Koichi Takemura

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,669,138
- Issue date Mar 11, 2014
- NEC Corporation
- Akinobu Shibuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitor producing method for producing thin-film capacitors elimi...
- Patent number 8,621,730
- Issue date Jan 7, 2014
- NEC Corporation
- Akinobu Shibuya
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Electromagnetic band gap element, and antenna and filter using the...
- Patent number 8,354,975
- Issue date Jan 15, 2013
- NEC Corporation
- Noriaki Ando
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,237,292
- Issue date Aug 7, 2012
- NEC Corporation
- Akinobu Shibuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory and process for fabricating the same
- Patent number 6,887,752
- Issue date May 3, 2005
- NEC Electronics Corporation
- Sota Shinohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory and process for fabricating the same
- Patent number 6,730,955
- Issue date May 4, 2004
- NEC Electronics Corporation
- Sota Shinohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film capacitor having an improved bottom electrode and method...
- Patent number 6,335,551
- Issue date Jan 1, 2002
- NEC Corporation
- Koichi Takemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film capacitor having an improved bottom electrode and method...
- Patent number 6,218,233
- Issue date Apr 17, 2001
- NEC Corporation
- Koichi Takemura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CAPACITOR PRODUCING METHOD, CAPACITOR PRODUCING DEVICE, AND CAPACIT...
- Publication number 20140068905
- Publication date Mar 13, 2014
- NEC Corporation
- Akinobu Shibuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20130005085
- Publication date Jan 3, 2013
- NEC Corporation
- Akinobu SHIBUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND NOISE SUPPRESSING METHOD
- Publication number 20120217653
- Publication date Aug 30, 2012
- NEC Corporation
- Koichi Takemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITOR PRODUCING METHOD, CAPACITOR PRODUCING DEVICE, AND CAPACIT...
- Publication number 20110302753
- Publication date Dec 15, 2011
- NEC Corporation
- Akinobu Shibuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNETIC BAND GAP STRUCTURE, ELEMENT, SUBSTRATE, MODULE, AND...
- Publication number 20110170268
- Publication date Jul 14, 2011
- NEC Corporation
- Koichi Takemura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ELECTRO-MAGNETIC BAND-GAP STRUCTURE, METHOD FOR MANUFACTURING THE S...
- Publication number 20110012697
- Publication date Jan 20, 2011
- Koichi Takemura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20100308474
- Publication date Dec 9, 2010
- Akinobu Shibuya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNETIC BAND GAP ELEMENT, AND ANTENNA AND FILTER USING THE...
- Publication number 20100265159
- Publication date Oct 21, 2010
- Noriaki Ando
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
INTERPOSER INTEGRATED WITH CAPACITORS AND METHOD FOR MANUFACTURING...
- Publication number 20100044089
- Publication date Feb 25, 2010
- Akinobu Shibuya
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Semiconductor memory and process for fabricating the same
- Publication number 20040079982
- Publication date Apr 29, 2004
- Sota Shinohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating semiconductor device
- Publication number 20030162394
- Publication date Aug 28, 2003
- NEC ELECTRONICS CORPORATION
- Koichi Takemura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor memory and process for fabricating the same
- Publication number 20020132426
- Publication date Sep 19, 2002
- NEC Corporation
- Sota Shinohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thin film capacitor having an improved bottom electrode and method...
- Publication number 20010000923
- Publication date May 10, 2001
- NEC Corporation
- Koichi Takemura
- H01 - BASIC ELECTRIC ELEMENTS

Koichi Takemura

Person

Patents Grantslast 30 patents

Semiconductor device and method for manufacturing the same

Capacitor producing method for producing thin-film capacitors elimi...

Electromagnetic band gap element, and antenna and filter using the...

Semiconductor device and method for manufacturing the same

Semiconductor memory and process for fabricating the same

Semiconductor memory and process for fabricating the same

Thin film capacitor having an improved bottom electrode and method...

Thin film capacitor having an improved bottom electrode and method...

Patents Applicationslast 30 patents

CAPACITOR PRODUCING METHOD, CAPACITOR PRODUCING DEVICE, AND CAPACIT...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND NOISE SUPPRESSING METHOD

CAPACITOR PRODUCING METHOD, CAPACITOR PRODUCING DEVICE, AND CAPACIT...

ELECTROMAGNETIC BAND GAP STRUCTURE, ELEMENT, SUBSTRATE, MODULE, AND...

ELECTRO-MAGNETIC BAND-GAP STRUCTURE, METHOD FOR MANUFACTURING THE S...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

ELECTROMAGNETIC BAND GAP ELEMENT, AND ANTENNA AND FILTER USING THE...

INTERPOSER INTEGRATED WITH CAPACITORS AND METHOD FOR MANUFACTURING...

Semiconductor memory and process for fabricating the same

Method of fabricating semiconductor device

Semiconductor memory and process for fabricating the same

Thin film capacitor having an improved bottom electrode and method...