Kevin Thomas Ryan

Person

Wilmington, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate halo arrangement for improved process uniformity
- Patent number 12,106,943
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and system including high angle extraction optics
- Patent number 11,948,781
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Christopher Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source chamber with embedded heater
- Patent number 10,925,146
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Kevin Ryan
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Umbilical cord facilities connection for an ion beam implanter
- Patent number 6,794,664
- Issue date Sep 21, 2004
- Axcelis Technologies, Inc.
- Robert J. Mitchell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Serial wafer handling mechanism
- Patent number 6,429,139
- Issue date Aug 6, 2002
- Eaton Corporation
- Kevin Thomas Ryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer processing chamber having separable upper and lower halves
- Patent number 6,347,919
- Issue date Feb 19, 2002
- Eaton Corporation
- Kevin Thomas Ryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated power oscillator RF source of plasma immersion ion impla...
- Patent number 6,305,316
- Issue date Oct 23, 2001
- Axcelis Technologies, Inc.
- William F. DiVergilio
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FASTENING ASSEMBLY FOR BEAM BLOCKER IN ION PROCESSING APPARATUS
- Publication number 20230197422
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Kevin T. Ryan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY
- Publication number 20220384156
- Publication date Dec 1, 2022
- Applied Materials, Inc.
- Jay R. Wallace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS
- Publication number 20210391155
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Christopher Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic chuck wafer port and top plate with edge shielding an...
- Publication number 20040079289
- Publication date Apr 29, 2004
- Peter L. Kellerman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SERIAL WAFER HANDLING MECHANISM
- Publication number 20020052094
- Publication date May 2, 2002
- KEVIN THOMAS RYAN
- H01 - BASIC ELECTRIC ELEMENTS

Kevin Thomas Ryan

Person

Patents Grantslast 30 patents

Substrate halo arrangement for improved process uniformity

Apparatus and system including high angle extraction optics

Ion source chamber with embedded heater

Umbilical cord facilities connection for an ion beam implanter

Serial wafer handling mechanism

Wafer processing chamber having separable upper and lower halves

Integrated power oscillator RF source of plasma immersion ion impla...

Patents Applicationslast 30 patents

FASTENING ASSEMBLY FOR BEAM BLOCKER IN ION PROCESSING APPARATUS

SUBSTRATE HALO ARRANGEMENT FOR IMPROVED PROCESS UNIFORMITY

APPARATUS AND SYSTEM INCLUDING HIGH ANGLE EXTRACTION OPTICS

Electrostatic chuck wafer port and top plate with edge shielding an...

SERIAL WAFER HANDLING MECHANISM