Kevin Peterlinz

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optical metrology tool equipped with modulated illumination sources
- Patent number 11,913,874
- Issue date Feb 27, 2024
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for measurement of thick films and high aspect...
- Patent number 11,119,050
- Issue date Sep 14, 2021
- KLA Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical metrology tool equipped with modulated illumination sources
- Patent number 10,969,328
- Issue date Apr 6, 2021
- KLA Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for measurement of thick films and high aspect...
- Patent number 10,690,602
- Issue date Jun 23, 2020
- KLA-Tencor Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical metrology with small illumination spot size
- Patent number 10,648,796
- Issue date May 12, 2020
- KLA-Tencor Corporation
- Noam Sapiens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 10,612,916
- Issue date Apr 7, 2020
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Spectral reflectometry for in-situ process monitoring and control
- Patent number 10,438,825
- Issue date Oct 8, 2019
- KLA-Tencor Corporation
- Prateek Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for spectroscopic beam profile metrology includin...
- Patent number 10,234,271
- Issue date Mar 19, 2019
- KLA-Tencor Corporation
- Jiyou Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology tool equipped with modulated illumination sources
- Patent number 10,215,688
- Issue date Feb 26, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Spectroscopic beam profile overlay metrology
- Patent number 10,101,676
- Issue date Oct 16, 2018
- KLA-Tencor Corporation
- Jiyou Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for spectroscopic beam profile metrology having...
- Patent number 10,072,921
- Issue date Sep 11, 2018
- KLA-Tencor Corporation
- Jiyou Fu
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology with small illumination spot size
- Patent number 9,915,524
- Issue date Mar 13, 2018
- KLA-Tencor Corporation
- Noam Sapiens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 9,816,810
- Issue date Nov 14, 2017
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology tool with combined XRF and SAXS capabilities
- Patent number 9,778,213
- Issue date Oct 3, 2017
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Grant
Single wavelength ellipsometry with improved spot size capability
- Patent number 9,574,992
- Issue date Feb 21, 2017
- KLA-Tencor Corporation
- Esen Salcin
- G01 - MEASURING TESTING
Information Patent Grant
Combined x-ray and optical metrology
- Patent number 9,535,018
- Issue date Jan 3, 2017
- KLA-Tencor Corporation
- Kevin A. Peterlinz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement of multiple patterning parameters
- Patent number 9,490,182
- Issue date Nov 8, 2016
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical metrology tool equipped with modulated illumination sources
- Patent number 9,400,246
- Issue date Jul 26, 2016
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Grant
Method of electromagnetic modeling of finite structures and finite...
- Patent number 9,291,554
- Issue date Mar 22, 2016
- KLA-Tencor Corporation
- Alexander Kuznetsov
- G01 - MEASURING TESTING
Information Patent Grant
Optical metrology of periodic targets in presence of multiple diffr...
- Patent number 9,243,886
- Issue date Jan 26, 2016
- KLA-Tencor Corporation
- Alexander Kuznetsov
- G01 - MEASURING TESTING
Information Patent Grant
Dynamically adjustable semiconductor metrology system
- Patent number 9,228,943
- Issue date Jan 5, 2016
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method of measuring roughness and other parameters of...
- Patent number 8,982,358
- Issue date Mar 17, 2015
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SPECTRAL ANGULAR METROLOGY
- Publication number 20250076208
- Publication date Mar 6, 2025
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO...
- Publication number 20240280484
- Publication date Aug 22, 2024
- KLA Corporation
- David Y. Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL METROLOGY TOOL EQUIPPED WITH MODULATED ILLUMINATION SOURCES
- Publication number 20210223166
- Publication date Jul 22, 2021
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Measurement Of Thick Films And High Aspect...
- Publication number 20200284733
- Publication date Sep 10, 2020
- KLA Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Metrology Tool Equipped with Modulated Illumination Sources
- Publication number 20190195782
- Publication date Jun 27, 2019
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Spectroscopic Beam Profile Metrology
- Publication number 20180347961
- Publication date Dec 6, 2018
- KLA-Tencor Corporation
- Jiyou Fu
- G01 - MEASURING TESTING
Information Patent Application
Methods And Systems For Measurement Of Thick Films And High Aspect...
- Publication number 20180238814
- Publication date Aug 23, 2018
- KLA-Tencor Corporation
- Noam Sapiens
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Metrology With Small Illumination Spot Size
- Publication number 20180180406
- Publication date Jun 28, 2018
- KLA-Tencor Corporation
- Noam Sapiens
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Spectral Reflectometry For In-Situ Process Monitoring And Control
- Publication number 20180061691
- Publication date Mar 1, 2018
- KLA-Tencor Corporation
- Prateek Jain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Measurement Of Multiple Patterning Parameters
- Publication number 20180051984
- Publication date Feb 22, 2018
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Spectroscopic Beam Profile Overlay Metrology
- Publication number 20170082932
- Publication date Mar 23, 2017
- KLA-Tencor Corporation
- Jiyou Fu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Metrology Tool Equipped with Modulated Illumination Sources
- Publication number 20170016815
- Publication date Jan 19, 2017
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Measurement Of Multiple Patterning Parameters
- Publication number 20170003123
- Publication date Jan 5, 2017
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Optical Metrology With Small Illumination Spot Size
- Publication number 20160334326
- Publication date Nov 17, 2016
- KLA-Tencor Corporation
- Noam Sapiens
- G01 - MEASURING TESTING
Information Patent Application
Spectroscopic Beam Profile Metrology
- Publication number 20160161245
- Publication date Jun 9, 2016
- KLA-Tencor Corporation
- Jiyou Fu
- G01 - MEASURING TESTING
Information Patent Application
Measurement Of Multiple Patterning Parameters
- Publication number 20150176985
- Publication date Jun 25, 2015
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Metrology Tool With Combined XRF And SAXS Capabilities
- Publication number 20150051877
- Publication date Feb 19, 2015
- KLA-Tencor Corporation
- Michael S. Bakeman
- G01 - MEASURING TESTING
Information Patent Application
Combined X-Ray and Optical Metrology
- Publication number 20150032398
- Publication date Jan 29, 2015
- KLA-Tencor Corporation
- Kevin A. Peterlinz
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF ELECTROMAGNETIC MODELING OF FINITE STRUCTURES AND FINITE...
- Publication number 20140222380
- Publication date Aug 7, 2014
- Alexander Kuznetsov
- G01 - MEASURING TESTING
Information Patent Application
Apparatus And Method Of Measuring Roughness And Other Parameters Of...
- Publication number 20130182263
- Publication date Jul 18, 2013
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Optical Metrology Tool Equipped with Modulated Illumination Sources
- Publication number 20130169966
- Publication date Jul 4, 2013
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- G01 - MEASURING TESTING
Information Patent Application
Dynamically Adjustable Semiconductor Metrology System
- Publication number 20130114085
- Publication date May 9, 2013
- KLA-Tencor Corporation
- David Y. Wang
- G01 - MEASURING TESTING

Kevin Peterlinz

Person

Patents Grantslast 30 patents

Optical metrology tool equipped with modulated illumination sources

Methods and systems for measurement of thick films and high aspect...

Optical metrology tool equipped with modulated illumination sources

Methods and systems for measurement of thick films and high aspect...

Optical metrology with small illumination spot size

Measurement of multiple patterning parameters

Spectral reflectometry for in-situ process monitoring and control

Method and system for spectroscopic beam profile metrology includin...

Optical metrology tool equipped with modulated illumination sources

Spectroscopic beam profile overlay metrology

Methods and systems for spectroscopic beam profile metrology having...

Optical metrology with small illumination spot size

Measurement of multiple patterning parameters

Metrology tool with combined XRF and SAXS capabilities

Single wavelength ellipsometry with improved spot size capability

Combined x-ray and optical metrology

Measurement of multiple patterning parameters

Optical metrology tool equipped with modulated illumination sources

Method of electromagnetic modeling of finite structures and finite...

Optical metrology of periodic targets in presence of multiple diffr...

Dynamically adjustable semiconductor metrology system

Apparatus and method of measuring roughness and other parameters of...

Patents Applicationslast 30 patents

SPECTRAL ANGULAR METROLOGY

ANGLE RESOLVED REFLECTOMETRY FOR THICK FILMS AND HIGH ASPECT RATIO...

OPTICAL METROLOGY TOOL EQUIPPED WITH MODULATED ILLUMINATION SOURCES

Methods And Systems For Measurement Of Thick Films And High Aspect...

Optical Metrology Tool Equipped with Modulated Illumination Sources

Methods And Systems For Spectroscopic Beam Profile Metrology

Methods And Systems For Measurement Of Thick Films And High Aspect...

Optical Metrology With Small Illumination Spot Size

Spectral Reflectometry For In-Situ Process Monitoring And Control

Measurement Of Multiple Patterning Parameters

Spectroscopic Beam Profile Overlay Metrology

Optical Metrology Tool Equipped with Modulated Illumination Sources

Measurement Of Multiple Patterning Parameters

Optical Metrology With Small Illumination Spot Size

Spectroscopic Beam Profile Metrology

Measurement Of Multiple Patterning Parameters

Metrology Tool With Combined XRF And SAXS Capabilities

Combined X-Ray and Optical Metrology

METHOD OF ELECTROMAGNETIC MODELING OF FINITE STRUCTURES AND FINITE...

Apparatus And Method Of Measuring Roughness And Other Parameters Of...

Optical Metrology Tool Equipped with Modulated Illumination Sources

Dynamically Adjustable Semiconductor Metrology System