Koji Maruyama

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Control method and plasma processing apparatus
- Patent number 12,165,842
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,742,181
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,742,182
- Issue date Aug 29, 2023
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control method and plasma processing apparatus
- Patent number 11,476,089
- Issue date Oct 18, 2022
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 11,170,979
- Issue date Nov 9, 2021
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and temperature control method
- Patent number 11,041,241
- Issue date Jun 22, 2021
- Tokyo Electron Limited
- Akihiro Yokota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 10,553,407
- Issue date Feb 4, 2020
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching layer to be etched
- Patent number 10,347,499
- Issue date Jul 9, 2019
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,685,305
- Issue date Jun 20, 2017
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 9,048,191
- Issue date Jun 2, 2015
- Tokyo Electron Limited
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 9,034,772
- Issue date May 19, 2015
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 8,716,144
- Issue date May 6, 2014
- Tokyo Electron Limited
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and apparatus therefor
- Patent number 8,052,886
- Issue date Nov 8, 2011
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and high-rate plasma etching apparatus
- Patent number 7,682,978
- Issue date Mar 23, 2010
- Tokyo Electron Limited
- Koji Maruyama
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Manufacturing method for membrane member
- Patent number 7,641,806
- Issue date Jan 5, 2010
- Tokyo Electron Limited
- Katsuya Okumura
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,470,998
- Issue date Dec 30, 2008
- Octec Inc.
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and apparatus therefor
- Patent number 7,442,274
- Issue date Oct 28, 2008
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and computer-readable storage medium
- Patent number 7,405,162
- Issue date Jul 29, 2008
- Tokyo Electron Limited
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,335,278
- Issue date Feb 26, 2008
- Tokyo Electron AT Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,084,005
- Issue date Aug 1, 2006
- Octec Inc.
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 6,676,804
- Issue date Jan 13, 2004
- Tokyo Electron AT Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20230377843
- Publication date Nov 23, 2023
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220216036
- Publication date Jul 7, 2022
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220028665
- Publication date Jan 27, 2022
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210327681
- Publication date Oct 21, 2021
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20200411286
- Publication date Dec 31, 2020
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
- Publication number 20200126770
- Publication date Apr 23, 2020
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROL METHOD
- Publication number 20190376185
- Publication date Dec 12, 2019
- TOKYO ELECTRON LIMITED
- Akihiro Yokota
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20190057845
- Publication date Feb 21, 2019
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING LAYER TO BE ETCHED
- Publication number 20180144948
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Koji MARUYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20160163515
- Publication date Jun 9, 2016
- TOKYO ELECTRON LIMITED
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD
- Publication number 20140113450
- Publication date Apr 24, 2014
- TOKYO ELECTRON LIMITED
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20140024221
- Publication date Jan 23, 2014
- TOKYO ELECTRON LIMITED
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20120238098
- Publication date Sep 20, 2012
- TOKYO ELECTRON LIMITED
- Shuichiro Uda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD
- Publication number 20100144157
- Publication date Jun 10, 2010
- TOKYO ELECTRON LIMITED
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING METHOD AND APPARATUS THEREFOR
- Publication number 20090045167
- Publication date Feb 19, 2009
- TOKYO ELECTRON LIMITED
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD
- Publication number 20070202701
- Publication date Aug 30, 2007
- TOKYO ELECTRON LIMITED
- Michiko Nakaya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and high-rate plasma etching apparatus
- Publication number 20060289296
- Publication date Dec 28, 2006
- TOKYO ELECTRON LIMITED
- Koji Maruyama
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Plasma etching method and apparatus therefor
- Publication number 20060213867
- Publication date Sep 28, 2006
- TOKYO ELECTRON LIMITED
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20060154473
- Publication date Jul 13, 2006
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching method and computer-readable storage medium
- Publication number 20060063385
- Publication date Mar 23, 2006
- TOKYO ELECTRON LIMITED
- Koji Maruyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20050172904
- Publication date Aug 11, 2005
- Tokyo Electron AT Limited and Japan Science and Technology Corporation
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20050087853
- Publication date Apr 28, 2005
- Katsuya Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method for membrane member
- Publication number 20040251229
- Publication date Dec 16, 2004
- Katsuya Okumura
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Koji Maruyama

Person

Patents Grantslast 30 patents

Control method and plasma processing apparatus

Control method and plasma processing apparatus

Control method and plasma processing apparatus

Control method and plasma processing apparatus

Plasma etching method and plasma etching apparatus

Plasma processing apparatus and temperature control method

Plasma processing method and plasma processing apparatus

Method for etching layer to be etched

Plasma processing apparatus and plasma processing method

Plasma etching method

Etching method

Method for manufacturing semiconductor device

Plasma etching method and apparatus therefor

Plasma processing method and high-rate plasma etching apparatus

Manufacturing method for membrane member

Semiconductor device and method of manufacturing the same

Plasma etching method and apparatus therefor

Etching method and computer-readable storage medium

Plasma processing apparatus and plasma processing method

Semiconductor device and method of manufacturing the same

Method and apparatus for plasma processing

Patents Applicationslast 30 patents

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

CONTROL METHOD AND PLASMA PROCESSING APPARATUS

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROL METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD FOR ETCHING LAYER TO BE ETCHED

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA ETCHING METHOD

ETCHING METHOD

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

PLASMA ETCHING APPARATUS AND METHOD

PLASMA ETCHING METHOD AND APPARATUS THEREFOR

PLASMA ETCHING APPARATUS AND METHOD

Plasma processing method and high-rate plasma etching apparatus

Plasma etching method and apparatus therefor

Semiconductor device and method of manufacturing the same

Etching method and computer-readable storage medium

Plasma processing apparatus and plasma processing method

Semiconductor device and method of manufacturing the same

Manufacturing method for membrane member