Koichi FUKAYA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate cleaning system and substrate cleaning method
- Patent number 12,220,732
- Issue date Feb 11, 2025
- Ebara Corporation
- Hiroki Takahashi
- B08 - CLEANING
Information Patent Grant
Cleaning apparatus and polishing apparatus
- Patent number 12,205,831
- Issue date Jan 21, 2025
- Ebara Corporation
- Mitsuru Miyazaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate cleaning apparatus and cleaning method of substrate
- Patent number 12,100,587
- Issue date Sep 24, 2024
- Ebara Corporation
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Grant
Cleaning apparatus and polishing apparatus
- Patent number 11,948,811
- Issue date Apr 2, 2024
- Ebara Corporation
- Mitsuru Miyazaki
- B08 - CLEANING
Information Patent Grant
Apparatus for cleaning substrate and substrate cleaning method
- Patent number 11,094,548
- Issue date Aug 17, 2021
- Ebara Corporation
- Shinji Kajita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate washing device
- Patent number 10,991,602
- Issue date Apr 27, 2021
- Ebara Corporation
- Koichi Fukaya
- B08 - CLEANING
Information Patent Grant
Substrate drying apparatus, substrate drying method and control pro...
- Patent number 10,008,380
- Issue date Jun 26, 2018
- Ebara Corporation
- Tomoatsu Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate drying apparatus, substrate drying method and control pro...
- Patent number 8,769,842
- Issue date Jul 8, 2014
- Ebara Corporation
- Tomoatsu Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding apparatus and polishing apparatus
- Patent number 7,988,537
- Issue date Aug 2, 2011
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding apparatus and polishing apparatus
- Patent number 7,867,063
- Issue date Jan 11, 2011
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing apparatus and substrate polishing method
- Patent number 7,854,646
- Issue date Dec 21, 2010
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing apparatus and substrate polishing method
- Patent number 7,670,206
- Issue date Mar 2, 2010
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Grant
Electrolytic processing apparatus and electrolytic processing method
- Patent number 7,638,030
- Issue date Dec 29, 2009
- Ebara Corporation
- Osamu Nabeya
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Substrate holding device and polishing apparatus
- Patent number 7,635,292
- Issue date Dec 22, 2009
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding apparatus and polishing apparatus
- Patent number 7,357,699
- Issue date Apr 15, 2008
- Ebara Corporation
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding apparatus and polishing apparatus
- Patent number 7,108,592
- Issue date Sep 19, 2006
- Ebara Corporation
- Koichi Fukaya
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND CLEANING ME...
- Publication number 20240321601
- Publication date Sep 26, 2024
- EBARA CORPORATION
- Fumitoshi OIKAWA
- B08 - CLEANING
Information Patent Application
WASHING APPARATUS
- Publication number 20240269720
- Publication date Aug 15, 2024
- EBARA CORPORATION
- DAICHI KONDO
- B08 - CLEANING
Information Patent Application
CLEANING APPARATUS AND POLISHING APPARATUS
- Publication number 20240194498
- Publication date Jun 13, 2024
- EBARA CORPORATION
- Mitsuru MIYAZAKI
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, APPAR...
- Publication number 20240165675
- Publication date May 23, 2024
- EBARA CORPORATION
- Yosuke HIMORI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING DEVICE, POLISHING DEVICE, AND SUBSTRATE PROCES...
- Publication number 20240139782
- Publication date May 2, 2024
- EBARA CORPORATION
- KOHEI SATO
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING DEVICE AND METHOD OF CLEANING SUBSTRATE
- Publication number 20240082885
- Publication date Mar 14, 2024
- EBARA CORPORATION
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
- Publication number 20240075503
- Publication date Mar 7, 2024
- EBARA CORPORATION
- Fumitoshi OIKAWA
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING DEVICE AND SUBSTRATE POLISHING DEVICE
- Publication number 20230182262
- Publication date Jun 15, 2023
- EBARA CORPORATION
- ERINA BABA
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING SYSTEM AND SUBSTRATE CLEANING METHOD
- Publication number 20230023260
- Publication date Jan 26, 2023
- EBARA CORPORATION
- Hiroki TAKAHASHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING DEVICE AND METHOD OF CLEANING SUBSTRATE
- Publication number 20220203411
- Publication date Jun 30, 2022
- EBARA CORPORATION
- Fumitoshi Oikawa
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING DEVICES, SUBSTRATE PROCESSING APPARATUS, SUBSTRA...
- Publication number 20220016651
- Publication date Jan 20, 2022
- EBARA CORPORATION
- Fumitoshi Oikawa
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
CLEANING APPARATUS AND POLISHING APPARATUS
- Publication number 20210202273
- Publication date Jul 1, 2021
- EBARA CORPORATION
- Mitsuru MIYAZAKI
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS AND CLEANING METHOD OF SUBSTRATE
- Publication number 20210111018
- Publication date Apr 15, 2021
- EBARA CORPORATION
- Fumitoshi OIKAWA
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
- Publication number 20190164769
- Publication date May 30, 2019
- EBARA CORPORATION
- Shinji KAJITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE WASHING DEVICE
- Publication number 20170323809
- Publication date Nov 9, 2017
- EBARA CORPORATION
- Koichi FUKAYA
- B08 - CLEANING
Information Patent Application
SUBSTRATE DRYING APPARATUS, SUBSTRATE DRYING METHOD AND CONTROL PRO...
- Publication number 20140259728
- Publication date Sep 18, 2014
- EBARA CORPORATION
- Tomoatsu ISHIBASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE DRYING APPARATUS, SUBSTRATE DRYING METHOD AND CONTROL PRO...
- Publication number 20130219740
- Publication date Aug 29, 2013
- EBARA CORPORATION
- Tomoatsu ISHIBASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID SCATTERING PREVENTION CUP, SUBSTRATE PROCESSING APPARATUS PR...
- Publication number 20130167947
- Publication date Jul 4, 2013
- EBARA CORPORATION
- Hisajiro NAKANO
- B08 - CLEANING
Information Patent Application
SUBSTRATE DRYING APPARATUS, SUBSTRATE DRYING METHOD AND CONTROL PRO...
- Publication number 20110289795
- Publication date Dec 1, 2011
- Tomoatsu ISHIBASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid-scattering prevention cup, substrate processing apparatus an...
- Publication number 20100154837
- Publication date Jun 24, 2010
- EBARA CORPORATION
- Takahiro Ogawa
- B08 - CLEANING
Information Patent Application
SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD
- Publication number 20100112901
- Publication date May 6, 2010
- Tetsuji TOGAWA
- B24 - GRINDING POLISHING
Information Patent Application
Substrate holding apparatus and polishing apparatus
- Publication number 20090233532
- Publication date Sep 17, 2009
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Application
Substrate holding apparatus and polishing apparatus
- Publication number 20080166957
- Publication date Jul 10, 2008
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Application
Substrate Polishing Apparatus And Substrate Polishing Method
- Publication number 20080139087
- Publication date Jun 12, 2008
- EBARA CORPORATION
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Application
Substrate Holding Device And Polishing Apparatus
- Publication number 20070293129
- Publication date Dec 20, 2007
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Application
Substrate holding apparatus and polishing apparatus
- Publication number 20060199479
- Publication date Sep 7, 2006
- Tetsuji Togawa
- B24 - GRINDING POLISHING
Information Patent Application
Substrate holding apparatus and polishing apparatus
- Publication number 20050028931
- Publication date Feb 10, 2005
- Koichi Fukaya
- B24 - GRINDING POLISHING
Information Patent Application
Electrolytic processing apparatus and electrolytic processing method
- Publication number 20040129569
- Publication date Jul 8, 2004
- Osamu Nabeya
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Koichi FUKAYA

Person

Patents Grantslast 30 patents

Substrate cleaning system and substrate cleaning method

Cleaning apparatus and polishing apparatus

Substrate cleaning apparatus and cleaning method of substrate

Cleaning apparatus and polishing apparatus

Apparatus for cleaning substrate and substrate cleaning method

Substrate washing device

Substrate drying apparatus, substrate drying method and control pro...

Substrate drying apparatus, substrate drying method and control pro...

Substrate holding apparatus and polishing apparatus

Substrate holding apparatus and polishing apparatus

Substrate polishing apparatus and substrate polishing method

Substrate polishing apparatus and substrate polishing method

Electrolytic processing apparatus and electrolytic processing method

Substrate holding device and polishing apparatus

Substrate holding apparatus and polishing apparatus

Substrate holding apparatus and polishing apparatus

Patents Applicationslast 30 patents

CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND CLEANING ME...

WASHING APPARATUS

CLEANING APPARATUS AND POLISHING APPARATUS

SUBSTRATE CLEANING APPARATUS, SUBSTRATE PROCESSING APPARATUS, APPAR...

SUBSTRATE PROCESSING DEVICE, POLISHING DEVICE, AND SUBSTRATE PROCES...

SUBSTRATE CLEANING DEVICE AND METHOD OF CLEANING SUBSTRATE

SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD

SUBSTRATE CLEANING DEVICE AND SUBSTRATE POLISHING DEVICE

SUBSTRATE CLEANING SYSTEM AND SUBSTRATE CLEANING METHOD

SUBSTRATE CLEANING DEVICE AND METHOD OF CLEANING SUBSTRATE

SUBSTRATE CLEANING DEVICES, SUBSTRATE PROCESSING APPARATUS, SUBSTRA...

CLEANING APPARATUS AND POLISHING APPARATUS

SUBSTRATE CLEANING APPARATUS AND CLEANING METHOD OF SUBSTRATE

SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD

SUBSTRATE WASHING DEVICE

SUBSTRATE DRYING APPARATUS, SUBSTRATE DRYING METHOD AND CONTROL PRO...

SUBSTRATE DRYING APPARATUS, SUBSTRATE DRYING METHOD AND CONTROL PRO...

LIQUID SCATTERING PREVENTION CUP, SUBSTRATE PROCESSING APPARATUS PR...

SUBSTRATE DRYING APPARATUS, SUBSTRATE DRYING METHOD AND CONTROL PRO...

Liquid-scattering prevention cup, substrate processing apparatus an...

SUBSTRATE POLISHING APPARATUS AND SUBSTRATE POLISHING METHOD

Substrate holding apparatus and polishing apparatus

Substrate holding apparatus and polishing apparatus

Substrate Polishing Apparatus And Substrate Polishing Method

Substrate Holding Device And Polishing Apparatus

Substrate holding apparatus and polishing apparatus

Substrate holding apparatus and polishing apparatus

Electrolytic processing apparatus and electrolytic processing method