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Kevin Wen-Huan Tung

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  • Taichung, TW
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Patents Grantslast 30 patents

  • Information Patent Grant

    Chemical mechanical polishing pad
    • Patent number 10,875,144
    • Issue date Dec 29, 2020
    • Rohm and Haas Electronic Materials CMP Holdings, I
    • Bainian Qian
    • B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

  • Information Patent Application

    CHEMICAL MECHANICAL POLISHING PAD
    • Publication number 20180361531
    • Publication date Dec 20, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Bainian Qian
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    CHEMICAL MECHANICAL POLISHING PAD
    • Publication number 20180281149
    • Publication date Oct 4, 2018
    • Rohm and Haas Electronic Materials CMP Holdings, INC.
    • Bainian Qian
    • H01 - BASIC ELECTRIC ELEMENTS