Kevin E. Mello

Person

Fishkill, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Via contact structure having dual silicide layers
- Patent number 8,288,828
- Issue date Oct 16, 2012
- International Business Machines Corporation
- Michael M. Iwatake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of room temperature growth of SiOx on silicide as an etch st...
- Patent number 7,538,029
- Issue date May 26, 2009
- International Business Machines Corporation
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Feed forward silicide control scheme based on spacer height control...
- Patent number 7,479,436
- Issue date Jan 20, 2009
- International Business Machines Corporation
- Ricky S. Amos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Clustered surface preparation for silicide and metal contacts
- Patent number 7,344,983
- Issue date Mar 18, 2008
- International Business Machines Corporation
- Sadanand V. Deshpande
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective salicidation methods
- Patent number 7,015,140
- Issue date Mar 21, 2006
- International Business Machines Corporation
- Russell H. Arndt
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FEED FORWARD SILICIDE CONTROL SCHEME BASED ON SPACER HEIGHT CONTROL...
- Publication number 20080188014
- Publication date Aug 7, 2008
- International Business Machines Corporation
- Ricky S. Amos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLUSTERED SURFACE PREPARATION FOR SILICIDE AND METAL CONTACTS
- Publication number 20080156257
- Publication date Jul 3, 2008
- International Business Machines Corporation
- Sadanand V. Deshpande
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICIDE CAP STRUCTURE AND PROCESS FOR REDUCED STRESS AND IMPROVED...
- Publication number 20080020535
- Publication date Jan 24, 2008
- International Business Machines Corporation
- Levent Gulari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication of via contacts having dual silicide layers
- Publication number 20070077753
- Publication date Apr 5, 2007
- Michael M. Iwatake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ROOM TEMPERATURE GROWTH OF SIOx ON SILICIDE AS AN ETCH ST...
- Publication number 20070010093
- Publication date Jan 11, 2007
- International Business Machines Corporation
- Yun-Yu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLUSTERED SURFACE PREPARATION FOR SILICIDE AND METAL CONTACTS
- Publication number 20060211244
- Publication date Sep 21, 2006
- International Business Machines Corporation
- Sadanand V. Deshpande
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICIDE CAP STRUCTURE AND PROCESS FOR REDUCED STRESS AND IMPROVED...
- Publication number 20060163671
- Publication date Jul 27, 2006
- International Business Machines Corporation
- Levent Gulari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL SILICIDE VIA CONTACT STRUCTURE AND PROCESS
- Publication number 20060051959
- Publication date Mar 9, 2006
- International Business Machines Corporation
- Michael M. Iwatake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SALICIDATION METHODS
- Publication number 20050282370
- Publication date Dec 22, 2005
- International Business Machines Corporation
- Russell H. Arndt
- H01 - BASIC ELECTRIC ELEMENTS

Kevin E. Mello

Person

Patents Grantslast 30 patents

Via contact structure having dual silicide layers

Method of room temperature growth of SiOx on silicide as an etch st...

Feed forward silicide control scheme based on spacer height control...

Clustered surface preparation for silicide and metal contacts

Selective salicidation methods

Patents Applicationslast 30 patents

FEED FORWARD SILICIDE CONTROL SCHEME BASED ON SPACER HEIGHT CONTROL...

CLUSTERED SURFACE PREPARATION FOR SILICIDE AND METAL CONTACTS

SILICIDE CAP STRUCTURE AND PROCESS FOR REDUCED STRESS AND IMPROVED...

Fabrication of via contacts having dual silicide layers

METHOD OF ROOM TEMPERATURE GROWTH OF SIOx ON SILICIDE AS AN ETCH ST...

CLUSTERED SURFACE PREPARATION FOR SILICIDE AND METAL CONTACTS

SILICIDE CAP STRUCTURE AND PROCESS FOR REDUCED STRESS AND IMPROVED...

DUAL SILICIDE VIA CONTACT STRUCTURE AND PROCESS

SELECTIVE SALICIDATION METHODS