Kevin Anglin

Person

Somerville, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate halo arrangement for improved process uniformity
- Patent number 12,106,943
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature controlled/electrically biased wafer surround
- Patent number 11,664,193
- Issue date May 30, 2023
- Applied Materials, Inc.
- Kevin R. Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone platen temperature control
- Patent number 11,646,213
- Issue date May 9, 2023
- Applied Materials, Inc.
- Kevin R. Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques and apparatus for unidirectional hole elongation using a...
- Patent number 11,640,909
- Issue date May 2, 2023
- Applied Materials, Inc.
- Kevin Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,495,434
- Issue date Nov 8, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Techniques and apparatus for elongation patterning using angled ion...
- Patent number 11,127,593
- Issue date Sep 21, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin R. Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for selective deposition using angled ions
- Patent number 11,053,580
- Issue date Jul 6, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 11,037,758
- Issue date Jun 15, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
Techniques, system and apparatus for selective deposition of a laye...
- Patent number 10,879,055
- Issue date Dec 29, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Christopher Hatem
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Workpiece processing technique
- Patent number 10,847,372
- Issue date Nov 24, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ beam profile metrology
- Patent number 10,665,421
- Issue date May 26, 2020
- Applied Materials, Inc.
- Tsung-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for processing a polycrystalline layer using an angled i...
- Patent number 10,553,448
- Issue date Feb 4, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Tristan Y. Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ plasma cleaning of process chamber components
- Patent number 10,522,330
- Issue date Dec 31, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Grant
RF clean system for electrostatic elements
- Patent number 10,410,844
- Issue date Sep 10, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Critical dimensions variance compensation
- Patent number 10,269,663
- Issue date Apr 23, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three dimensional structure fabrication control using novel process...
- Patent number 10,222,202
- Issue date Mar 5, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sputter etch material selectivity
- Patent number 10,002,764
- Issue date Jun 19, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic heating method and system for wafer processing
- Patent number 9,287,148
- Issue date Mar 15, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Multi-Zone Platen Temperature Control
- Publication number 20230238264
- Publication date Jul 27, 2023
- Applied Materials, Inc.
- Kevin R. Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND APPARATUS FOR UNIDIRECTIONAL HOLE ELONGATION USING A...
- Publication number 20230223269
- Publication date Jul 13, 2023
- Applied Materials, Inc.
- Kevin Anglin
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
COMPACT LOW ANGLE ION BEAM EXTRACTION ASSEMBLY AND PROCESSING APPAR...
- Publication number 20230124509
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY
- Publication number 20220384156
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature Controlled/Electrically Biased Wafer Surround
- Publication number 20220246397
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Kevin R. Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES AND APPARATUS FOR ELONGATION PATTERNING USING ANGLED ION...
- Publication number 20210375626
- Publication date Dec 2, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin R. Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Zone Platen Temperature Control
- Publication number 20210343550
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Kevin R. Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS
- Publication number 20210013001
- Publication date Jan 14, 2021
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Application
TECHNIQUES AND APPARATUS FOR UNIDIRECTIONAL HOLE ELONGATION USING A...
- Publication number 20200194271
- Publication date Jun 18, 2020
- Applied Materials, Inc.
- Kevin Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS
- Publication number 20200126757
- Publication date Apr 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Application
In-situ Beam Profile Metrology
- Publication number 20200118790
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Tsung-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES, SYSTEM AND APPRATUS FOR SELECTIVE DEPOSITION OF A LAYER...
- Publication number 20200027707
- Publication date Jan 23, 2020
- Varian Semiconductor Equipment Associates, Inc.
- CHRISTOPHER HATEM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TECHNIQUES AND APPARATUS FOR ELONGATION PATTERNING USING ANGLED ION...
- Publication number 20190355581
- Publication date Nov 21, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Kevin R. Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY
- Publication number 20190272983
- Publication date Sep 5, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Jay Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR SELECTIVE DEPOSITION USING ANGLED IONS
- Publication number 20190256966
- Publication date Aug 22, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Workpiece Processing Technique
- Publication number 20190027367
- Publication date Jan 24, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE DIMENSIONAL STRUCTURE FABRICATION CONTROL USING NOVEL PROCESS...
- Publication number 20180340769
- Publication date Nov 29, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- G01 - MEASURING TESTING
Information Patent Application
CRITICAL DIMENSIONS VARIANCE COMPENSATION
- Publication number 20180197796
- Publication date Jul 12, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTER ETCH MATERIAL SELECTIVITY
- Publication number 20180174843
- Publication date Jun 21, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF CLEAN SYSTEM FOR ELECTROSTATIC ELEMENTS
- Publication number 20180166261
- Publication date Jun 14, 2018
- Kevin Anglin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR PROCESSING A POLYCRYSTALLINE LAYER USING AN ANGLED I...
- Publication number 20180122650
- Publication date May 3, 2018
- Tristan Y. Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS H...
- Publication number 20170092473
- Publication date Mar 30, 2017
- Varian Semiconductor Equipment Associates, Inc.
- William Davis Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Technique
- Publication number 20170005013
- Publication date Jan 5, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS
- Publication number 20160365225
- Publication date Dec 15, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Kevin Anglin
- B08 - CLEANING
Information Patent Application
Workpiece Processing Method And Apparatus
- Publication number 20160111254
- Publication date Apr 21, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Morgan D. Evans
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kevin Anglin

Person

Patents Grantslast 30 patents

Substrate halo arrangement for improved process uniformity

Temperature controlled/electrically biased wafer surround

Multi-zone platen temperature control

Techniques and apparatus for unidirectional hole elongation using a...

In-situ plasma cleaning of process chamber components

Techniques and apparatus for elongation patterning using angled ion...

Techniques for selective deposition using angled ions

In-situ plasma cleaning of process chamber components

Techniques, system and apparatus for selective deposition of a laye...

Workpiece processing technique

In-situ beam profile metrology

Techniques for processing a polycrystalline layer using an angled i...

In-situ plasma cleaning of process chamber components

RF clean system for electrostatic elements

Critical dimensions variance compensation

Three dimensional structure fabrication control using novel process...

Sputter etch material selectivity

Dynamic heating method and system for wafer processing

Patents Applicationslast 30 patents

Multi-Zone Platen Temperature Control

TECHNIQUES AND APPARATUS FOR UNIDIRECTIONAL HOLE ELONGATION USING A...

COMPACT LOW ANGLE ION BEAM EXTRACTION ASSEMBLY AND PROCESSING APPAR...

SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY

Temperature Controlled/Electrically Biased Wafer Surround

TECHNIQUES AND APPARATUS FOR ELONGATION PATTERNING USING ANGLED ION...

Multi-Zone Platen Temperature Control

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS

TECHNIQUES AND APPARATUS FOR UNIDIRECTIONAL HOLE ELONGATION USING A...

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS

In-situ Beam Profile Metrology

TECHNIQUES, SYSTEM AND APPRATUS FOR SELECTIVE DEPOSITION OF A LAYER...

TECHNIQUES AND APPARATUS FOR ELONGATION PATTERNING USING ANGLED ION...

SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY

TECHNIQUES FOR SELECTIVE DEPOSITION USING ANGLED IONS

Workpiece Processing Technique

THREE DIMENSIONAL STRUCTURE FABRICATION CONTROL USING NOVEL PROCESS...

CRITICAL DIMENSIONS VARIANCE COMPENSATION

SPUTTER ETCH MATERIAL SELECTIVITY

RF CLEAN SYSTEM FOR ELECTROSTATIC ELEMENTS

TECHNIQUES FOR PROCESSING A POLYCRYSTALLINE LAYER USING AN ANGLED I...

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS H...

Workpiece Processing Technique

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER COMPONENTS

Workpiece Processing Method And Apparatus