Kevin P. Dockery

Person

Rochester, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
CMP composition including a novel abrasive
- Patent number 11,725,116
- Issue date Aug 15, 2023
- CMC Materials, Inc.
- Alexander W. Hains
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Derivatized polyamino acids
- Patent number 11,492,514
- Issue date Nov 8, 2022
- CMC Materials, Inc.
- Na Zhang
- B24 - GRINDING POLISHING
Information Patent Grant
Surface treated abrasive particles for tungsten buff applications
- Patent number 11,043,151
- Issue date Jun 22, 2021
- CMC Materials, Inc.
- Ji Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for tungsten CMP
- Patent number 10,676,647
- Issue date Jun 9, 2020
- Cabot Microelectronics Corporation
- Na Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tungsten buff polishing compositions with improved topography
- Patent number 10,647,887
- Issue date May 12, 2020
- Cabot Microelectronics Corporation
- Kevin P. Dockery
- B24 - GRINDING POLISHING
Information Patent Grant
CMP compositions selective for oxide and nitride with improved dish...
- Patent number 10,640,679
- Issue date May 5, 2020
- Cabot Microelectronics Corporation
- Sudeep Pallikkara Kuttiatoor
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tungsten processing slurry with catalyst
- Patent number 10,066,126
- Issue date Sep 4, 2018
- Cabot Microelectronics Corporation
- Kevin P. Dockery
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tungsten-processing slurry with cationic surfactant and cyclodextrin
- Patent number 9,771,496
- Issue date Sep 26, 2017
- Cabot Microelectronics Corporation
- Kevin Dockery
- B24 - GRINDING POLISHING
Information Patent Grant
Tungsten-processing slurry with cationic surfactant
- Patent number 9,631,122
- Issue date Apr 25, 2017
- Cabot Microelectronics Corporation
- Kevin Dockery
- B24 - GRINDING POLISHING
Information Patent Grant
CMP compositions exhibiting reduced dishing in STI wafer polishing
- Patent number 9,422,455
- Issue date Aug 23, 2016
- Cabot Microelectronics Corporation
- Sudeep Pallikkara Kuttiatoor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CMP compositions selective for oxide over polysilicon and nitride w...
- Patent number 9,165,489
- Issue date Oct 20, 2015
- Cabot Microelectronics Corporation
- Tina Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
CMP compositions selective for oxide and nitride with high removal...
- Patent number 8,906,252
- Issue date Dec 9, 2014
- Cabot Microelelctronics Corporation
- Kevin P. Dockery
- B24 - GRINDING POLISHING
Information Patent Grant
Aqueous inkjet printing fluid compositions
- Patent number 8,485,654
- Issue date Jul 16, 2013
- Eastman Kodak Company
- Allan F. Sowinski
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aqueous inkjet printing fluid compositions
- Patent number 8,459,787
- Issue date Jun 11, 2013
- Eastman Kodak Company
- Allan F. Sowinski
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Aqueous compositions with improved silicon corrosion characteristics
- Patent number 8,419,176
- Issue date Apr 16, 2013
- Eastman Kodak Company
- Kevin P. Dockery
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Synthesis for polycyclic aromatic hydrocarbon compounds
- Patent number 7,368,624
- Issue date May 6, 2008
- Eastman Kodak Company
- Christopher T. Brown
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Element for protein microarrays
- Patent number 7,153,896
- Issue date Dec 26, 2006
- Eastman Kodak Company
- Kevin P. Dockery
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ink jet printing method
- Patent number 6,843,560
- Issue date Jan 18, 2005
- Eastman Kodak Company
- Charles E. Romano, Jr.
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Photographic element containing high dye-yield couplers
- Patent number 6,132,944
- Issue date Oct 17, 2000
- Eastman Kodak Company
- Jared B. Mooberry
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photographic element containing sulfon amido compounds that boost d...
- Patent number 6,120,981
- Issue date Sep 19, 2000
- Eastman Kodak Company
- David Hoke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE
- Publication number 20230070776
- Publication date Mar 9, 2023
- CMC Materials, Inc.
- Yang-Yao Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITION INCLUDING A NOVEL ABRASIVE
- Publication number 20210301178
- Publication date Sep 30, 2021
- Cabot Microelectronics Corporation, n/k/a CMC Materials, Inc.
- Alexander W. HAINS
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DERIVATIZED POLYAMINO ACIDS
- Publication number 20210206920
- Publication date Jul 8, 2021
- CMC Materials, Inc.
- Na ZHANG
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR TUNGSTEN CMP
- Publication number 20200208014
- Publication date Jul 2, 2020
- Cabot Microelectronics Corporation
- Na ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNGSTEN BUFF POLISHING COMPOSITIONS WITH IMPROVED TOPOGRAPHY
- Publication number 20190211227
- Publication date Jul 11, 2019
- Cabot Microelectronics Corporation
- Kevin P. DOCKERY
- B24 - GRINDING POLISHING
Information Patent Application
SURFACE TREATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS
- Publication number 20190100677
- Publication date Apr 4, 2019
- Cabot Microelectronics Corporation
- Ji CUI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR TUNGSTEN CMP
- Publication number 20190085209
- Publication date Mar 21, 2019
- Cabot Microelectronics Corporation
- Kevin P. DOCKERY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMP COMPOSITIONS SELECTIVE FOR OXIDE AND NITRIDE WITH IMPROVED DISH...
- Publication number 20180105721
- Publication date Apr 19, 2018
- Cabot Microelectronics Corporation
- Sudeep PALLIKKARA KUTTIATOOR
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TUNGSTEN PROCESSING SLURRY WITH CATALYST
- Publication number 20170190936
- Publication date Jul 6, 2017
- Cabot Microelectronics Corporation
- Kevin P. Dockery
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT AND CYCLODEXTRIN
- Publication number 20170121560
- Publication date May 4, 2017
- Cabot Microelectronics Corporation
- Kevin DOCKERY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT
- Publication number 20170121561
- Publication date May 4, 2017
- Cabot Microelectronics Corporation
- Kevin DOCKERY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CMP COMPOSITIONS EXHIBITING REDUCED DISHING IN STI WAFER POLISHING
- Publication number 20160168421
- Publication date Jun 16, 2016
- Cabot Microelectronics Corporation
- Sudeep PALLIKKARA KUTTIATOOR
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITIONS SELECTIVE FOR OXIDE AND NITRIDE WITH HIGH REMOVAL...
- Publication number 20140346140
- Publication date Nov 27, 2014
- Kevin P. Dockery
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CMP COMPOSITIONS SELECTIVE FOR OXIDE OVER POLYSILICON AND NITRIDE W...
- Publication number 20140349483
- Publication date Nov 27, 2014
- Tina LI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS INKJET PRINTING FLUID COMPOSITIONS
- Publication number 20120105553
- Publication date May 3, 2012
- Allan F. Sowinski
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AQUEOUS INKJET PRINTING FLUID COMPOSITIONS
- Publication number 20120105535
- Publication date May 3, 2012
- Allan F. Sowinski
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
AQUEOUS COMPOSITIONS WITH IMPROVED SILICON CORROSION CHARACTERISTICS
- Publication number 20100302292
- Publication date Dec 2, 2010
- Kevin P. Dockery
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
MEASURING ETCHING RATES USING LOW COHERENCE INTERFEROMETRY
- Publication number 20090065478
- Publication date Mar 12, 2009
- Kevin P. Dockery
- G01 - MEASURING TESTING
Information Patent Application
Conjugation agent
- Publication number 20060052421
- Publication date Mar 9, 2006
- Eastman Kodak Company
- Thomas R. Welter
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Synthesis for polycyclic aromatic hydrocarbon compounds
- Publication number 20050222417
- Publication date Oct 6, 2005
- Eastman Kodak Company
- Christopher T. Brown
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Element for protein microarrays
- Publication number 20050107528
- Publication date May 19, 2005
- Eastman Kodak Company
- Kevin P. Dockery
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Ink jet recording element
- Publication number 20040028844
- Publication date Feb 12, 2004
- Eastman Kodak Company
- Charles E. Romano
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Ink jet printing method
- Publication number 20040027438
- Publication date Feb 12, 2004
- Eastman Kodak Company
- Charles E. Romano
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

Kevin P. Dockery

Person

Patents Grantslast 30 patents

CMP composition including a novel abrasive

Derivatized polyamino acids

Surface treated abrasive particles for tungsten buff applications

Composition for tungsten CMP

Tungsten buff polishing compositions with improved topography

CMP compositions selective for oxide and nitride with improved dish...

Tungsten processing slurry with catalyst

Tungsten-processing slurry with cationic surfactant and cyclodextrin

Tungsten-processing slurry with cationic surfactant

CMP compositions exhibiting reduced dishing in STI wafer polishing

CMP compositions selective for oxide over polysilicon and nitride w...

CMP compositions selective for oxide and nitride with high removal...

Aqueous inkjet printing fluid compositions

Aqueous inkjet printing fluid compositions

Aqueous compositions with improved silicon corrosion characteristics

Synthesis for polycyclic aromatic hydrocarbon compounds

Element for protein microarrays

Ink jet printing method

Photographic element containing high dye-yield couplers

Photographic element containing sulfon amido compounds that boost d...

Patents Applicationslast 30 patents

CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE

CMP COMPOSITION INCLUDING A NOVEL ABRASIVE

DERIVATIZED POLYAMINO ACIDS

COMPOSITION FOR TUNGSTEN CMP

TUNGSTEN BUFF POLISHING COMPOSITIONS WITH IMPROVED TOPOGRAPHY

SURFACE TREATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS

COMPOSITION FOR TUNGSTEN CMP

CMP COMPOSITIONS SELECTIVE FOR OXIDE AND NITRIDE WITH IMPROVED DISH...

TUNGSTEN PROCESSING SLURRY WITH CATALYST

TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT AND CYCLODEXTRIN

TUNGSTEN-PROCESSING SLURRY WITH CATIONIC SURFACTANT

CMP COMPOSITIONS EXHIBITING REDUCED DISHING IN STI WAFER POLISHING

CMP COMPOSITIONS SELECTIVE FOR OXIDE AND NITRIDE WITH HIGH REMOVAL...

CMP COMPOSITIONS SELECTIVE FOR OXIDE OVER POLYSILICON AND NITRIDE W...

AQUEOUS INKJET PRINTING FLUID COMPOSITIONS

AQUEOUS INKJET PRINTING FLUID COMPOSITIONS

AQUEOUS COMPOSITIONS WITH IMPROVED SILICON CORROSION CHARACTERISTICS

MEASURING ETCHING RATES USING LOW COHERENCE INTERFEROMETRY

Conjugation agent

Synthesis for polycyclic aromatic hydrocarbon compounds

Element for protein microarrays

Ink jet recording element

Ink jet printing method