Kiichiro Mukai

Person

Hachioji, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Integrated circuit having reduced soft errors and reduced penetrati...
- Patent number 6,747,339
- Issue date Jun 8, 2004
- Hitachi, Ltd.
- Kiichiro Mukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,643,473
- Issue date Jul 1, 1997
- Hitachi, Ltd.
- Shinichi Tachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit having reduced soft errors and reduced penetrati...
- Patent number 5,391,915
- Issue date Feb 21, 1995
- Hatachi, Ltd.
- Kiichiro Mukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 5,292,673
- Issue date Mar 8, 1994
- Hitachi, Ltd.
- Hiroshi Shinriki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching method
- Patent number 5,147,500
- Issue date Sep 15, 1992
- Hitachi, Ltd.
- Shinichi Tachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing a semiconductor device
- Patent number 5,079,191
- Issue date Jan 7, 1992
- Hitachi, Ltd.
- Hiroshi Shinriki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Superconducting alloys comprising tungsten, molybdenum, silicon and...
- Patent number 5,013,526
- Issue date May 7, 1991
- Hitachi, Ltd.
- Nobuyoshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching apparatus
- Patent number 4,956,043
- Issue date Sep 11, 1990
- Hitachi, Ltd.
- Masafumi Kanetomo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 4,943,344
- Issue date Jul 24, 1990
- Hitachi, Ltd.
- Shinichi Tachi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor capacitor device with dual dielectric
- Patent number 4,937,650
- Issue date Jun 26, 1990
- Hitachi, Ltd.
- Hiroshi Shinriki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for producing the same
- Patent number 4,926,238
- Issue date May 15, 1990
- Hitachi, Ltd.
- Kiichiro Mukai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Titanium nitride film in contact hole with large aspect ratio
- Patent number 4,897,709
- Issue date Jan 30, 1990
- Hitachi, Ltd.
- Natsuki Yokoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 4,891,684
- Issue date Jan 2, 1990
- Hitachi, Ltd.
- Yasushiro Nishioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for surface treatment
- Patent number 4,857,137
- Issue date Aug 15, 1989
- Hitachi, Ltd.
- Shinichi Tachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a copper film by chemical vapor deposition
- Patent number 4,842,891
- Issue date Jun 27, 1989
- Hitachi, Ltd.
- Hiroshi Miyazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor memory device
- Patent number 4,809,052
- Issue date Feb 28, 1989
- Hitachi, Ltd.
- Yasushiro Nishioka
- G11 - INFORMATION STORAGE
Information Patent Grant
Semiconductor device
- Patent number 4,636,833
- Issue date Jan 13, 1987
- Hitachi, Ltd.
- Yasushiro Nishioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film deposition
- Patent number 4,599,135
- Issue date Jul 8, 1986
- Hitachi, Ltd.
- Sukeyoshi Tsunekawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Three-dimensional semiconductor device with thin film monocrystalli...
- Patent number 4,570,175
- Issue date Feb 11, 1986
- Hitachi, Ltd.
- Masanobu Miyao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with high density low temperature deposited Si...
- Patent number 4,365,264
- Issue date Dec 21, 1982
- Hitachi, Ltd.
- Kiichiro Mukai
- H01 - BASIC ELECTRIC ELEMENTS

Kiichiro Mukai

Person

Patents Grantslast 30 patents

Integrated circuit having reduced soft errors and reduced penetrati...

Dry etching method

Integrated circuit having reduced soft errors and reduced penetrati...

Method of manufacturing a semiconductor device

Dry etching method

Process for producing a semiconductor device

Superconducting alloys comprising tungsten, molybdenum, silicon and...

Dry etching apparatus

Etching method

Semiconductor capacitor device with dual dielectric

Semiconductor device and method for producing the same

Titanium nitride film in contact hole with large aspect ratio

Semiconductor device

Process for surface treatment

Method of forming a copper film by chemical vapor deposition

Semiconductor memory device

Semiconductor device

Thin film deposition

Three-dimensional semiconductor device with thin film monocrystalli...

Semiconductor device with high density low temperature deposited Si...