Kimihiro Matsuse

Person

Tama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for real-time sensing of properties in industr...
- Patent number 11,114,321
- Issue date Sep 7, 2021
- Tokyo Electron Limited
- Sylvain Ballandras
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Method of forming a metal film for electrode
- Patent number 7,829,144
- Issue date Nov 9, 2010
- Tokyo Electron Limited
- Kimihiro Matsuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
TiSiN film forming method, diffusion barrier TiSiN film, semiconduc...
- Patent number 7,153,773
- Issue date Dec 26, 2006
- Tokyo Electron Limited
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming TiSiN film, diffusion preventive film comprising...
- Patent number 6,919,273
- Issue date Jul 19, 2005
- Tokyo Electron Limited
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a barrier film and method of forming wiring struc...
- Patent number 6,861,356
- Issue date Mar 1, 2005
- Tokyo Electron Limited
- Kimihiro Matsuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming semiconductor wiring structures
- Patent number 6,838,376
- Issue date Jan 4, 2005
- Tokyo Electron Limited
- Kimihiro Matsuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 6,576,062
- Issue date Jun 10, 2003
- Tokyo Electron Limited
- Kimihiro Matsuse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a laminated structure to enhance metal silicide a...
- Patent number 6,489,208
- Issue date Dec 3, 2002
- Tokyo Electron Limited
- Masato Koizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for forming a film on an object to be processed
- Patent number 6,454,909
- Issue date Sep 24, 2002
- Tokyo Electron Limited
- Kimihiro Matsuse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Laminated structure and a method of forming the same
- Patent number 6,404,021
- Issue date Jun 11, 2002
- Tokyo Electron Limited
- Masato Koizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus and processing system
- Patent number 6,251,191
- Issue date Jun 26, 2001
- Tokyo Electron Limited
- Kimihiro Matsuse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for forming laminated thin films or layers
- Patent number 6,251,188
- Issue date Jun 26, 2001
- Tokyo Electron Limited
- Tsuyoshi Hashimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming tungsten silicide film
- Patent number 6,245,673
- Issue date Jun 12, 2001
- Tokyo Electron Limited
- Kazuya Okubo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming laminated thin films or layers
- Patent number 6,022,586
- Issue date Feb 8, 2000
- Tokyo Electron Limited
- Tsuyoshi Hashimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat treatment apparatus
- Patent number 5,997,651
- Issue date Dec 7, 1999
- Tokyo Electron Limited
- Kimihiro Matsuse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 5,951,772
- Issue date Sep 14, 1999
- Tokyo Electron Limited
- Kimihiro Matsuse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum processing apparatus
- Patent number 5,647,945
- Issue date Jul 15, 1997
- Tokyo Electron Limited
- Kimihiro Matsuse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Treating method
- Patent number 4,913,790
- Issue date Apr 3, 1990
- Tokyo Electron Limited
- Tomonori Narita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR REAL-TIME SENSING OF PROPERTIES IN INDUSTR...
- Publication number 20210343560
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Sylvain Ballandras
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR REAL-TIME SENSING OF PROPERTIES IN INDUSTR...
- Publication number 20190057887
- Publication date Feb 21, 2019
- TOKYO ELECTRON LIMITED
- Sylvain Ballandras
- G01 - MEASURING TESTING
Information Patent Application
Method of forming a metal film for electrode
- Publication number 20050191803
- Publication date Sep 1, 2005
- TOKYO ELECTRON LIMITED
- Kimihiro Matsuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TiSiN film forming method, diffusion barrier TiSiN film, semiconduc...
- Publication number 20040232467
- Publication date Nov 25, 2004
- Hayashi Otsuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WIRING STRUCTURE OF SEMICONDUCTOR DEVICE, ELECTRODE, AND METHOD FOR...
- Publication number 20030034560
- Publication date Feb 20, 2003
- Kimihiro Matsuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a barrier film and method of forming wiring struc...
- Publication number 20020197856
- Publication date Dec 26, 2002
- Kimihiro Matsuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Laminated structure and a method of forming the same
- Publication number 20020058384
- Publication date May 16, 2002
- Masato Koizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film forming apparatus and film forming method
- Publication number 20010007244
- Publication date Jul 12, 2001
- Kimihiro Matsuse
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kimihiro Matsuse

Person

Patents Grantslast 30 patents

Apparatus and method for real-time sensing of properties in industr...

Method of forming a metal film for electrode

TiSiN film forming method, diffusion barrier TiSiN film, semiconduc...

Method for forming TiSiN film, diffusion preventive film comprising...

Method of forming a barrier film and method of forming wiring struc...

Method of forming semiconductor wiring structures

Film forming apparatus and film forming method

Method of forming a laminated structure to enhance metal silicide a...

Method and apparatus for forming a film on an object to be processed

Laminated structure and a method of forming the same

Processing apparatus and processing system

Apparatus for forming laminated thin films or layers

Method of forming tungsten silicide film

Method and apparatus for forming laminated thin films or layers

Heat treatment apparatus

Vacuum processing apparatus

Vacuum processing apparatus

Treating method

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR REAL-TIME SENSING OF PROPERTIES IN INDUSTR...

APPARATUS AND METHOD FOR REAL-TIME SENSING OF PROPERTIES IN INDUSTR...

Method of forming a metal film for electrode

TiSiN film forming method, diffusion barrier TiSiN film, semiconduc...

WIRING STRUCTURE OF SEMICONDUCTOR DEVICE, ELECTRODE, AND METHOD FOR...

Method of forming a barrier film and method of forming wiring struc...

Laminated structure and a method of forming the same

Film forming apparatus and film forming method