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Koichiro Inazawa

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Patents Grantslast 30 patents

  • Information Patent Grant

    Plasma etching unit
    • Patent number 8,840,753
    • Issue date Sep 23, 2014
    • Tokyo Electron Limited
    • Masanobu Honda
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching method and plasma etching unit
    • Patent number 7,625,494
    • Issue date Dec 1, 2009
    • Tokyo Electron Limited
    • Masanobu Honda
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching method
    • Patent number 7,582,220
    • Issue date Sep 1, 2009
    • Tokyo Electron Limited
    • Mitsuru Ishikawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Method of etching dual damascene structure
    • Patent number 7,326,650
    • Issue date Feb 5, 2008
    • Tokyo Electron Limited
    • Yoshihide Kihara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching method and plasma processing method
    • Patent number 7,211,197
    • Issue date May 1, 2007
    • Tokyo Electron Limited
    • Masaaki Hagihara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Method for fabricating a semiconductor device
    • Patent number 7,163,887
    • Issue date Jan 16, 2007
    • Fujitsu Limited
    • Hiroshi Kudo
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching method
    • Patent number 7,125,806
    • Issue date Oct 24, 2006
    • Tokyo Electron Limited
    • Akitoshi Harada
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching method
    • Patent number 7,030,028
    • Issue date Apr 18, 2006
    • Tokyo Electron Limited
    • Takuya Mori
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Dry developing method
    • Patent number 6,986,851
    • Issue date Jan 17, 2006
    • Tokyo Electron Limited
    • Akinori Kitamura
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Method of etching and method of plasma treatment
    • Patent number 6,780,342
    • Issue date Aug 24, 2004
    • Tokyo Electron Limited
    • Masaaki Hagihara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma processing method
    • Patent number 6,670,276
    • Issue date Dec 30, 2003
    • Tokyo Electron Limited
    • Tomoki Suemasa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching apparatus
    • Patent number 5,772,833
    • Issue date Jun 30, 1998
    • Tokyo Electron Limited
    • Koichiro Inazawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching process
    • Patent number 5,770,098
    • Issue date Jun 23, 1998
    • Tokyo Electron Kabushiki Kaisha
    • Yoichi Araki
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma process apparatus
    • Patent number 5,717,294
    • Issue date Feb 10, 1998
    • Kabushiki Kaisha Toshiba
    • Itsuko Sakai
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Etching method
    • Patent number 5,705,081
    • Issue date Jan 6, 1998
    • Tokyo Electron Limited
    • Koichiro Inazawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Plasma etching method
    • Patent number 5,595,627
    • Issue date Jan 21, 1997
    • Tokyo Electron Limited
    • Koichiro Inazawa
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    PLASMA ETCHING UNIT
    • Publication number 20100024983
    • Publication date Feb 4, 2010
    • TOKYO ELECTRON LIMITED
    • Masanobu Honda
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Etching method and plasma etching apparatus
    • Publication number 20050103441
    • Publication date May 19, 2005
    • Masanobu Honda
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Method for fabricating a semiconductor device
    • Publication number 20050020057
    • Publication date Jan 27, 2005
    • FUJITSU LIMITED
    • Hiroshi Kudo
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Etching method and plasma processing method
    • Publication number 20050000939
    • Publication date Jan 6, 2005
    • TOKYO ELECTRON LIMITED
    • Masaaki Hagihara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma etching method and plasma etching unit
    • Publication number 20040219797
    • Publication date Nov 4, 2004
    • Masanobu Honda
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Etching method
    • Publication number 20040209469
    • Publication date Oct 21, 2004
    • Akitoshi Harada
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Oxide film etching method
    • Publication number 20040173573
    • Publication date Sep 9, 2004
    • TOKYO ELECTRON LIMITED
    • Yoshiki Igarashi
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Dry developing method
    • Publication number 20040169009
    • Publication date Sep 2, 2004
    • Akinori Kitamura
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Etching method
    • Publication number 20040063331
    • Publication date Apr 1, 2004
    • Takuya Mori
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Method of etching dual damascene structure
    • Publication number 20040026364
    • Publication date Feb 12, 2004
    • Yoshihide Kihara
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Plasma processing apparatus and processing method
    • Publication number 20030102087
    • Publication date Jun 5, 2003
    • Youbun Ito
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Oxide film etching method
    • Publication number 20020055263
    • Publication date May 9, 2002
    • Yoshiki Igarashi
    • H01 - BASIC ELECTRIC ELEMENTS