Kohei FUKUSHIMA

Person

Oshu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,054,828
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,560,628
- Issue date Jan 24, 2023
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical heat treatment apparatus
- Patent number 11,282,721
- Issue date Mar 22, 2022
- Tokyo Electron Limited
- Hiroki Iriuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 11,208,721
- Issue date Dec 28, 2021
- Tokyo Electron Limited
- Kohei Fukushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 10,475,641
- Issue date Nov 12, 2019
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, gas supply method, substrate proces...
- Patent number 10,287,682
- Issue date May 14, 2019
- Tokyo Electron Limited
- Kazuyuki Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus having ground electrode
- Patent number 9,970,111
- Issue date May 15, 2018
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Driving method of vertical heat treatment apparatus, storage medium...
- Patent number 9,776,202
- Issue date Oct 3, 2017
- Tokyo Electron Limited
- Yutaka Motoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dummy wafer
- Patent number D786810
- Issue date May 16, 2017
- Tokyo Electron Limited
- Yutaka Motoyama
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Dummy wafer
- Patent number D785576
- Issue date May 2, 2017
- Tokyo Electron Limited
- Yutaka Motoyama
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Dummy wafer
- Patent number D784937
- Issue date Apr 25, 2017
- Tokyo Electron Limited
- Yutaka Motoyama
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Film forming apparatus, film forming method, and non-transitory com...
- Patent number 9,624,579
- Issue date Apr 18, 2017
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Operating method of vertical heat treatment apparatus, storage medi...
- Patent number 9,487,859
- Issue date Nov 8, 2016
- Tokyo Electron Limited
- Yutaka Motoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,608,902
- Issue date Dec 17, 2013
- Tokyo Electron Limited
- Kohei Fukushima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 8,336,490
- Issue date Dec 25, 2012
- Tokyo Electron Limited
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical plasma processing method for forming silicon containing film
- Patent number 7,825,039
- Issue date Nov 2, 2010
- Tokyo Electron Limited
- Toshiki Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming silicon-containing insulating film
- Patent number 7,758,920
- Issue date Jul 20, 2010
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD method for forming silicon nitride film
- Patent number 7,462,376
- Issue date Dec 9, 2008
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon nitride film forming method, silicon nitride film forming s...
- Patent number 7,156,923
- Issue date Jan 2, 2007
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precleaning method of precleaning a silicon nitride film forming sy...
- Patent number 6,844,273
- Issue date Jan 18, 2005
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Substrate Processing Method and Substrate Processing Apparatus
- Publication number 20230119730
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Method and Substrate Processing Apparatus
- Publication number 20230118483
- Publication date Apr 20, 2023
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT TREATMENT APPARATUS
- Publication number 20200058526
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Hiroki IRIUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Method and Substrate Processing Apparatus
- Publication number 20190093230
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20180258528
- Publication date Sep 13, 2018
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas Introduction Mechanism and Processing Apparatus
- Publication number 20180087156
- Publication date Mar 29, 2018
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20180076021
- Publication date Mar 15, 2018
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Apparatus, Gas Supply Method, Substrate Proces...
- Publication number 20170275757
- Publication date Sep 28, 2017
- TOKYO ELECTRON LIMITED
- Kazuyuki KIKUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT TREATMENT APPARATUS
- Publication number 20170114464
- Publication date Apr 27, 2017
- TOKYO ELECTRON LIMITED
- Hiroki IRIUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Apparatus
- Publication number 20160024654
- Publication date Jan 28, 2016
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT TREATMENT APPARATUS AND METHOD OF OPERATING VERTICAL...
- Publication number 20150376789
- Publication date Dec 31, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, FILM FORMING METHOD, AND NON-TRANSITORY COM...
- Publication number 20150275366
- Publication date Oct 1, 2015
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate Processing Apparatus
- Publication number 20150275359
- Publication date Oct 1, 2015
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Apparatus Using Gas Nozzles
- Publication number 20150275368
- Publication date Oct 1, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPERATING METHOD OF VERTICAL HEAT TREATMENT APPARATUS, STORAGE MEDI...
- Publication number 20150267293
- Publication date Sep 24, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL HEAT TREATMENT APPARATUS, METHOD OF OPERATING VERTICAL HEA...
- Publication number 20150259799
- Publication date Sep 17, 2015
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20150007772
- Publication date Jan 8, 2015
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRIVING METHOD OF VERTICAL HEAT TREATMENT APPARATUS, STORAGE MEDIUM...
- Publication number 20140295082
- Publication date Oct 2, 2014
- TOKYO ELECTRON LIMITED
- Yutaka MOTOYAMA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120103525
- Publication date May 3, 2012
- TOKYO ELECTON LIMITED
- Hiroyuki MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100186898
- Publication date Jul 29, 2010
- TOKYO ELECTRON LIMITED
- Kohei FUKUSHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL PLASMA PROCESSING APPARATUS AND METHOD FOR SEMICONDUCTOR P...
- Publication number 20090181548
- Publication date Jul 16, 2009
- Toshiki Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus
- Publication number 20090056877
- Publication date Mar 5, 2009
- TOKYO ELECTRON LIMITED
- Hiroyuki Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICAL PLASMA PROCESSING APPARATUS AND METHOD FOR SEMICONDUCTOR P...
- Publication number 20070234961
- Publication date Oct 11, 2007
- Toshiki Takahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming silicon-containing insulating film
- Publication number 20070032047
- Publication date Feb 8, 2007
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cvd method for forming silicon nitride film
- Publication number 20060286817
- Publication date Dec 21, 2006
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon nitride film forming method, silicon nitride film forming s...
- Publication number 20050081789
- Publication date Apr 21, 2005
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon nitride film forming method, silicon nitride film forming s...
- Publication number 20020106909
- Publication date Aug 8, 2002
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Kohei FUKUSHIMA

Person

Patents Grantslast 30 patents

Substrate processing method and substrate processing apparatus

Substrate processing method and substrate processing apparatus

Vertical heat treatment apparatus

Substrate processing apparatus

Substrate processing apparatus

Substrate processing apparatus, gas supply method, substrate proces...

Substrate processing apparatus having ground electrode

Driving method of vertical heat treatment apparatus, storage medium...

Dummy wafer

Dummy wafer

Dummy wafer

Film forming apparatus, film forming method, and non-transitory com...

Operating method of vertical heat treatment apparatus, storage medi...

Plasma processing apparatus

Plasma processing apparatus

Vertical plasma processing method for forming silicon containing film

Method and apparatus for forming silicon-containing insulating film

CVD method for forming silicon nitride film

Silicon nitride film forming method, silicon nitride film forming s...

Precleaning method of precleaning a silicon nitride film forming sy...

Patents Applicationslast 30 patents

Substrate Processing Method and Substrate Processing Apparatus

Substrate Processing Method and Substrate Processing Apparatus

VERTICAL HEAT TREATMENT APPARATUS

Substrate Processing Method and Substrate Processing Apparatus

SUBSTRATE PROCESSING APPARATUS

Gas Introduction Mechanism and Processing Apparatus

SUBSTRATE PROCESSING APPARATUS

Substrate Processing Apparatus, Gas Supply Method, Substrate Proces...

VERTICAL HEAT TREATMENT APPARATUS

Film Forming Apparatus

VERTICAL HEAT TREATMENT APPARATUS AND METHOD OF OPERATING VERTICAL...

FILM FORMING APPARATUS, FILM FORMING METHOD, AND NON-TRANSITORY COM...

Substrate Processing Apparatus

Film Forming Apparatus Using Gas Nozzles

OPERATING METHOD OF VERTICAL HEAT TREATMENT APPARATUS, STORAGE MEDI...

VERTICAL HEAT TREATMENT APPARATUS, METHOD OF OPERATING VERTICAL HEA...

SUBSTRATE PROCESSING APPARATUS

DRIVING METHOD OF VERTICAL HEAT TREATMENT APPARATUS, STORAGE MEDIUM...

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

VERTICAL PLASMA PROCESSING APPARATUS AND METHOD FOR SEMICONDUCTOR P...

Plasma processing apparatus

VERTICAL PLASMA PROCESSING APPARATUS AND METHOD FOR SEMICONDUCTOR P...

Method and apparatus for forming silicon-containing insulating film

Cvd method for forming silicon nitride film

Silicon nitride film forming method, silicon nitride film forming s...

Silicon nitride film forming method, silicon nitride film forming s...