Klaus Martin HUMMLER

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System for monitoring a plasma
- Patent number 12,171,053
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,340,532
- Issue date May 24, 2022
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for monitoring a plasma
- Patent number 11,266,002
- Issue date Mar 1, 2022
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Guiding device and associated system
- Patent number 10,955,749
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Dzmitry Labetski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20240160109
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20240085796
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20220291591
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OXYGEN-LOSS RESISTANT TOP COATING FOR OPTICAL ELEMENTS
- Publication number 20220260756
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR MONITORING A PLASMA
- Publication number 20220151052
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Michael Anthony Purvis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20210141311
- Publication date May 13, 2021
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20210109452
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR MONITORING A PLASMA
- Publication number 20200344868
- Publication date Oct 29, 2020
- ASML NETHERLANDS B.V.
- Michael Anthony Purvis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20200089124
- Publication date Mar 19, 2020
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Klaus Martin HUMMLER

Person

Patents Grantslast 30 patents

System for monitoring a plasma

Prolonging optical element lifetime in an EUV lithography system

Prolonging optical element lifetime in an EUV lithography system

System for monitoring a plasma

Guiding device and associated system

Patents Applicationslast 30 patents

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

GUIDING DEVICE AND ASSOCIATED SYSTEM

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

OXYGEN-LOSS RESISTANT TOP COATING FOR OPTICAL ELEMENTS

SYSTEM FOR MONITORING A PLASMA

GUIDING DEVICE AND ASSOCIATED SYSTEM

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

SYSTEM FOR MONITORING A PLASMA

GUIDING DEVICE AND ASSOCIATED SYSTEM