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Koji ITADANI
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Osaka, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma processing method
Patent number
10,109,461
Issue date
Oct 23, 2018
Tokyo Electron Limited
Norikazu Yamada
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Plasma processing apparatus
Patent number
9,734,992
Issue date
Aug 15, 2017
Tokyo Electron Limited
Norikazu Yamada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus
Patent number
9,663,858
Issue date
May 30, 2017
Tokyo Electron Limited
Koichi Nagami
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
High frequency matching system
Patent number
9,270,250
Issue date
Feb 23, 2016
Daihen Corporation
Takashi Shimomoto
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Grant
Impedance adjusting apparatus
Patent number
9,059,680
Issue date
Jun 16, 2015
Daihen Corporation
Takashi Shimomoto
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Grant
Impedance matching device provided with reactance-impedance table
Patent number
6,946,847
Issue date
Sep 20, 2005
Daihen Corporation
Yasuhiro Nishimori
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Grant
Impedance matching device
Patent number
6,621,372
Issue date
Sep 16, 2003
Daihen Corporation
Kazuki Kondo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma processing apparatus for radiating microwave from rectangula...
Patent number
5,843,236
Issue date
Dec 1, 1998
Daihen Corporation
Hiroyuki Yoshiki
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
Plasma processing apparatus
Publication number
20190057843
Publication date
Feb 21, 2019
TOKYO ELECTRON LIMITED
Kazushi Kaneko
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
PLASMA PROCESSING METHOD
Publication number
20170372873
Publication date
Dec 28, 2017
TOKYO ELECTRON LIMITED
Norikazu Yamada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
HIGH FREQUENCY MATCHING SYSTEM
Publication number
20150244342
Publication date
Aug 27, 2015
DAIHEN Corporation
Takashi SHIMOMOTO
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Application
PLASMA PROCESSING APPARATUS
Publication number
20150096684
Publication date
Apr 9, 2015
TOKYO ELECTRON LIMITED
Koichi Nagami
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
PLASMA PROCESSING APPARATUS
Publication number
20150000841
Publication date
Jan 1, 2015
TOKYO ELECTRON LIMITED
Norikazu Yamada
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
IMPEDANCE ADJUSTING APPARATUS
Publication number
20140091875
Publication date
Apr 3, 2014
DAIHEN Corporation
Takashi SHIMOMOTO
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Application
Impedance matching device provided with reactance-impedance table
Publication number
20030184319
Publication date
Oct 2, 2003
DAIHEN CORPORATION
Yasuhiro Nishimori
H03 - BASIC ELECTRONIC CIRCUITRY
Information
Patent Application
Impedance matching device
Publication number
20020163398
Publication date
Nov 7, 2002
DAIHEN CORPORATION
Kazuki Kondo
H01 - BASIC ELECTRIC ELEMENTS