Koichi Hashimoto

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device with shallow trench isolation which controls m...
- Patent number 7,414,278
- Issue date Aug 19, 2008
- Fujitsu Limited
- Shinji Sugatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device with self-aligned co...
- Patent number 7,151,025
- Issue date Dec 19, 2006
- Fujitsu Limited
- Kazuo Itabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with self-aligned contact and its manufacture
- Patent number 6,936,510
- Issue date Aug 30, 2005
- Fujitsu Limited
- Kazuo Itabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching with reduced damage to MOS device
- Patent number 6,884,670
- Issue date Apr 26, 2005
- Fujitsu Limited
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory of good retention and its manufacture
- Patent number 6,706,580
- Issue date Mar 16, 2004
- Fujitsu Limited
- Taiji Ema
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with self-aligned contact and its manufacture
- Patent number 6,620,674
- Issue date Sep 16, 2003
- Fujitsu Limited
- Kazuo Itabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacture of semiconductor device using A-C anti-reflection coating
- Patent number 6,420,095
- Issue date Jul 16, 2002
- Fujitsu Limited
- Eiichi Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dry etching with reduced damage to MOS device
- Patent number 6,376,388
- Issue date Apr 23, 2002
- Fujitsu Limited
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory of good retention and its manufacture
- Patent number 6,300,655
- Issue date Oct 9, 2001
- Fujitsu Limited
- Taiji Ema
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with self-aligned contact and its manufacture
- Patent number 6,285,045
- Issue date Sep 4, 2001
- Fujitsu Limited
- Kazuo Itabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 6,251,721
- Issue date Jun 26, 2001
- Fujitsu Limited
- Kenichi Kanazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having an interconnection pattern for connecti...
- Patent number 6,160,294
- Issue date Dec 12, 2000
- Fujitsu Limited
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with local interconnect of metal silicide
- Patent number 6,157,068
- Issue date Dec 5, 2000
- Fujitsu Limited
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 6,130,482
- Issue date Oct 10, 2000
- Fujitsu Limited
- Hiroki Iio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device with bit line contact areas and storage...
- Patent number 6,026,010
- Issue date Feb 15, 2000
- Fujitsu Limited
- Taiji Ema
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of reflection by amorphous carbon
- Patent number 6,007,732
- Issue date Dec 28, 1999
- Fujitsu Limited
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with self-aligned contact and its manufacture
- Patent number 5,932,901
- Issue date Aug 3, 1999
- Fujitsu Limited
- Kazuo Itabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device with local interconn...
- Patent number 5,913,139
- Issue date Jun 15, 1999
- Fujitsu Limited
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Enhanced semiconductor integrated circuit device with a memory arra...
- Patent number 5,850,096
- Issue date Dec 15, 1998
- Fujitsu Limited
- Tetsuo Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment method
- Patent number 5,846,885
- Issue date Dec 8, 1998
- Fujitsu Limited
- Takeshi Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication process of a semiconductor integrated circuit device ha...
- Patent number 5,843,841
- Issue date Dec 1, 1998
- Fujitsu Limited
- Tetsuo Izawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device with bit line contact areas and storage...
- Patent number 5,812,444
- Issue date Sep 22, 1998
- Fujitsu Limited
- Taiji Ema
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of SiC Schottky diode
- Patent number 5,789,311
- Issue date Aug 4, 1998
- Fuji Electric Co., Ltd.
- Katsunori Ueno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing with less damage
- Patent number 5,779,925
- Issue date Jul 14, 1998
- Fujitsu Limited
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacture of semiconductor device using a-c anti-reflection coating
- Patent number 5,750,316
- Issue date May 12, 1998
- Fujitsu Limited
- Eiichi Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device including a plurality of transistors
- Patent number 5,717,254
- Issue date Feb 10, 1998
- Fujitsu Limited
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 5,670,017
- Issue date Sep 23, 1997
- Fujitsu Limited
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of reflection by amorphous carbon
- Patent number 5,656,128
- Issue date Aug 12, 1997
- Fujitsu Limited
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Poly-buffered LOCOS method for manufacturing an isolation region in...
- Patent number 5,451,540
- Issue date Sep 19, 1995
- Fujitsu Limited
- Kazushi Kawaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method
- Patent number 5,005,046
- Issue date Apr 2, 1991
- Fujitsu Limited
- Koichi Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20060022242
- Publication date Feb 2, 2006
- FUJITSU LIMITED
- Shinji Sugatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device with self-aligned contact and its manufacture
- Publication number 20030168676
- Publication date Sep 11, 2003
- FUJITSU LIMITED
- Kazuo Itabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device with self-aligned contact and its manufacture
- Publication number 20030160271
- Publication date Aug 28, 2003
- FUJITSU LIMITED
- Kazuo Itabashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dry etching with reduced damage to MOS device
- Publication number 20020094625
- Publication date Jul 18, 2002
- FUJITSU LIMITED
- Koichi Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor memory of good retention and its manufacture
- Publication number 20020000577
- Publication date Jan 3, 2002
- FUJITSU LIMITED
- Taiji Ema
- H01 - BASIC ELECTRIC ELEMENTS

Koichi Hashimoto

Person

Patents Grantslast 30 patents

Semiconductor device with shallow trench isolation which controls m...

Method of manufacturing a semiconductor device with self-aligned co...

Semiconductor device with self-aligned contact and its manufacture

Dry etching with reduced damage to MOS device

Semiconductor memory of good retention and its manufacture

Semiconductor device with self-aligned contact and its manufacture

Manufacture of semiconductor device using A-C anti-reflection coating

Dry etching with reduced damage to MOS device

Semiconductor memory of good retention and its manufacture

Semiconductor device with self-aligned contact and its manufacture

Semiconductor device and method of manufacturing the same

Semiconductor device having an interconnection pattern for connecti...

Semiconductor device with local interconnect of metal silicide

Semiconductor device and method for fabricating the same

Semiconductor memory device with bit line contact areas and storage...

Reduction of reflection by amorphous carbon

Semiconductor device with self-aligned contact and its manufacture

Method of manufacturing a semiconductor device with local interconn...

Enhanced semiconductor integrated circuit device with a memory arra...

Plasma treatment method

Fabrication process of a semiconductor integrated circuit device ha...

Semiconductor memory device with bit line contact areas and storage...

Manufacturing method of SiC Schottky diode

Plasma processing with less damage

Manufacture of semiconductor device using a-c anti-reflection coating

Semiconductor device including a plurality of transistors

Method of manufacturing semiconductor device

Reduction of reflection by amorphous carbon

Poly-buffered LOCOS method for manufacturing an isolation region in...

Pattern forming method

Patents Applicationslast 30 patents

Semiconductor device and method for fabricating the same

Semiconductor device with self-aligned contact and its manufacture

Semiconductor device with self-aligned contact and its manufacture

Dry etching with reduced damage to MOS device

Semiconductor memory of good retention and its manufacture