Kiichi Sakamoto

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 6,242,751
- Issue date Jun 5, 2001
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 6,222,195
- Issue date Apr 24, 2001
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle-beam exposure device and charged-particle-beam exp...
- Patent number 6,137,111
- Issue date Oct 24, 2000
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure mask and method of manufacturing the same an...
- Patent number 6,090,527
- Issue date Jul 18, 2000
- Fujitsu Limited
- Satoru Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of producing block mask for electron-beam lithography appara...
- Patent number 6,087,048
- Issue date Jul 11, 2000
- Advantest Corporation
- Yoshio Suzaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,969,365
- Issue date Oct 19, 1999
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of providing changed particle beam exposure in which represe...
- Patent number 5,965,895
- Issue date Oct 12, 1999
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask and method of creating mask as well as electron-beam exposure...
- Patent number 5,952,155
- Issue date Sep 14, 1999
- Fujitsu Limited
- Takayuki Sakakibara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure mask and method of manufacturing the same an...
- Patent number 5,849,437
- Issue date Dec 15, 1998
- Fujitsu Limited
- Satoru Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of detecting a deficiency in a charged-particle-beam exposur...
- Patent number 5,830,612
- Issue date Nov 3, 1998
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask and method of creating mask as well as electron-beam exposure...
- Patent number 5,824,437
- Issue date Oct 20, 1998
- Fujitsu Limited
- Takayuki Sakakibara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,757,015
- Issue date May 26, 1998
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,721,432
- Issue date Feb 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,719,402
- Issue date Feb 17, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Block exposure pattern data extracting system and method for charge...
- Patent number 5,590,048
- Issue date Dec 31, 1996
- Fujitsu Limited
- Tomohiko Abe
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,546,319
- Issue date Aug 13, 1996
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern judging method, mask producing method, and method of dividi...
- Patent number 5,537,487
- Issue date Jul 16, 1996
- Fujitsu Limited
- Masaaki Miyajima
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Transparent mask plate for charged particle beam exposure apparatus...
- Patent number 5,432,314
- Issue date Jul 11, 1995
- Fujitsu Limited
- Satoru Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask and charged particle beam exposure method using the mask
- Patent number 5,422,491
- Issue date Jun 6, 1995
- Fujitsu Limited
- Kiichi Sakamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure apparatus and method of cleaning the...
- Patent number 5,401,974
- Issue date Mar 28, 1995
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask and charged particle beam exposure method using the mask
- Patent number 5,393,988
- Issue date Feb 28, 1995
- Fujitsu Limited
- Kiichi Sakamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam exposure system and method of exposing a patt...
- Patent number 5,391,886
- Issue date Feb 21, 1995
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Stencil mask and charge particle beam exposure method and apparatus...
- Patent number 5,376,802
- Issue date Dec 27, 1994
- Fujitsu Limited
- Kiichi Sakamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of exposing patttern of semiconductor devices and stencil ma...
- Patent number 5,364,718
- Issue date Nov 15, 1994
- Fujitsu Limited
- Yoshihisa Oae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for exposing a pattern on an object by a charged particle beam
- Patent number 5,349,197
- Issue date Sep 20, 1994
- Fujitsu Limited
- Kiichi Sakamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern judging method and mask producing method using the pattern...
- Patent number 5,347,592
- Issue date Sep 13, 1994
- Fujitsu Limited
- Hiroshi Yasuda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Stencil mask and charged particle beam exposure method and apparatu...
- Patent number 5,288,567
- Issue date Feb 22, 1994
- Fujitsu Limited
- Kiichi Sakamoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam exposure method and apparatus
- Patent number 5,276,334
- Issue date Jan 4, 1994
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam exposure system
- Patent number 5,276,331
- Issue date Jan 4, 1994
- Fujitsu Limited
- Yoshihisa Oae
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Blanking aperture array and charged particle beam exposure method
- Patent number 5,262,341
- Issue date Nov 16, 1993
- Fujitsu Limited
- Shunsuke Fueki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Charged-particle-beam exposure device and charged-particle-beam exp...
- Publication number 20010013581
- Publication date Aug 16, 2001
- Akio Takemoto
- B82 - NANO-TECHNOLOGY

Kiichi Sakamoto

Person

Patents Grantslast 30 patents

Charged-particle-beam exposure device and charged-particle-beam exp...

Charged-particle-beam exposure device and charged-particle-beam exp...

Charged particle-beam exposure device and charged-particle-beam exp...

Electron beam exposure mask and method of manufacturing the same an...

Method of producing block mask for electron-beam lithography appara...

Charged-particle-beam exposure device and charged-particle-beam exp...

Method of providing changed particle beam exposure in which represe...

Mask and method of creating mask as well as electron-beam exposure...

Electron beam exposure mask and method of manufacturing the same an...

Method of detecting a deficiency in a charged-particle-beam exposur...

Mask and method of creating mask as well as electron-beam exposure...

Charged-particle-beam exposure device and charged-particle-beam exp...

Method of and system for charged particle beam exposure

Method of and system for charged particle beam exposure

Block exposure pattern data extracting system and method for charge...

Method of and system for charged particle beam exposure

Pattern judging method, mask producing method, and method of dividi...

Transparent mask plate for charged particle beam exposure apparatus...

Mask and charged particle beam exposure method using the mask

Charged particle beam exposure apparatus and method of cleaning the...

Mask and charged particle beam exposure method using the mask

Charged particle beam exposure system and method of exposing a patt...

Stencil mask and charge particle beam exposure method and apparatus...

Method of exposing patttern of semiconductor devices and stencil ma...

Method for exposing a pattern on an object by a charged particle beam

Pattern judging method and mask producing method using the pattern...

Stencil mask and charged particle beam exposure method and apparatu...

Charged particle beam exposure method and apparatus

Electron beam exposure system

Blanking aperture array and charged particle beam exposure method

Patents Applicationslast 30 patents

Charged-particle-beam exposure device and charged-particle-beam exp...