Kinya Ueno

Person

Nirasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus for resist film removal
- Patent number 7,191,785
- Issue date Mar 20, 2007
- Tokyo Electron Limited
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of cleaning objects to be processed
- Patent number 6,746,543
- Issue date Jun 8, 2004
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Substrate processing method and apparatus
- Patent number 6,613,692
- Issue date Sep 2, 2003
- Tokyo Electron Limited
- Takayuki Toshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning tool, having permeable cleaning head
- Patent number 6,554,010
- Issue date Apr 29, 2003
- Tokyo Electron Limited
- Keizo Hirose
- B08 - CLEANING
Information Patent Grant
Apparatus for and method of cleaning object to be processed
- Patent number 6,491,045
- Issue date Dec 10, 2002
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Apparatus for and method of cleaning objects to be processed
- Patent number 6,413,355
- Issue date Jul 2, 2002
- Tokyo Electron Limited
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,394,110
- Issue date May 28, 2002
- Tokyo Electron Limited
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of cleaning objects to be processed
- Patent number 6,342,104
- Issue date Jan 29, 2002
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Method of cleaning objects to be processed
- Patent number 6,319,329
- Issue date Nov 20, 2001
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,299,696
- Issue date Oct 9, 2001
- Tokyo Electron Limited
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of cleaning object to be processed
- Patent number 6,131,588
- Issue date Oct 17, 2000
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Apparatus for and method of cleaning objects to be processed
- Patent number 6,050,275
- Issue date Apr 18, 2000
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Apparatus for and method of cleaning objects to be processed
- Patent number 6,045,624
- Issue date Apr 4, 2000
- Tokyo Electron Limited
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate washing method, substrate washing-drying method, substrat...
- Patent number 6,001,191
- Issue date Dec 14, 1999
- Tokyo Electron Limited
- Yuuji Kamikawa
- B08 - CLEANING
Information Patent Grant
Apparatus and method for drying substrates
- Patent number 5,940,985
- Issue date Aug 24, 1999
- Tokyo Electron Limited
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin cleaning method
- Patent number 5,882,433
- Issue date Mar 16, 1999
- Tokyo Electron Limited
- Kinya Ueno
- B08 - CLEANING
Information Patent Grant
Method for washing wafers
- Patent number 5,421,905
- Issue date Jun 6, 1995
- Tokyo Electron Limited
- Kinya Ueno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Washing apparatus
- Patent number 5,261,431
- Issue date Nov 16, 1993
- Tokyo Electron Limited
- Kinya Ueno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning device
- Patent number 5,236,515
- Issue date Aug 17, 1993
- Tokyo Electron Limited
- Kinya Ueno
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
Substrate processing apparatus for resist film removal
- Publication number 20070204885
- Publication date Sep 6, 2007
- TOKYO ELECTRON LIMITED
- Takayuki Toshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing method and apparatus
- Publication number 20050011537
- Publication date Jan 20, 2005
- TOKYO ELECTRON LIMITED
- Takayuki Toshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for and method of cleaning objects to be processed
- Publication number 20030159718
- Publication date Aug 28, 2003
- Yuji Kamikawa
- B08 - CLEANING
Information Patent Application
Apparatus for and method of cleaning object to be processed
- Publication number 20020017315
- Publication date Feb 14, 2002
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20010045224
- Publication date Nov 29, 2001
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20010004898
- Publication date Jun 28, 2001
- TOKYO ELECTRON LIMITED OF JAPAN
- Yuji Kamikawa
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Substrate processing apparatus for resist film removal

Apparatus for and method of cleaning objects to be processed

Substrate processing method and apparatus

Substrate cleaning tool, having permeable cleaning head

Apparatus for and method of cleaning object to be processed

Apparatus for and method of cleaning objects to be processed

Substrate processing apparatus and substrate processing method

Method of cleaning objects to be processed

Method of cleaning objects to be processed

Substrate processing apparatus and substrate processing method

Apparatus for and method of cleaning object to be processed

Apparatus for and method of cleaning objects to be processed

Apparatus for and method of cleaning objects to be processed

Substrate washing method, substrate washing-drying method, substrat...

Apparatus and method for drying substrates

Spin cleaning method

Method for washing wafers

Washing apparatus

Cleaning device

Patents Applicationslast 30 patents

Substrate processing apparatus for resist film removal

Substrate processing method and apparatus

Apparatus for and method of cleaning objects to be processed

Apparatus for and method of cleaning object to be processed

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method