Kilho Lee

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Wappingers Falls, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Formation of dual work function gate electrode
- Patent number 6,867,087
- Issue date Mar 15, 2005
- Infineon Technologies AG
- Kilho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual gate oxide process without critical resist and without N2 implant
- Patent number 6,579,766
- Issue date Jun 17, 2003
- Infineon Technologies AG
- Helmut H. Tews
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to prevent oxygen out-diffusion from BSTO containing micro-e...
- Patent number 6,214,661
- Issue date Apr 10, 2001
- Infineon Technologoies North America Corp.
- Heon Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Formation of dual work function gate electrode
- Publication number 20030096471
- Publication date May 22, 2003
- Infineon Technologies North America Corp.
- Kilho Lee
- H01 - BASIC ELECTRIC ELEMENTS