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KhanhTin NGUYEN
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Kawasaki-shi, JP
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Patents Grants
last 30 patents
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Patent Grant
Resist composition, method of forming resist pattern, compound, and...
Patent number
11,874,601
Issue date
Jan 16, 2024
Tokyo Ohka Kogyo Co., Ltd.
KhanhTin Nguyen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,754,922
Issue date
Sep 12, 2023
Tokyo Ohka Kogyo Co., Ltd.
Masatoshi Arai
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,703,756
Issue date
Jul 18, 2023
Tokyo Ohka Kogyo Co., Ltd.
Koshi Onishi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,693,316
Issue date
Jul 4, 2023
Tokyo Ohka Kogyo Co., Ltd.
KhanhTin Nguyen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,181,822
Issue date
Nov 23, 2021
Tokyo Ohka Kogyo Co., Ltd.
Koshi Onishi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition, method of forming resist pattern, polymeric com...
Patent number
11,099,479
Issue date
Aug 24, 2021
Tokyo Ohka Kogyo Co., Ltd.
Takashi Nagamine
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Method of preparing polymer compound
Patent number
10,414,918
Issue date
Sep 17, 2019
Tokyo Ohka Kogyo Co., Ltd.
Yoshitaka Komuro
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition, method for forming resist pattern, and polymer...
Patent number
10,295,905
Issue date
May 21, 2019
Tokyo Ohka Kogyo Co., Ltd.
Yoshitaka Komuro
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Publication number
20240302741
Publication date
Sep 12, 2024
Tokyo Ohka Kogyo Co., Ltd.
Shuichi Ishii
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR P...
Publication number
20240295812
Publication date
Sep 5, 2024
Tokyo Ohka Kogyo Co., Ltd.
Junichi Miyakawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD
Publication number
20240264527
Publication date
Aug 8, 2024
Tokyo Ohka Kogyo Co., Ltd.
Takuya Uehara
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND AC...
Publication number
20240210825
Publication date
Jun 27, 2024
Tokyo Ohka Kogyo Co., Ltd.
KhanhTin Nguyen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
Publication number
20220397825
Publication date
Dec 15, 2022
Tokyo Ohka Kogyo Co., Ltd.
KhanhTin NGUYEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20220019142
Publication date
Jan 20, 2022
Tokyo Ohka Kogyo Co., Ltd.
Masatoshi ARAI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND...
Publication number
20220011665
Publication date
Jan 13, 2022
Tokyo Ohka Kogyo Co., Ltd.
KhanhTin NGUYEN
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210200088
Publication date
Jul 1, 2021
Tokyo Ohka Kogyo Co., Ltd.
Toshiaki YATSUNAMI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210191268
Publication date
Jun 24, 2021
Tokyo Ohka Kogyo Co., Ltd.
KhanhTin NGUYEN
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20210141307
Publication date
May 13, 2021
TOKYO OHKA KYGYO CO., LTD.
Mari Murata
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
Publication number
20200183273
Publication date
Jun 11, 2020
Tokyo Ohka Kogyo Co., Ltd.
KhanhTin NGUYEN
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
Publication number
20190361343
Publication date
Nov 28, 2019
Tokyo Ohka Kogyo Co., Ltd.
Koshi ONISHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
Publication number
20190219920
Publication date
Jul 18, 2019
Tokyo Ohka Kogyo Co., Ltd.
Takashi NAGAMINE
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER...
Publication number
20180024433
Publication date
Jan 25, 2018
Tokyo Ohka Kogyo Co., Ltd.
Yoshitaka KOMURO
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF PREPARING POLYMER COMPOUND
Publication number
20180022916
Publication date
Jan 25, 2018
Tokyo Ohka Kogyo Co., Ltd.
Yoshitaka KOMURO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...