King Wai Kelwin Ko

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for providing contact to a first polysilicon laye...
- Patent number 8,507,969
- Issue date Aug 13, 2013
- Spansion LLC
- Mark S. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Void-free interlayer dielectric (ILD0) for 0.18-micron flash memory...
- Patent number 6,627,973
- Issue date Sep 30, 2003
- Advanced Micro Devices, Inc.
- Minh Van Ngo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for providing a robust alignment mark at thin oxi...
- Patent number 6,603,211
- Issue date Aug 5, 2003
- Advanced Micro Devices, Inc.
- Michael K. Templeton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a void-free interlayer dielectric (ILD0) for 0.18...
- Patent number 6,489,253
- Issue date Dec 3, 2002
- Advanced Micro Devices, Inc.
- Minh Van Ngo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for etching tunnel oxide to reduce undercutting d...
- Patent number 6,472,327
- Issue date Oct 29, 2002
- Advanced Micro Devices, Inc.
- King Wai Kelwin Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for processing a semiconductor device
- Patent number 6,448,594
- Issue date Sep 10, 2002
- Advanced Micro Devices, Inc.
- Maria C. Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for providing contacts with greater tolerance for...
- Patent number 6,445,051
- Issue date Sep 3, 2002
- Advanced Micro Devices, Inc.
- Mark S. Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing stress corrosion induced voiding of patterned me...
- Patent number 6,333,263
- Issue date Dec 25, 2001
- Advanced Micro Devices, Inc.
- Minh Van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment to reduce stress corrosion induced voiding of patt...
- Patent number 6,251,776
- Issue date Jun 26, 2001
- Advanced Micro Devices, Inc.
- Minh Van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Efficient in-situ resist strip process for heavy polymer metal etch
- Patent number 6,130,169
- Issue date Oct 10, 2000
- Advanced Micro Devices, Inc.
- Jeffrey A. Shields
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Method and system for etching tunnel oxide to reduce undercutting d...
- Publication number 20020028583
- Publication date Mar 7, 2002
- Advanced Micro Devices, Inc.
- King Wai Kelwin Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of reducing stress corrosion induced voiding of patterned me...
- Publication number 20010007791
- Publication date Jul 12, 2001
- Advanced Micro Devices, Inc.
- Minh Van Ngo
- H01 - BASIC ELECTRIC ELEMENTS

King Wai Kelwin Ko

Person

Patents Grantslast 30 patents

Method and system for providing contact to a first polysilicon laye...

Void-free interlayer dielectric (ILD0) for 0.18-micron flash memory...

Method and system for providing a robust alignment mark at thin oxi...

Method of forming a void-free interlayer dielectric (ILD0) for 0.18...

Method and system for etching tunnel oxide to reduce undercutting d...

Method and system for processing a semiconductor device

Method and system for providing contacts with greater tolerance for...

Method of reducing stress corrosion induced voiding of patterned me...

Plasma treatment to reduce stress corrosion induced voiding of patt...

Efficient in-situ resist strip process for heavy polymer metal etch

Patents Applicationslast 30 patents

Method and system for etching tunnel oxide to reduce undercutting d...

Method of reducing stress corrosion induced voiding of patterned me...