Koji Arita

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of fabricating semiconductor device, and plating apparatus
- Patent number 8,038,864
- Issue date Oct 18, 2011
- Renesas Electronics Corporation
- Koji Arita
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Method for manufacturing a semiconductor device having a multi-laye...
- Patent number 7,833,901
- Issue date Nov 16, 2010
- NEC Electronics Corporation
- Koichi Ohto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 7,800,229
- Issue date Sep 21, 2010
- NEC Electronics Corporation
- Akira Furuya
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 7,563,705
- Issue date Jul 21, 2009
- NEC Electronics Corporation
- Takashi Tonegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of fabricating the same
- Patent number 7,388,291
- Issue date Jun 17, 2008
- NEC Electronics Corporation
- Tetsuya Kurokawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing same
- Patent number 7,341,937
- Issue date Mar 11, 2008
- NEC Electronics Corporation
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 7,229,916
- Issue date Jun 12, 2007
- NEC Electronics Corporation
- Ryohei Kitao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having two distinct sioch layers
- Patent number 7,132,732
- Issue date Nov 7, 2006
- NEC Electronics Corporation
- Koichi Ohto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating semiconductor device using plasma-enhanced CVD
- Patent number 7,074,698
- Issue date Jul 11, 2006
- NEC Electronics Corporation
- Noboru Morita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device having damascene inter...
- Patent number 6,989,328
- Issue date Jan 24, 2006
- NEC Electronics Corporation
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing same
- Patent number 6,927,495
- Issue date Aug 9, 2005
- NEC Electronics Corporation
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE TO DECREASE DEFECT NUM...
- Publication number 20080283404
- Publication date Nov 20, 2008
- NEC ELECTRONICS CORPORATION
- Akira FURUYA
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
- Publication number 20080203572
- Publication date Aug 28, 2008
- NEC Electronics Corporation
- Tetsuya Kurokawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrochemical processing apparatus and method of processing a sem...
- Publication number 20080029402
- Publication date Feb 7, 2008
- NEC Electronics Corporation
- Tetsuya Kurokawa
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD OF FABRICATING SEMICONDUCTOR DEVICE, AND PLATING APPARATUS
- Publication number 20080023335
- Publication date Jan 31, 2008
- NEC ELECTRONICS CORPORATION
- Koji ARITA
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Semiconductor device and method for manufacturing same
- Publication number 20070190341
- Publication date Aug 16, 2007
- NEC ELECTRONICS CORPORATION
- Akira Furuya
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Semiconductor device, and production method for manufacturing such...
- Publication number 20070045861
- Publication date Mar 1, 2007
- NEC ELECTRONICS CORPORATION
- Koichi Ohto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20060141778
- Publication date Jun 29, 2006
- NEC Electronics Corporation
- Takashi Tonegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing same
- Publication number 20050245075
- Publication date Nov 3, 2005
- NEC Electronics Corporation
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of fabricating the same
- Publication number 20050189654
- Publication date Sep 1, 2005
- NEC Electronics Corporation
- Tetsuya Kurokawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a semiconductor device
- Publication number 20050048769
- Publication date Mar 3, 2005
- NEC ELECTRONICS CORPORATION
- Ryohei Kitao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device, and production method for manufacturing such...
- Publication number 20040183162
- Publication date Sep 23, 2004
- NEC ELECTRONICS CORPORATION
- Koichi Ohto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating semiconductor device using Plasma-Enhanced CVD
- Publication number 20040185668
- Publication date Sep 23, 2004
- NEC Electronics Corporation
- Noboru Morita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of manufacturing semiconductor device having damascene inter...
- Publication number 20040161928
- Publication date Aug 19, 2004
- NEC ELECTRONICS CORPORATION
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing same
- Publication number 20040036076
- Publication date Feb 26, 2004
- NEC Electronics Corporation
- Koji Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20030155657
- Publication date Aug 21, 2003
- NEC Electronics Corporation
- Takashi Tonegawa
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Method of fabricating semiconductor device, and plating apparatus

Method for manufacturing a semiconductor device having a multi-laye...

Semiconductor device and method for manufacturing same

Manufacturing method of semiconductor device

Semiconductor device and method of fabricating the same

Semiconductor device and method of manufacturing same

Method of manufacturing a semiconductor device

Semiconductor device having two distinct sioch layers

Method of fabricating semiconductor device using plasma-enhanced CVD

Method of manufacturing semiconductor device having damascene inter...

Semiconductor device and method of manufacturing same

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE TO DECREASE DEFECT NUM...

SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME

Electrochemical processing apparatus and method of processing a sem...

METHOD OF FABRICATING SEMICONDUCTOR DEVICE, AND PLATING APPARATUS

Semiconductor device and method for manufacturing same

Semiconductor device, and production method for manufacturing such...

Manufacturing method of semiconductor device

Semiconductor device and method of manufacturing same

Semiconductor device and method of fabricating the same

Method of manufacturing a semiconductor device

Semiconductor device, and production method for manufacturing such...

Method of fabricating semiconductor device using Plasma-Enhanced CVD

Method of manufacturing semiconductor device having damascene inter...

Semiconductor device and method of manufacturing same

Manufacturing method of semiconductor device