Koichi Nagami

Person

Kurokawa-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,261,027
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,255,049
- Issue date Mar 18, 2025
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,243,723
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 12,154,793
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,136,535
- Issue date Nov 5, 2024
- Tokyo Electron Limited
- Tatsuro Ohshita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter circuit and plasma processing apparatus
- Patent number 12,033,833
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Koji Yamagishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,033,832
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,887,817
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and power supply control method
- Patent number 11,776,795
- Issue date Oct 3, 2023
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,764,034
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,764,082
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,646,181
- Issue date May 9, 2023
- Tokyo Electron Limited
- Natsumi Torii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma processing
- Patent number 11,594,398
- Issue date Feb 28, 2023
- Tokyo Electron Limited
- Yusuke Aoki
- B08 - CLEANING
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,387,077
- Issue date Jul 12, 2022
- Tokyo Electron Limited
- Shinji Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,251,048
- Issue date Feb 15, 2022
- Tokyo Electron Limited
- Yusuke Aoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 11,170,979
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching apparatus and etching method
- Patent number 10,763,126
- Issue date Sep 1, 2020
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,707,053
- Issue date Jul 7, 2020
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating method
- Patent number 10,615,005
- Issue date Apr 7, 2020
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,593,519
- Issue date Mar 17, 2020
- Tokyo Electron Limited
- Norikazu Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,553,407
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,431,433
- Issue date Oct 1, 2019
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 10,269,539
- Issue date Apr 23, 2019
- Tokyo Electron Limited
- Kumiko Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for impedance matching of plasma processing apparatus
- Patent number 10,250,217
- Issue date Apr 2, 2019
- Tokyo Electron Limited
- Koichi Nagami
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma processing apparatus
- Patent number 10,176,971
- Issue date Jan 8, 2019
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 10,109,461
- Issue date Oct 23, 2018
- Tokyo Electron Limited
- Norikazu Yamada
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma processing method
- Patent number 9,960,016
- Issue date May 1, 2018
- Tokyo Electron Limited
- Kumiko Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 9,941,098
- Issue date Apr 10, 2018
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 9,870,898
- Issue date Jan 16, 2018
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 9,824,864
- Issue date Nov 21, 2017
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF CONTROLLING SOURCE FREQUE...
- Publication number 20250201519
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Yuma YAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250191877
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250178709
- Publication date Jun 5, 2025
- TOKYO ELECTRON LIMITED
- Yusuke HAYASAKA
- B63 - SHIPS OR OTHER WATERBORNE VESSELS RELATED EQUIPMENT
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250022684
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Tatsuro OHSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, ELECTR...
- Publication number 20240297054
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240290577
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Shinya ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240145218
- Publication date May 2, 2024
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240006154
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD
- Publication number 20230411128
- Publication date Dec 21, 2023
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230260766
- Publication date Aug 17, 2023
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20230078135
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ETCHING METHOD
- Publication number 20230056323
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220384154
- Publication date Dec 1, 2022
- TOKYO ELECTRON LIMITED
- Yusuke HAYASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220301825
- Publication date Sep 22, 2022
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS
- Publication number 20220246400
- Publication date Aug 4, 2022
- TOKYO ELECTRON LIMITED
- Koji YAMAGISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220139672
- Publication date May 5, 2022
- TOKYO ELECTRON LIMITED
- Tatsuro OHSHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220028665
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20220020576
- Publication date Jan 20, 2022
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND ETCHING METHOD
- Publication number 20210343503
- Publication date Nov 4, 2021
- TOKYO ELECTRON LIMITED
- Natsumi TORII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20210335578
- Publication date Oct 28, 2021
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210159049
- Publication date May 27, 2021
- TOKYO ELECTRON LIMITED
- Shinji KUBOTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210043472
- Publication date Feb 11, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200402805
- Publication date Dec 24, 2020
- TOKYO ELECTRON LIMITED
- Yusuke AOKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200381215
- Publication date Dec 3, 2020
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS AND ETCHING METHOD
- Publication number 20200357658
- Publication date Nov 12, 2020
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20200266036
- Publication date Aug 20, 2020
- TOKYO ELECTRON LIMITED
- Yusuke AOKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20200144028
- Publication date May 7, 2020
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20200126770
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD
- Publication number 20190333744
- Publication date Oct 31, 2019
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190333741
- Publication date Oct 31, 2019
- TOKYO ELECTRON LIMITED
- Koichi NAGAMI
- H01 - BASIC ELECTRIC ELEMENTS

Koichi Nagami

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Etching apparatus and etching method

Plasma processing apparatus and plasma processing method

Filter circuit and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and power supply control method

Plasma processing method and plasma processing apparatus

Control method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Apparatus and method for plasma processing

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma etching method and plasma etching apparatus

Etching apparatus and etching method

Plasma processing method and plasma processing apparatus

Plasma generating method

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing method

Method for impedance matching of plasma processing apparatus

Plasma processing apparatus

Plasma processing method

Plasma processing method

Plasma processing method

Plasma processing method and plasma processing apparatus

Plasma processing method

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND METHOD OF CONTROLLING SOURCE FREQUE...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, ELECTR...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND ETCHING METHOD

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ETCHING APPARATUS AND ETCHING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

ETCHING APPARATUS AND ETCHING METHOD

APPARATUS AND METHOD FOR PLASMA PROCESSING

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

PLASMA PROCESSING APPARATUS AND POWER SUPPLY CONTROL METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS