Koichi Hayakawa

Person

Hitachinaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor defect classifying method, semiconductor defect class...
- Patent number 8,595,666
- Issue date Nov 26, 2013
- Hitachi High-Technologies Corporation
- Koichi Hayakawa
- G01 - MEASURING TESTING
Information Patent Grant
Inspection apparatus for inspecting patterns of substrate
- Patent number 8,134,697
- Issue date Mar 13, 2012
- Hitachi High-Technologies Corporation
- Koichi Hayakawa
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting defects of circuit patterns
- Patent number 8,111,902
- Issue date Feb 7, 2012
- Hitachi High-Technologies Corporation
- Takashi Hiroi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Inspection apparatus for inspecting patterns of a substrate
- Patent number 8,036,447
- Issue date Oct 11, 2011
- Hitachi High-Technologies Corporation
- Koichi Hayakawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Circuit pattern inspection apparatus
- Patent number 7,696,487
- Issue date Apr 13, 2010
- Hitachi High-Technologies Corporation
- Koichi Hayakawa
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEFECT CLASSIFYING METHOD, SEMICONDUCTOR DEFECT CLASS...
- Publication number 20120131529
- Publication date May 24, 2012
- Hitachi High-Technologies Corporation
- Koichi Hayakawa
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION APPARATUS FOR INSPECTING PATTERNS OF A SUBSTRATE
- Publication number 20100008564
- Publication date Jan 14, 2010
- Hitachi High-Technologies Corporation
- Koichi Hayakawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION APPARATUS AND INSPECTION METHOD
- Publication number 20090261251
- Publication date Oct 22, 2009
- Hitachi High-Technologies Corporation
- Koichi HAYAKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION APPARATUS FOR INSPECTING PATTERNS OF SUBSTRATE
- Publication number 20090208091
- Publication date Aug 20, 2009
- HITACHI HIGH-TECHNOLOIES CORPORATION
- Koichi Hayakawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Circuit pattern inspection apparatus
- Publication number 20070114397
- Publication date May 24, 2007
- Koichi Hayakawa
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for inspecting defects of circuit patterns
- Publication number 20070047800
- Publication date Mar 1, 2007
- Takashi Hiroi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Inspection apparatus for inspecting patterns of a substrate
- Publication number 20060171593
- Publication date Aug 3, 2006
- Hitachi High-Technologies Corporation
- Koichi Hayakawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Charged-particle beam apparatus and method for automatically correc...
- Publication number 20060060781
- Publication date Mar 23, 2006
- Masahiro Watanabe
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle beam apparatus and method for automatically correc...
- Publication number 20030006371
- Publication date Jan 9, 2003
- Masahiro Watanabe
- H01 - BASIC ELECTRIC ELEMENTS

Koichi Hayakawa

Person

Patents Grantslast 30 patents

Semiconductor defect classifying method, semiconductor defect class...

Inspection apparatus for inspecting patterns of substrate

Method and apparatus for inspecting defects of circuit patterns

Inspection apparatus for inspecting patterns of a substrate

Circuit pattern inspection apparatus

Patents Applicationslast 30 patents

SEMICONDUCTOR DEFECT CLASSIFYING METHOD, SEMICONDUCTOR DEFECT CLASS...

INSPECTION APPARATUS FOR INSPECTING PATTERNS OF A SUBSTRATE

INSPECTION APPARATUS AND INSPECTION METHOD

INSPECTION APPARATUS FOR INSPECTING PATTERNS OF SUBSTRATE

Circuit pattern inspection apparatus

Method and apparatus for inspecting defects of circuit patterns

Inspection apparatus for inspecting patterns of a substrate

Charged-particle beam apparatus and method for automatically correc...

Charged-particle beam apparatus and method for automatically correc...