Khalid Makhamreh

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Ultraviolet and ozone clean system
- Patent number 12,159,782
- Issue date Dec 3, 2024
- Applied Materials, Inc.
- Banqiu Wu
- B08 - CLEANING
Information Patent Grant
Megasonic clean with cavity property monitoring
- Patent number 12,128,456
- Issue date Oct 29, 2024
- Applied Materials, Inc.
- Banqiu Wu
- B08 - CLEANING
Information Patent Grant
Baking chamber with shroud for mask clean
- Patent number 12,085,849
- Issue date Sep 10, 2024
- Applied Materials, Inc.
- Banqiu Wu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Single-volume baking chamber for mask clean
- Patent number 11,921,422
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for photomask processing
- Patent number 11,803,118
- Issue date Oct 31, 2023
- Applied Materials, Inc.
- Banqiu Wu
- B08 - CLEANING
Information Patent Grant
Ultraviolet and ozone clean system
- Patent number 11,798,799
- Issue date Oct 24, 2023
- Applied Materials, Inc.
- Banqiu Wu
- B08 - CLEANING
Information Patent Grant
Megasonic clean with cavity property monitoring
- Patent number 11,654,460
- Issue date May 23, 2023
- Applied Materials, Inc.
- Banqiu Wu
- B08 - CLEANING
Information Patent Grant
Multi-volume baking chamber for mask clean
- Patent number 11,644,748
- Issue date May 9, 2023
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing photoresist from photomask substrate
- Patent number 11,114,350
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Banqiu Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for high throughput photomask curing
- Patent number 10,962,889
- Issue date Mar 30, 2021
- Applied Materials, Inc.
- Banqiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Attachment feature removal from photomask in extreme ultraviolet li...
- Patent number 10,928,724
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Banqiu Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for resist stripping and other processes for cleaning surfa...
- Patent number 7,297,286
- Issue date Nov 20, 2007
- NanoClean Technologies, Inc.
- Adel George Tannous
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for resist stripping and other processes for cleaning surfa...
- Patent number 7,101,260
- Issue date Sep 5, 2006
- NanoClean Technologies, Inc.
- Adel George Tannous
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for resist stripping and other processes for cleaning surfa...
- Patent number 7,066,789
- Issue date Jun 27, 2006
- Manoclean Technologies, Inc.
- Adel George Tannous
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for resist stripping and cleaning surfaces substantially fr...
- Patent number 7,040,961
- Issue date May 9, 2006
- NanoClean Technologies, Inc.
- Mohamed Boumerzoug
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for cleaning utilizing multi-stage filtered carbon dioxide
- Patent number 6,945,853
- Issue date Sep 20, 2005
- NanoClean Technologies, Inc.
- Goodarz Ahmadi
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for resist stripping and cleaning surfaces substantially fr...
- Patent number 6,764,385
- Issue date Jul 20, 2004
- NanoClean Technologies, Inc.
- Mohamed Boumerzoug
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for cleaning surfaces substantially free of contaminants ut...
- Patent number 6,719,613
- Issue date Apr 13, 2004
- NanoClean Technologies, Inc.
- Goodarz Ahmadi
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus for cleaning surfaces substantially free of contaminants
- Patent number 6,543,462
- Issue date Apr 8, 2003
- Nano Clean Technologies, Inc.
- Paul E. Lewis
- B24 - GRINDING POLISHING
Information Patent Grant
Methods for cleaning surfaces substantially free of contaminants
- Patent number 6,530,823
- Issue date Mar 11, 2003
- Nanoclean Technologies Inc
- Goodarz Ahmadi
- B24 - GRINDING POLISHING
Information Patent Grant
Processing tool interface apparatus for use in manufacturing enviro...
- Patent number 6,427,096
- Issue date Jul 30, 2002
- Honeywell International Inc.
- Paul E. Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for transporting articles
- Patent number 6,249,990
- Issue date Jun 26, 2001
- AlliedSignal, Inc.
- Adel George Tannous
- F26 - DRYING
Information Patent Grant
Method and apparatus for transporting articles
- Patent number 6,101,740
- Issue date Aug 15, 2000
- AlliedSignal, Inc.
- Adel George Tannous
- F26 - DRYING

Patents Applicationslast 30 patents

Information Patent Application
Atmospheric Pressure Plasma for Substrate Annealing
- Publication number 20240339324
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Banqiu WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING
- Publication number 20240157411
- Publication date May 16, 2024
- Banqiu WU
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR RUTHENIUM OXIDE REDUCTION ON EXTREME ULTR...
- Publication number 20240118603
- Publication date Apr 11, 2024
- APPLIED MATERALS, INC.
- Banqiu WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR PHOTOMASK PROCESSING
- Publication number 20240027894
- Publication date Jan 25, 2024
- Applied Materials, Inc.
- Banqiu WU
- B08 - CLEANING
Information Patent Application
ULTRAVIOLET AND OZONE CLEAN SYSTEM
- Publication number 20240014028
- Publication date Jan 11, 2024
- Banqiu WU
- B08 - CLEANING
Information Patent Application
MEGASONIC CLEAN WITH CAVITY PROPERTY MONITORING
- Publication number 20230241649
- Publication date Aug 3, 2023
- Banqiu WU
- B08 - CLEANING
Information Patent Application
MEGASONIC CLEAN WITH CAVITY PROPERTY MONITORING
- Publication number 20230127302
- Publication date Apr 27, 2023
- Banqiu WU
- B08 - CLEANING
Information Patent Application
ULTRAVIOLET AND OZONE CLEAN SYSTEM
- Publication number 20230044618
- Publication date Feb 9, 2023
- Banqiu WU
- B08 - CLEANING
Information Patent Application
BAKING CHAMBER WITH SHROUD FOR MASK CLEAN
- Publication number 20220326608
- Publication date Oct 13, 2022
- Banqiu WU
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR PHOTOMASK PROCESSING
- Publication number 20220326607
- Publication date Oct 13, 2022
- Banqiu WU
- B08 - CLEANING
Information Patent Application
MULTI-VOLUME BAKING CHAMBER FOR MASK CLEAN
- Publication number 20220326606
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Banqiu WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SINGLE-VOLUME BAKING CHAMBER FOR MASK CLEAN
- Publication number 20220326605
- Publication date Oct 13, 2022
- Banqiu WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADHESIVE MATERIAL REMOVAL FROM PHOTOMASK IN ULTRAVIOLET LITHOGRAPHY...
- Publication number 20210185793
- Publication date Jun 17, 2021
- Applied Materials, Inc.
- Banqiu WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REMOVING PHOTORESIST FROM PHOTOMASK SUBSTRATE
- Publication number 20200328128
- Publication date Oct 15, 2020
- Applied Materials, Inc.
- Banqiu WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATTACHMENT FEATURE REMOVAL FROM PHOTOMASK IN EXTREME ULTRAVIOLET LI...
- Publication number 20200183268
- Publication date Jun 11, 2020
- Applied Materials, Inc.
- Banqiu WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR HIGH THROUGHPUT PHOTOMASK CURING
- Publication number 20200166834
- Publication date May 28, 2020
- Applied Materials, Inc.
- Banqiu WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Debris management for wafer singulation
- Publication number 20080213978
- Publication date Sep 4, 2008
- DYNATEX
- Kathaleen Henry
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Methods for resist stripping and other processes for cleaning surfa...
- Publication number 20050263170
- Publication date Dec 1, 2005
- Adel George Tannous
- B08 - CLEANING
Information Patent Application
Methods for resist stripping and other processes for cleaning surfa...
- Publication number 20050127038
- Publication date Jun 16, 2005
- Adel George Tannous
- B08 - CLEANING
Information Patent Application
Methods for resist stripping and other processes for cleaning surfa...
- Publication number 20050127037
- Publication date Jun 16, 2005
- Adel George Tannous
- B08 - CLEANING
Information Patent Application
Methods for resist stripping and cleaning surfaces substantially fr...
- Publication number 20040261814
- Publication date Dec 30, 2004
- Mohamed Boumerzoug
- B08 - CLEANING
Information Patent Application
Methods for cleaning surfaces substantially free of contaminants ut...
- Publication number 20040198189
- Publication date Oct 7, 2004
- Goodarz Ahmadi
- B08 - CLEANING
Information Patent Application
Methods for resist stripping and cleaning surfaces substantially fr...
- Publication number 20040018803
- Publication date Jan 29, 2004
- Mohamed Boumerzoug
- B08 - CLEANING
Information Patent Application
Methods for cleaning surfaces substantially free of contaminants ut...
- Publication number 20030119424
- Publication date Jun 26, 2003
- Goodarz Ahmadi
- B08 - CLEANING

Khalid Makhamreh

Person

Patents Grantslast 30 patents

Ultraviolet and ozone clean system

Megasonic clean with cavity property monitoring

Baking chamber with shroud for mask clean

Single-volume baking chamber for mask clean

Methods and apparatus for photomask processing

Ultraviolet and ozone clean system

Megasonic clean with cavity property monitoring

Multi-volume baking chamber for mask clean

Method for removing photoresist from photomask substrate

Method and apparatus for high throughput photomask curing

Attachment feature removal from photomask in extreme ultraviolet li...

Methods for resist stripping and other processes for cleaning surfa...

Methods for resist stripping and other processes for cleaning surfa...

Methods for resist stripping and other processes for cleaning surfa...

Methods for resist stripping and cleaning surfaces substantially fr...

Methods for cleaning utilizing multi-stage filtered carbon dioxide

Methods for resist stripping and cleaning surfaces substantially fr...

Methods for cleaning surfaces substantially free of contaminants ut...

Apparatus for cleaning surfaces substantially free of contaminants

Methods for cleaning surfaces substantially free of contaminants

Processing tool interface apparatus for use in manufacturing enviro...

Method and apparatus for transporting articles

Method and apparatus for transporting articles

Patents Applicationslast 30 patents

Atmospheric Pressure Plasma for Substrate Annealing

ULTRAVIOLET AND OZONE CLEANING APPARATUS AND METHOD OF USING

METHODS AND APPARATUS FOR RUTHENIUM OXIDE REDUCTION ON EXTREME ULTR...

METHODS AND APPARATUS FOR PHOTOMASK PROCESSING

ULTRAVIOLET AND OZONE CLEAN SYSTEM

MEGASONIC CLEAN WITH CAVITY PROPERTY MONITORING

MEGASONIC CLEAN WITH CAVITY PROPERTY MONITORING

ULTRAVIOLET AND OZONE CLEAN SYSTEM

BAKING CHAMBER WITH SHROUD FOR MASK CLEAN

METHODS AND APPARATUS FOR PHOTOMASK PROCESSING

MULTI-VOLUME BAKING CHAMBER FOR MASK CLEAN

SINGLE-VOLUME BAKING CHAMBER FOR MASK CLEAN

ADHESIVE MATERIAL REMOVAL FROM PHOTOMASK IN ULTRAVIOLET LITHOGRAPHY...

METHOD FOR REMOVING PHOTORESIST FROM PHOTOMASK SUBSTRATE

ATTACHMENT FEATURE REMOVAL FROM PHOTOMASK IN EXTREME ULTRAVIOLET LI...

METHOD AND APPARATUS FOR HIGH THROUGHPUT PHOTOMASK CURING

Debris management for wafer singulation

Methods for resist stripping and other processes for cleaning surfa...

Methods for resist stripping and other processes for cleaning surfa...

Methods for resist stripping and other processes for cleaning surfa...

Methods for resist stripping and cleaning surfaces substantially fr...

Methods for cleaning surfaces substantially free of contaminants ut...

Methods for resist stripping and cleaning surfaces substantially fr...

Methods for cleaning surfaces substantially free of contaminants ut...