Koichi Yoshida

Person

Kyoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Tapering method for poromeric polishing pad
- Patent number 10,259,099
- Issue date Apr 16, 2019
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Koichi Yoshida
- B24 - GRINDING POLISHING
Information Patent Grant
Thermoplastic poromeric polishing pad
- Patent number 10,106,662
- Issue date Oct 23, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Shuiyuan Luo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Tapered poromeric polishing pad
- Patent number 9,925,637
- Issue date Mar 27, 2018
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Koichi Yoshida
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing composition for polishing a sapphire...
- Patent number 9,633,831
- Issue date Apr 25, 2017
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Allen S. Bulick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing composition for polishing silicon waf...
- Patent number 9,150,759
- Issue date Oct 6, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yasuyuki Itai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for chemical mechanical polishing silicon wafers
- Patent number 8,980,749
- Issue date Mar 17, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yasuyuki Itai
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
AQUEOUS COMPOSITIONS OF LOW DISHING SILICA PARTICLES FOR POLYSILICO...
- Publication number 20190185714
- Publication date Jun 20, 2019
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Naresh Kumar Penta
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TAPERING METHOD FOR POROMERIC POLISHING PAD
- Publication number 20180036860
- Publication date Feb 8, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Koichi Yoshida
- B24 - GRINDING POLISHING
Information Patent Application
TAPERED POROMERIC POLISHING PAD
- Publication number 20180036862
- Publication date Feb 8, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Koichi Yoshida
- B24 - GRINDING POLISHING
Information Patent Application
THERMOPLASTIC POROMERIC POLISHING PAD
- Publication number 20180037706
- Publication date Feb 8, 2018
- Rohm and Haas Electronic Materials CMP Holdings, INC.
- Shuiyuan Luo
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING SILICON WAF...
- Publication number 20150093900
- Publication date Apr 2, 2015
- NITTA HAAS INCORPORATED
- Yasuyuki Itai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING A SAPPHIRE...
- Publication number 20150053642
- Publication date Feb 26, 2015
- NITTA HAAS INCORPORATED
- Allen S. Bulick
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Koichi Yoshida

Person

Patents Grantslast 30 patents

Tapering method for poromeric polishing pad

Thermoplastic poromeric polishing pad

Tapered poromeric polishing pad

Chemical mechanical polishing composition for polishing a sapphire...

Chemical mechanical polishing composition for polishing silicon waf...

Method for chemical mechanical polishing silicon wafers

Patents Applicationslast 30 patents

AQUEOUS COMPOSITIONS OF LOW DISHING SILICA PARTICLES FOR POLYSILICO...

TAPERING METHOD FOR POROMERIC POLISHING PAD

TAPERED POROMERIC POLISHING PAD

THERMOPLASTIC POROMERIC POLISHING PAD

CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING SILICON WAF...

CHEMICAL MECHANICAL POLISHING COMPOSITION FOR POLISHING A SAPPHIRE...