Khoi Anh PHAN

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Mitigating heat in an integrated circuit
- Patent number 8,028,531
- Issue date Oct 4, 2011
- GLOBALFOUNDRIES, INC.
- Khoi A. Phan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for imprint lithography to facilitate dual damasc...
- Patent number 7,709,373
- Issue date May 4, 2010
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask having sidewall absorbers to enable the printing of finer feat...
- Patent number 7,604,903
- Issue date Oct 20, 2009
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Recirculation and reuse of dummy dispensed resist
- Patent number 7,591,902
- Issue date Sep 22, 2009
- GLOBALFOUNDRIES Inc.
- Bharath Rangarajan
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Feedback control of imprint mask feature profile using scatterometr...
- Patent number 7,449,348
- Issue date Nov 11, 2008
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using supercritical fluids to clean lenses and monitor defects
- Patent number 7,381,278
- Issue date Jun 3, 2008
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods of imprint lithography with adjustable mask
- Patent number 7,295,288
- Issue date Nov 13, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Frame structure for turbulence control in immersion lithography
- Patent number 7,289,193
- Issue date Oct 30, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of supercritical fluid to dry wafer and clean lens in immersion...
- Patent number 7,262,422
- Issue date Aug 28, 2007
- Spansion LLC
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-situ reticle contamination detection system at exposure wavelength
- Patent number 7,251,033
- Issue date Jul 31, 2007
- Advanced Micro Devices, Inc.
- Khoi Phan
- G01 - MEASURING TESTING
Information Patent Grant
In-situ defect monitor and control system for immersion medium in i...
- Patent number 7,224,456
- Issue date May 29, 2007
- Advanced Micro Devices, Inc.
- Khoi Phan
- G01 - MEASURING TESTING
Information Patent Grant
Composite alignment mark scheme for multi-layers in lithography
- Patent number 7,221,060
- Issue date May 22, 2007
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Systems and methods that employ exposure compensation to provide un...
- Patent number 7,187,796
- Issue date Mar 6, 2007
- Advanced Micro Devices, Inc.
- Khoi A. Phan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for visually monitoring a semiconductor processin...
- Patent number 7,173,648
- Issue date Feb 6, 2007
- Advanced Micro Devices, Inc.
- Khoi Phan
- G01 - MEASURING TESTING
Information Patent Grant
Real time immersion medium control using scatterometry
- Patent number 7,158,896
- Issue date Jan 2, 2007
- Advanced Micro Devices, Inc.
- Bhanwar Singh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using supercritical fluids to clean lenses and monitor defects
- Patent number 7,156,925
- Issue date Jan 2, 2007
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of non-lithographic shrink techniques for fabrication/making of...
- Patent number 7,159,205
- Issue date Jan 2, 2007
- Advanced Micro Devices, Inc.
- Gilles Amblard
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Re-circulation and reuse of dummy-dispensed resist
- Patent number 7,153,364
- Issue date Dec 26, 2006
- Advance Micro Devices, Inc.
- Bharath Rangarajan
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
System and method for imprint lithography to facilitate dual damasc...
- Patent number 7,148,142
- Issue date Dec 12, 2006
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface oxide tabulation and photo process control and cost savings
- Patent number 7,109,046
- Issue date Sep 19, 2006
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Barcode marking of wafer products for inventory control
- Patent number 7,100,826
- Issue date Sep 5, 2006
- Advanced Micro Devices, Inc.
- Khoi A. Phan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scatterometry monitor in cluster process tool environment for advan...
- Patent number 7,076,320
- Issue date Jul 11, 2006
- Advanced Micro Devices, Inc.
- Khoi A. Phan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real time analytical monitor for soft defects on reticle during ret...
- Patent number 7,069,155
- Issue date Jun 27, 2006
- Advanced Micro Devices, Inc.
- Khoi Phan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-layer overlay measurement and correction technique for IC man...
- Patent number 7,065,737
- Issue date Jun 20, 2006
- Advanced Micro Devices, Inc.
- Khoi A. Phan
- G01 - MEASURING TESTING
Information Patent Grant
Optical monitoring and control of two layers of liquid immersion media
- Patent number 7,065,427
- Issue date Jun 20, 2006
- Advanced Micro Devices, Inc.
- Srikanteswara Dakshina-Murthy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-lithographic shrink techniques for improving line edge roughnes...
- Patent number 7,064,846
- Issue date Jun 20, 2006
- Advanced Micro Devices, Inc.
- Gilles Amblard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of base developers as immersion lithography fluid
- Patent number 7,056,646
- Issue date Jun 6, 2006
- Advanced Micro Devices, Inc.
- Gilles Amblard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for defect identification and location using an o...
- Patent number 7,034,930
- Issue date Apr 25, 2006
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G01 - MEASURING TESTING
Information Patent Grant
System and method of pattern recognition and metrology structure fo...
- Patent number 7,001,830
- Issue date Feb 21, 2006
- Advanced Micro Devices, Inc.
- Khoi A. Phan
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Refractive index system monitor and control for immersion lithography
- Patent number 6,999,254
- Issue date Feb 14, 2006
- Advanced Micro Devices, Inc.
- Khoi A. Phan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PVD Films For EUV Lithography
- Publication number 20190212656
- Publication date Jul 11, 2019
- Applied Materials, Inc.
- Huixiong Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR DEPOSITING AMORPHOUS SILICON LAYERS OR SILICON OXYCARBI...
- Publication number 20180142343
- Publication date May 24, 2018
- Weimin ZENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Surface Treatment For EUV Lithography
- Publication number 20180135183
- Publication date May 17, 2018
- Applied Materials, Inc.
- Weimin Zeng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMP SINGLE PRECURSOR ARC HARD MASK FOR MULTILAYER PATTERNING A...
- Publication number 20170125241
- Publication date May 4, 2017
- Applied Materials, Inc.
- Shaunak MUKHERJEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT REGULATING DEVICE FOR AN INTEGRATED CIRCUIT
- Publication number 20090288425
- Publication date Nov 26, 2009
- Khoi A. Phan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RECIRCULATION AND REUSE OF DUMMY DISPENSED RESIST
- Publication number 20070261636
- Publication date Nov 15, 2007
- Advanced Micro Devices, Inc.
- Bharath Rangarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Use of supercritical fluid to dry wafer and clean lens in immersion...
- Publication number 20070026345
- Publication date Feb 1, 2007
- Spansion LLC
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-layer overlay measurement and correction technique for IC man...
- Publication number 20050193362
- Publication date Sep 1, 2005
- Khoi A. Phan
- G01 - MEASURING TESTING
Information Patent Application
Pattern recognition and metrology structure for an x-initiative lay...
- Publication number 20050048741
- Publication date Mar 3, 2005
- Khoi A. Phan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Comprehensive integrated lithographic process control system based...
- Publication number 20040063009
- Publication date Apr 1, 2004
- Khoi A. Phan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nozzle arm movement for resist development
- Publication number 20030068430
- Publication date Apr 10, 2003
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ or ex-situ profile monitoring of phase openings on alternat...
- Publication number 20030052084
- Publication date Mar 20, 2003
- Cyrus E. Tabery
- G01 - MEASURING TESTING
Information Patent Application
Modification of mask layout data to improve mask fidelity
- Publication number 20020160281
- Publication date Oct 31, 2002
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
In-situ thickness measurement for use in semiconductor processing
- Publication number 20020142493
- Publication date Oct 3, 2002
- Arvind Halliyal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Algorithm for detecting sloped contact holes using a critical-dimen...
- Publication number 20020000550
- Publication date Jan 3, 2002
- Jean Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ozone cleaning of wafers
- Publication number 20010010229
- Publication date Aug 2, 2001
- R. Subramanian
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS

Khoi Anh PHAN

Person

Patents Grantslast 30 patents

Mitigating heat in an integrated circuit

System and method for imprint lithography to facilitate dual damasc...

Mask having sidewall absorbers to enable the printing of finer feat...

Recirculation and reuse of dummy dispensed resist

Feedback control of imprint mask feature profile using scatterometr...

Using supercritical fluids to clean lenses and monitor defects

Systems and methods of imprint lithography with adjustable mask

Frame structure for turbulence control in immersion lithography

Use of supercritical fluid to dry wafer and clean lens in immersion...

In-situ reticle contamination detection system at exposure wavelength

In-situ defect monitor and control system for immersion medium in i...

Composite alignment mark scheme for multi-layers in lithography

Systems and methods that employ exposure compensation to provide un...

System and method for visually monitoring a semiconductor processin...

Real time immersion medium control using scatterometry

Using supercritical fluids to clean lenses and monitor defects

Use of non-lithographic shrink techniques for fabrication/making of...

Re-circulation and reuse of dummy-dispensed resist

System and method for imprint lithography to facilitate dual damasc...

Surface oxide tabulation and photo process control and cost savings

Barcode marking of wafer products for inventory control

Scatterometry monitor in cluster process tool environment for advan...

Real time analytical monitor for soft defects on reticle during ret...

Multi-layer overlay measurement and correction technique for IC man...

Optical monitoring and control of two layers of liquid immersion media

Non-lithographic shrink techniques for improving line edge roughnes...

Use of base developers as immersion lithography fluid

System and method for defect identification and location using an o...

System and method of pattern recognition and metrology structure fo...

Refractive index system monitor and control for immersion lithography

Patents Applicationslast 30 patents

PVD Films For EUV Lithography

METHODS FOR DEPOSITING AMORPHOUS SILICON LAYERS OR SILICON OXYCARBI...

Surface Treatment For EUV Lithography

LOW TEMP SINGLE PRECURSOR ARC HARD MASK FOR MULTILAYER PATTERNING A...

HEAT REGULATING DEVICE FOR AN INTEGRATED CIRCUIT

RECIRCULATION AND REUSE OF DUMMY DISPENSED RESIST

Use of supercritical fluid to dry wafer and clean lens in immersion...

Multi-layer overlay measurement and correction technique for IC man...

Pattern recognition and metrology structure for an x-initiative lay...

Comprehensive integrated lithographic process control system based...

Nozzle arm movement for resist development

In-situ or ex-situ profile monitoring of phase openings on alternat...

Modification of mask layout data to improve mask fidelity

In-situ thickness measurement for use in semiconductor processing

Algorithm for detecting sloped contact holes using a critical-dimen...

Ozone cleaning of wafers