Kevin Choi

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San Jose, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Using bias RF pulsing to effectively clean electrostatic chuck (ESC)
- Patent number 10,410,845
- Issue date Sep 10, 2019
- Applied Materials, Inc.
- Kenny Linh Doan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Smart multi-level RF pulsing methods
- Patent number 9,872,373
- Issue date Jan 16, 2018
- Applied Materials, Inc.
- Daisuke Shimizu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
USING BIAS RF PULSING TO EFFECTIVELY CLEAN ELECTROSTATIC CHUCK (ESC)
- Publication number 20190157052
- Publication date May 23, 2019
- Applied Materials, Inc.
- Kenny Linh DOAN
- B08 - CLEANING