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Fuji, JP
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last 30 patents
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Patent Grant
Highly heat-resistant, negative-type photosensitive resin composition
Patent number
7,282,323
Issue date
Oct 16, 2007
Asahi Kasei EMD Corporation
Ryuichiro Kanatani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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last 30 patents
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Patent Application
Highly heat-resistant, negative-type photosensitive resin composition
Publication number
20050244739
Publication date
Nov 3, 2005
Ryuichiro Kanatani
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY