Kiwamu Fujimoto

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Nirasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method for etching an object to be processed
- Patent number 7,507,673
- Issue date Mar 24, 2009
- Tokyo Electron Limited
- Takashi Fuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,473,377
- Issue date Jan 6, 2009
- Tokyo Electron Limited
- Tomoyo Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching object to be processed
- Patent number 7,432,207
- Issue date Oct 7, 2008
- Tokyo Electron Limited
- Takashi Fuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulation film etching method
- Patent number 6,967,171
- Issue date Nov 22, 2005
- Tokyo Electron Limited
- Kiwamu Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR ETCHING AN OBJECT TO BE PROCESSED
- Publication number 20070111530
- Publication date May 17, 2007
- TOKYO ELECTRON LIMITED
- TAKASHI FUSE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Insulation film etching method
- Publication number 20050112879
- Publication date May 26, 2005
- Kiwamu Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20050103748
- Publication date May 19, 2005
- TOKYO ELECTRON LIMITED
- Tomoyo Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching
- Publication number 20050101140
- Publication date May 12, 2005
- TOKYO ELECTRON LIMITED
- Tomoyo Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for etching object to be processed
- Publication number 20040206725
- Publication date Oct 21, 2004
- Takashi Fuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method and apparatus
- Publication number 20040192053
- Publication date Sep 30, 2004
- TOKYO ELECTRON LIMITED
- Kiwamu Fujimoto
- H01 - BASIC ELECTRIC ELEMENTS