Koen Cuypers

Person

Lommel, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Fluid handling structure for lithographic apparatus
- Patent number 11,860,546
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Pepijn Van Den Eijnden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluid handling structure for lithographic apparatus
- Patent number 11,454,892
- Issue date Sep 27, 2022
- ASML Netherlands B.V.
- Pepijn Van Den Eijnden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pressure control valve, a fluid handling structure for lithographic...
- Patent number 11,199,771
- Issue date Dec 14, 2021
- ASML Netherlands B.V.
- Stef Marten Johan Janssens
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Fluid handling structure for lithographic apparatus
- Patent number 11,029,607
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Pepijn Van Den Eijnden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gas flow optimization in reticle stage environment
- Patent number 10,031,428
- Issue date Jul 24, 2018
- ASML Netherlands B.V.
- Koen Cuypers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,939,740
- Issue date Apr 10, 2018
- ASML Netherlands B.V.
- Günes Nakiboglu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,013,673
- Issue date Apr 21, 2015
- ASML Netherlands B.V.
- Jeroen Gerard Gosen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a device manufacturing method
- Patent number 8,755,026
- Issue date Jun 17, 2014
- ASML Netherlands B.V.
- Jeroen Gerard Gosen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS
- Publication number 20230053840
- Publication date Feb 23, 2023
- ASML NETHERLANDS B.V.
- Pepijn VAN DEN EIJNDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC...
- Publication number 20220075264
- Publication date Mar 10, 2022
- ASML NETHERLANDS B.V.
- Stef Marten Johan JANSSENS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS
- Publication number 20210263424
- Publication date Aug 26, 2021
- ASML NETHERLANDS B.V.
- Pepijn VAN DEN EIJNDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20210096471
- Publication date Apr 1, 2021
- ASML NETHERLANDS B.V.
- Erik Henricus Egidius Catharina EUMMELEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS
- Publication number 20200409270
- Publication date Dec 31, 2020
- ASML NETHERLANDS B.V.
- Pepijn VAN DEN EIJNDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPH...
- Publication number 20200041895
- Publication date Feb 6, 2020
- ASML NETHERLANDS B.V.
- Stef Marten Johan JANSSENS
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20160349631
- Publication date Dec 1, 2016
- ASML NETHERLANDS B.V.
- Günes NAKIBOGLU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Gas Flow Optimization in Reticle Stage Environment
- Publication number 20150355557
- Publication date Dec 10, 2015
- ASML NETHERLANDS B.V.
- Koen CUYPERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
- Publication number 20110149258
- Publication date Jun 23, 2011
- ASML NETHERLANDS B.V.
- Jeroen Gerard Gosen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20110129782
- Publication date Jun 2, 2011
- ASML NETHERLANDS B.V.
- Jeroen Gerard GOSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Koen Cuypers

Person

Patents Grantslast 30 patents

Fluid handling structure for lithographic apparatus

Fluid handling structure for lithographic apparatus

Pressure control valve, a fluid handling structure for lithographic...

Fluid handling structure for lithographic apparatus

Gas flow optimization in reticle stage environment

Lithographic apparatus and device manufacturing method

Lithographic apparatus and device manufacturing method

Lithographic apparatus and a device manufacturing method

Patents Applicationslast 30 patents

FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS

PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC...

FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS

LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD

FLUID HANDLING STRUCTURE FOR LITHOGRAPHIC APPARATUS

A PRESSURE CONTROL VALVE, A FLUID HANDLING STRUCTURE FOR LITHOGRAPH...

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Gas Flow Optimization in Reticle Stage Environment

LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD