Kohei Kawamura

Person

Hosaka-cho Nirasaki-shi Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 10,872,779
- Issue date Dec 22, 2020
- HITACHI HIGH-TECH CORPORATION
- Nobuya Miyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated type ion shield for semiconductor manufacturing apparatus
- Patent number D901407
- Issue date Nov 10, 2020
- HITACHI HIGH-TECH CORPORATION
- Yutaka Kouzuma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Ion shield plate for semiconductor manufacturing apparatus
- Patent number D900760
- Issue date Nov 3, 2020
- HITACHI HIGH-TECH CORPORATION
- Yutaka Kouzuma
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Etching method and etching apparatus
- Patent number 10,418,254
- Issue date Sep 17, 2019
- Hitachi High-Technologies Corporation
- Kazunori Shinoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulating film and method for manufacturing sem...
- Patent number 9,640,388
- Issue date May 2, 2017
- Tokyo Electron Limited
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process device and plasma process method
- Patent number 8,394,231
- Issue date Mar 12, 2013
- Tokyo Electron Limited
- Koichi Takatsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 8,017,197
- Issue date Sep 13, 2011
- Tokyo Electron Limited
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Interlayer insulating film, wiring structure and electronic device...
- Patent number 7,923,819
- Issue date Apr 12, 2011
- National Iniversity Corporation Tohoku University
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 7,897,205
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Takatoshi Kameshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate for electronic device capable of suppressing fluorine ato...
- Patent number 7,776,736
- Issue date Aug 17, 2010
- Tokyo Electron Limited
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas switching mechanism for plasma processing apparatus
- Patent number 7,717,061
- Issue date May 18, 2010
- Tokyo Electron Limited
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device, method for manufacturing semiconductor device...
- Patent number 7,704,893
- Issue date Apr 27, 2010
- Tokyo Eectron Limited
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulation film and apparatus for forming insula...
- Patent number 7,601,402
- Issue date Oct 13, 2009
- Tokyo Electron Limited
- Yusaku Kashiwagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for supercritical carbon dioxide processing of fluoro-carbon...
- Patent number 7,307,019
- Issue date Dec 11, 2007
- Tokyo Electron Limited
- Kohei Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and fabrication method therefor
- Patent number 6,949,829
- Issue date Sep 27, 2005
- Tokyo Electron Limited
- Takashi Akahori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
ECR plasma generator and an ECR system using the generator
- Patent number 6,155,200
- Issue date Dec 5, 2000
- Tokyo Electron Limited
- Yasuhiro Horiike
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method in semiconductor processing system
- Patent number 5,958,258
- Issue date Sep 28, 1999
- Tokyo Electron Yamanashi Limited
- Hiroyuki Ishihara
- B24 - GRINDING POLISHING
Information Patent Grant
Plasma film forming method and apparatus and plasma processing appa...
- Patent number 5,531,834
- Issue date Jul 2, 1996
- Tokyo Electron Kabushiki Kaisha
- Shuichi Ishizuka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus using vertical gas inlets one on top of...
- Patent number 5,522,934
- Issue date Jun 4, 1996
- Tokyo Electron Limited
- Akira Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching apparatus and method therefor
- Patent number 5,476,182
- Issue date Dec 19, 1995
- Tokyo Electron Limited
- Shuichi Ishizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for processing surface of semiconductor layer
- Patent number 5,308,791
- Issue date May 3, 1994
- Tokyo Electron Limited
- Yasuhiro Horiike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming dielectric film for semiconductor devices
- Patent number 5,290,609
- Issue date Mar 1, 1994
- Tokyo Electron Limited
- Yasuhiro Horiike
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 5,252,892
- Issue date Oct 12, 1993
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion generator
- Patent number 5,101,110
- Issue date Mar 31, 1992
- Tokyo Electron Limited
- Masahiko Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam excitation ion source
- Patent number 5,089,747
- Issue date Feb 18, 1992
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam excited ion source
- Patent number 5,083,061
- Issue date Jan 21, 1992
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam excitation ion source
- Patent number 5,028,791
- Issue date Jul 2, 1991
- Tokyo Electron Ltd.
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion-producing apparatus
- Patent number 4,749,912
- Issue date Jun 7, 1988
- Rikagaku Kenkyusho
- Tamio Hara
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210358760
- Publication date Nov 18, 2021
- Hitachi High-Technologies Corporation
- Sumiko FUJISAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND ETCHING APPARATUS
- Publication number 20210242030
- Publication date Aug 5, 2021
- Hitachi High-Technologies Corporation
- Kazunori SHINODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20200006079
- Publication date Jan 2, 2020
- Hitachi High-Technologies Corporation
- Nobuya MIYOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20190067032
- Publication date Feb 28, 2019
- Hitachi High-Technologies Corporation
- Kazunori SHINODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND...
- Publication number 20170092588
- Publication date Mar 30, 2017
- Zeon Corporation
- Kotaro Miyatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...
- Publication number 20160240374
- Publication date Aug 18, 2016
- TOKYO ELECTRON LIMITED
- Shigeru KASAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AMORPHOUS CARBON FILM, SEMICONDUCTOR DEVICE, FILM FORMING METHOD, F...
- Publication number 20100032838
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Yoshiyuki Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTERLAYER INSULATING FILM, WIRING STRUCTURE AND ELECTRONIC DEVICE...
- Publication number 20100032844
- Publication date Feb 11, 2010
- NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20090061092
- Publication date Mar 5, 2009
- Tokyo Electron Limited
- Takatoshi Kameshima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing method
- Publication number 20070160757
- Publication date Jul 12, 2007
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma process device and plasma process method
- Publication number 20070131171
- Publication date Jun 14, 2007
- TOKYO ELECTRON LIMITED
- Koichi Takatsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20070077737
- Publication date Apr 5, 2007
- TOKYO ELECTRON LIMITED
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device, method for manufacturing semiconductor device...
- Publication number 20060264059
- Publication date Nov 23, 2006
- Yasuo Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma film-forming method and plasma film-forming apparatus
- Publication number 20060251828
- Publication date Nov 9, 2006
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for forming film, method for manufacturing semiconductor dev...
- Publication number 20060223306
- Publication date Oct 5, 2006
- Kohei Kawamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
A METHOD FOR SUPERCRITICAL CARBON DIOXIDE PROCESSING OF FLUORO-CARB...
- Publication number 20060068583
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Kohei Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thin-film formation in semiconductor device fabrication process and...
- Publication number 20060068104
- Publication date Mar 30, 2006
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing apparatus and processing method
- Publication number 20060027167
- Publication date Feb 9, 2006
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing apparatus
- Publication number 20040250765
- Publication date Dec 16, 2004
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for forming insulation film and apparatus for forming insula...
- Publication number 20040212114
- Publication date Oct 28, 2004
- TOKYO ELECTRON LIMITED
- Yusaku Kashiwagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing device and plasma processing method
- Publication number 20040127033
- Publication date Jul 1, 2004
- Koichi Takatsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate treatment device, substrate treatment method, and cleanin...
- Publication number 20040081757
- Publication date Apr 29, 2004
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor device and fabrication method therefor
- Publication number 20040041266
- Publication date Mar 4, 2004
- Takashi Akahori
- H01 - BASIC ELECTRIC ELEMENTS

Kohei Kawamura

Person

Patents Grantslast 30 patents

Plasma etching method and plasma etching apparatus

Integrated type ion shield for semiconductor manufacturing apparatus

Ion shield plate for semiconductor manufacturing apparatus

Etching method and etching apparatus

Method for forming insulating film and method for manufacturing sem...

Plasma process device and plasma process method

Plasma processing method and plasma processing apparatus

Interlayer insulating film, wiring structure and electronic device...

Film forming method and film forming apparatus

Substrate for electronic device capable of suppressing fluorine ato...

Gas switching mechanism for plasma processing apparatus

Semiconductor device, method for manufacturing semiconductor device...

Method for forming insulation film and apparatus for forming insula...

Method for supercritical carbon dioxide processing of fluoro-carbon...

Semiconductor device and fabrication method therefor

ECR plasma generator and an ECR system using the generator

Plasma processing method in semiconductor processing system

Plasma film forming method and apparatus and plasma processing appa...

Plasma processing apparatus using vertical gas inlets one on top of...

Etching apparatus and method therefor

Method and apparatus for processing surface of semiconductor layer

Method of forming dielectric film for semiconductor devices

Plasma processing apparatus

Ion generator

Electron beam excitation ion source

Electron beam excited ion source

Electron beam excitation ion source

Ion-producing apparatus

Patents Applicationslast 30 patents

PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND ETCHING APPARATUS

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

ETCHING METHOD AND ETCHING APPARATUS

FILM FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND...

METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEM...

AMORPHOUS CARBON FILM, SEMICONDUCTOR DEVICE, FILM FORMING METHOD, F...

INTERLAYER INSULATING FILM, WIRING STRUCTURE AND ELECTRONIC DEVICE...

FILM FORMING METHOD AND FILM FORMING APPARATUS

Processing method

Plasma process device and plasma process method

Plasma processing method and plasma processing apparatus

Semiconductor device, method for manufacturing semiconductor device...

Plasma film-forming method and plasma film-forming apparatus

Method for forming film, method for manufacturing semiconductor dev...

A METHOD FOR SUPERCRITICAL CARBON DIOXIDE PROCESSING OF FLUORO-CARB...

Thin-film formation in semiconductor device fabrication process and...

Processing apparatus and processing method

Processing apparatus

Method for forming insulation film and apparatus for forming insula...

Plasma processing device and plasma processing method

Substrate treatment device, substrate treatment method, and cleanin...

Semiconductor device and fabrication method therefor