Kevin R. Downing

Person

Westford, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Ability to three-dimensionally print an aperture mask on a multi sp...
- Patent number 12,013,558
- Issue date Jun 18, 2024
- Materion Corporation
- Kevin R. Downing
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Photo resist as opaque aperture mask on multispectral filter arrays
- Patent number 11,762,137
- Issue date Sep 19, 2023
- Materion Corporation
- Kevin R. Downing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo resist as opaque aperture mask on multispectral filter arrays
- Patent number 11,269,120
- Issue date Mar 8, 2022
- Materion Corporation
- Kevin R. Downing
- G02 - OPTICS
Information Patent Grant
Ability to three-dimensionally print an aperture mask on a multi sp...
- Patent number 10,981,372
- Issue date Apr 20, 2021
- Materion Corporation
- Kevin R. Downing
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Filter array with reduced stray light
- Patent number 10,782,459
- Issue date Sep 22, 2020
- Materion Corporation
- Kevin R. Downing
- G02 - OPTICS
Information Patent Grant
Filter array with reduced stray focused light
- Patent number 10,488,568
- Issue date Nov 26, 2019
- Materion Corporation
- Kevin R. Downing
- G02 - OPTICS
Information Patent Grant
Filter array with reduced stray focused light
- Patent number 10,330,835
- Issue date Jun 25, 2019
- Materion Corporation
- Kevin R. Downing
- G02 - OPTICS
Information Patent Grant
Ability to three-dimensionally print an aperture mask on a multi sp...
- Patent number 10,189,239
- Issue date Jan 29, 2019
- Materion Corporation
- Kevin R. Downing
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS
- Publication number 20230375761
- Publication date Nov 23, 2023
- MATERION CORPORATION
- Kevin R. Downing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS
- Publication number 20220146722
- Publication date May 12, 2022
- MATERION CORPORATION
- Kevin R. Downing
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ABILITY TO THREE-DIMENSIONALLY PRINT AN APERTURE MASK ON A MULTI SP...
- Publication number 20210206156
- Publication date Jul 8, 2021
- MATERION CORPORATION
- Kevin R. Downing
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
FILTER ARRAY WITH REDUCED STRAY FOCUSED LIGHT
- Publication number 20190265397
- Publication date Aug 29, 2019
- MATERION CORPORATION
- Kevin R. Downing
- G02 - OPTICS
Information Patent Application
ABILITY TO THREE-DIMENSIONALLY PRINT AN APERTURE MASK ON A MULTI SP...
- Publication number 20190118524
- Publication date Apr 25, 2019
- MATERION CORPORATION
- Kevin R. Downing
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS
- Publication number 20190079226
- Publication date Mar 14, 2019
- Materion Corporation
- Kevin R. Downing
- G02 - OPTICS
Information Patent Application
ABILITY TO THREE-DIMENSIONALLY PRINT AN APERTURE MASK ON A MULTI SP...
- Publication number 20170173628
- Publication date Jun 22, 2017
- Materion Corporation
- Kevin R. Downing
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FILTER ARRAY WITH REDUCED STRAY FOCUSED LIGHT
- Publication number 20170123121
- Publication date May 4, 2017
- MATERION CORPORATION
- Kevin R. Downing
- G02 - OPTICS
Information Patent Application
FILTER ARRAY WITH REDUCED STRAY LIGHT
- Publication number 20140307309
- Publication date Oct 16, 2014
- MATERION CORPORATION
- Kevin R. Downing
- G02 - OPTICS

Kevin R. Downing

Person

Patents Grantslast 30 patents

Ability to three-dimensionally print an aperture mask on a multi sp...

Photo resist as opaque aperture mask on multispectral filter arrays

Photo resist as opaque aperture mask on multispectral filter arrays

Ability to three-dimensionally print an aperture mask on a multi sp...

Filter array with reduced stray light

Filter array with reduced stray focused light

Filter array with reduced stray focused light

Ability to three-dimensionally print an aperture mask on a multi sp...

Patents Applicationslast 30 patents

PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS

PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS

ABILITY TO THREE-DIMENSIONALLY PRINT AN APERTURE MASK ON A MULTI SP...

FILTER ARRAY WITH REDUCED STRAY FOCUSED LIGHT

ABILITY TO THREE-DIMENSIONALLY PRINT AN APERTURE MASK ON A MULTI SP...

PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS

ABILITY TO THREE-DIMENSIONALLY PRINT AN APERTURE MASK ON A MULTI SP...

FILTER ARRAY WITH REDUCED STRAY FOCUSED LIGHT

FILTER ARRAY WITH REDUCED STRAY LIGHT