Koichiro Moriyama

Person

Kyotanabe-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming semiconductor device and method for forming phot...
- Patent number 7,534,628
- Issue date May 19, 2009
- Canon Kabushiki Kaisha
- Yasuyoshi Takai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exhaust processing method, plasma processing method and plasma proc...
- Patent number 7,211,708
- Issue date May 1, 2007
- Canon Kabushiki Kaisha
- Takeshi Shishido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming silicon-based thin film, silicon-based thin film,...
- Patent number 7,074,641
- Issue date Jul 11, 2006
- Canon Kabushiki Kaisha
- Takaharu Kondo
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Vacuum-processing method using a movable cooling plate during proce...
- Patent number 6,858,087
- Issue date Feb 22, 2005
- Canon Kabushiki Kaisha
- Tadashi Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for processing a substrate
- Patent number 6,833,155
- Issue date Dec 21, 2004
- Canon Kabushiki Kaisha
- Hiroshi Shimoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for forming a silicon-based film on a substrate using a tem...
- Patent number 6,794,275
- Issue date Sep 21, 2004
- Canon Kabushiki Kaisha
- Takaharu Kondo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming deposited film
- Patent number 6,667,240
- Issue date Dec 23, 2003
- Canon Kabushiki Kaisha
- Hiroyuki Ozaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for processing a substrate
- Patent number 6,602,347
- Issue date Aug 5, 2003
- Canon Kabushiki Kaisha
- Hiroshi Shimoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for processing a substrate
- Patent number 6,576,061
- Issue date Jun 10, 2003
- Canon Kabushiki Kaisha
- Koichiro Moriyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum-processing apparatus using a movable cooling plate during pr...
- Patent number 6,547,922
- Issue date Apr 15, 2003
- Canon Kabushiki Kaisha
- Tadashi Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-forming apparatus for forming a deposited film on a substrate,...
- Patent number 6,447,612
- Issue date Sep 10, 2002
- Canon Kabushiki Kaisha
- Koichiro Moriyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposited-film forming process and deposited-film forming apparatus
- Patent number 6,350,489
- Issue date Feb 26, 2002
- Canon Kabushiki Kaisha
- Koichiro Moriyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method
- Patent number 6,338,872
- Issue date Jan 15, 2002
- Canon Kabushiki Kaisha
- Takehito Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming apparatus
- Patent number 6,273,955
- Issue date Aug 14, 2001
- Canon Kabushiki Kaisha
- Takehito Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing photovoltaic element
- Patent number 6,261,862
- Issue date Jul 17, 2001
- Canon Kabushiki Kaisha
- Tadashi Hori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,031,198
- Issue date Feb 29, 2000
- Canon Kabushiki Kaisha
- Koichiro Moriyama
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...
- Publication number 20090145555
- Publication date Jun 11, 2009
- Canon Kabushiki Kaisha
- TADASHI SAWAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...
- Publication number 20090114155
- Publication date May 7, 2009
- Canon Kabushiki Kaisha
- TADASHI SAWAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...
- Publication number 20090095420
- Publication date Apr 16, 2009
- Canon Kabushiki Kaisha
- TADASHI SAWAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...
- Publication number 20090084500
- Publication date Apr 2, 2009
- Canon Kabushiki Kaisha
- TADASHI SAWAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE AND METHOD FOR FORMING PHOT...
- Publication number 20080096291
- Publication date Apr 24, 2008
- Canon Kabushiki Kaisha
- Yasuyoshi Takai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...
- Publication number 20080014345
- Publication date Jan 17, 2008
- Canon Kabushiki Kaisha
- TADASHI SAWAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXHAUST PROCESSING METHOD, PLASMA PROCESSING METHOD AND PLASMA PROC...
- Publication number 20070169890
- Publication date Jul 26, 2007
- Canon Kabushiki Kaisha
- TAKESHI SHISHIDO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of forming silicon-based thin film, silicon-based thin film,...
- Publication number 20050227457
- Publication date Oct 13, 2005
- Takaharu Kondo
- C30 - CRYSTAL GROWTH
Information Patent Application
Processing apparatus, exhaust processing process and plasma process...
- Publication number 20040161533
- Publication date Aug 19, 2004
- TADASHI SAWAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for processing a substrate
- Publication number 20030194482
- Publication date Oct 16, 2003
- Canon Kabushiki Kaisha
- Hiroshi Shimoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING
- Publication number 20030164225
- Publication date Sep 4, 2003
- TADASHI SAWAYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum-processing apparatus and method for vacuum-processing an object
- Publication number 20030136517
- Publication date Jul 24, 2003
- Tadashi Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon film, semiconductor device, and process for forming silicon...
- Publication number 20030104664
- Publication date Jun 5, 2003
- Takaharu Kondo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming deposited film
- Publication number 20020015802
- Publication date Feb 7, 2002
- Hiroyuki Ozaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Exhaust processing method, plasma processing method and plasma proc...
- Publication number 20020006477
- Publication date Jan 17, 2002
- Takeshi Shishido
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vacuum-processing apparatus and method for vacuum-processing an object
- Publication number 20020005171
- Publication date Jan 17, 2002
- Tadashi Hori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Koichiro Moriyama

Person

Patents Grantslast 30 patents

Method for forming semiconductor device and method for forming phot...

Exhaust processing method, plasma processing method and plasma proc...

Method of forming silicon-based thin film, silicon-based thin film,...

Vacuum-processing method using a movable cooling plate during proce...

Apparatus and method for processing a substrate

Process for forming a silicon-based film on a substrate using a tem...

Method and apparatus for forming deposited film

Apparatus and method for processing a substrate

Apparatus and method for processing a substrate

Vacuum-processing apparatus using a movable cooling plate during pr...

Film-forming apparatus for forming a deposited film on a substrate,...

Deposited-film forming process and deposited-film forming apparatus

Film forming method

Film forming apparatus

Process for producing photovoltaic element

Plasma processing method and apparatus

Patents Applicationslast 30 patents

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...

METHOD FOR FORMING SEMICONDUCTOR DEVICE AND METHOD FOR FORMING PHOT...

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESS...

EXHAUST PROCESSING METHOD, PLASMA PROCESSING METHOD AND PLASMA PROC...

Method of forming silicon-based thin film, silicon-based thin film,...

Processing apparatus, exhaust processing process and plasma process...

Apparatus and method for processing a substrate

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING

Vacuum-processing apparatus and method for vacuum-processing an object

Silicon film, semiconductor device, and process for forming silicon...

Method and apparatus for forming deposited film

Exhaust processing method, plasma processing method and plasma proc...

Vacuum-processing apparatus and method for vacuum-processing an object