Koichi Kamijo

Person

Kumagaya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Stencil reticles for use in charged-particle-beam microlithography,...
- Patent number 6,830,852
- Issue date Dec 14, 2004
- Nikon Corporation
- Shintaro Kawata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam microlithography apparatus and methods includ...
- Patent number 6,815,693
- Issue date Nov 9, 2004
- Nikon Corporation
- Koichi Kamijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for determining blur of an optical system
- Patent number 6,654,106
- Issue date Nov 25, 2003
- Nikon Corporation
- Koichi Kamijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for determining a pattern on a microlithography reticle to...
- Patent number 6,642,532
- Issue date Nov 4, 2003
- Nikon Corporation
- Koichi Kamijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle-beam projection-lens system exhibiting reduced blu...
- Patent number 6,635,881
- Issue date Oct 21, 2003
- Nikon Corporation
- Atsushi Yamada
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Charged-particle-beam optical components and systems including ferr...
- Patent number 6,566,663
- Issue date May 20, 2003
- Nikon Corporation
- Koichi Kamijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Proximity effect correction methods
- Patent number 6,531,251
- Issue date Mar 11, 2003
- Nikon Corporation
- Koichi Kamijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for charged-particle-beam microlithography ex...
- Patent number 6,507,027
- Issue date Jan 14, 2003
- Nikon Corporation
- Shinichi Kojima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for calculating cumulative dose of exposure energy from reg...
- Patent number 6,501,083
- Issue date Dec 31, 2002
- Nikon Corporation
- Koichi Kamijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Astigmatism-correction device and charged-particle-beam microlithog...
- Patent number 6,489,620
- Issue date Dec 3, 2002
- Nikon Corporation
- Koichi Kamijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Devices for reducing deflection aberrations in charged-particle-bea...
- Patent number 6,432,594
- Issue date Aug 13, 2002
- Nikon Corporation
- Koichi Kamijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure apparatus and semiconductor device m...
- Patent number 6,255,663
- Issue date Jul 3, 2001
- Nikon Corporation
- Atsushi Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern-transfer methods and masks
- Patent number 6,194,102
- Issue date Feb 27, 2001
- Nikon Corporation
- Mamoru Nakasuji
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Rule-based methods for proximity-effect correction of charged-parti...
- Publication number 20030152850
- Publication date Aug 14, 2003
- NIKON CORPORATION
- Koichi Kamijo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods for determining a pattern on a microlithography reticle to...
- Publication number 20030042433
- Publication date Mar 6, 2003
- NIKON CORPORATION
- Koichi Kamijo
- B82 - NANO-TECHNOLOGY
Information Patent Application
Stencil reticles for use in charged-particle-beam microlithography,...
- Publication number 20030017401
- Publication date Jan 23, 2003
- Niko Corporation
- Shintaro L. Kawata
- B82 - NANO-TECHNOLOGY
Information Patent Application
Methods and apparatus for determining blur of an optical system
- Publication number 20020125441
- Publication date Sep 12, 2002
- NIKON CORPORATION
- Koichi Kamijo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for calculating, correcting, and displaying segmented retic...
- Publication number 20020116697
- Publication date Aug 22, 2002
- NIKON CORPORATION
- Kazuya Okamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged-particle-beam microlithography apparatus and methods includ...
- Publication number 20020005494
- Publication date Jan 17, 2002
- Koichi Kamijo
- B82 - NANO-TECHNOLOGY
Information Patent Application
Proximity effect correction methods
- Publication number 20020006563
- Publication date Jan 17, 2002
- NIKON CORPORATION
- Koichi Kamijo
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle-beam projection-lens system exhibiting reduced blu...
- Publication number 20010038080
- Publication date Nov 8, 2001
- NIKON CORPORATION
- Atsushi Yamada
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Koichi Kamijo

Person

Patents Grantslast 30 patents

Stencil reticles for use in charged-particle-beam microlithography,...

Charged-particle-beam microlithography apparatus and methods includ...

Methods and apparatus for determining blur of an optical system

Methods for determining a pattern on a microlithography reticle to...

Charged-particle-beam projection-lens system exhibiting reduced blu...

Charged-particle-beam optical components and systems including ferr...

Proximity effect correction methods

Apparatus and methods for charged-particle-beam microlithography ex...

Methods for calculating cumulative dose of exposure energy from reg...

Astigmatism-correction device and charged-particle-beam microlithog...

Devices for reducing deflection aberrations in charged-particle-bea...

Charged particle beam exposure apparatus and semiconductor device m...

Pattern-transfer methods and masks

Patents Applicationslast 30 patents

Rule-based methods for proximity-effect correction of charged-parti...

Methods for determining a pattern on a microlithography reticle to...

Stencil reticles for use in charged-particle-beam microlithography,...

Methods and apparatus for determining blur of an optical system

Methods for calculating, correcting, and displaying segmented retic...

Charged-particle-beam microlithography apparatus and methods includ...

Proximity effect correction methods

Charged-particle-beam projection-lens system exhibiting reduced blu...