FOR FORMING A PATTERN ON A SEMICONDUCTOR DEVICE AND SEMICOND...

METHOD FOR FORMING FINE PATTERNS OF A SEMICONDUCTOR DEVICE

LIGHT ABSORBENT AGENT POLYMER USEFUL FOR ORGANIC ANTI-REFLECTIVE CO...

Method for fabricating capacitor of semiconductor memory device usi...

Light absorbent agent polymer useful for organic anti-reflective co...

Liquid composition for immersion lithography and lithography method...

Light absorbent agent polymer useful for organic anti-reflective co...

Light absorbent agent polymer useful for organic anti-reflective co...

Light absorbent agent polymer useful for organic anti-reflective co...

Process for forming a fine pattern using a top-coating composition...

Method of inhibiting pattern collapse using a relacs material

Cleaning solution for removing photoresist

Top-coating composition for photoresist and process for forming fin...

Organic polymer for organic anti-reflective coating layer and prepa...

Cross-linking monomers for photoresist, and process for preparing p...

Pattern width slimming-inhibiting method of photoresist pattern usi...

Novel photoresist cross-linker and photoresist composition comprisi...

Process for forming photoresist pattern by using gas phase amine tr...

Over-coating composition for photoresist, and processes for forming...