Kohtaro Nagasawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Light-sensitive negative working composition with diazonium condens...
- Patent number 4,681,833
- Issue date Jul 21, 1987
- Somar Corporation
- Kohtaro Nagasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material for micro-fabrication
- Patent number 4,349,647
- Issue date Sep 14, 1982
- Somar Manufacturing Co., Ltd.
- Kohtaro Nagasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High energy radiation curable resist material and method of using t...
- Patent number 4,299,911
- Issue date Nov 10, 1981
- Somar Manufacturing Co., Ltd.
- Hideo Ochi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photocurable light-sensitive composition
- Patent number 4,284,707
- Issue date Aug 18, 1981
- Somar Manufacturing Co., Ltd.
- Kohtaro Nagasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist material for micro-fabrication with unsaturated dicarboxylic...
- Patent number 4,273,858
- Issue date Jun 16, 1981
- Somar Manufacturing Co., Ltd.
- Kohtaro Nagasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation curable resin composition
- Patent number 4,205,018
- Issue date May 27, 1980
- Somar Manufacturing Co., Ltd.
- Kohtaro Nagasawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Kohtaro Nagasawa

Person

Patents Grantslast 30 patents

Light-sensitive negative working composition with diazonium condens...

Resist material for micro-fabrication

High energy radiation curable resist material and method of using t...

Photocurable light-sensitive composition

Resist material for micro-fabrication with unsaturated dicarboxylic...

Radiation curable resin composition