Koji SHIRAKAWA

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical amplification resist composition, and mold preparation met...
- Patent number 9,090,722
- Issue date Jul 28, 2015
- FUJIFILM Corporation
- Toru Fujimori
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Negative resist composition and pattern forming method using the same
- Patent number 9,034,560
- Issue date May 19, 2015
- FUJIFILM Corporation
- Koji Shirakawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 8,900,791
- Issue date Dec 2, 2014
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist pattern forming method, developer and negative chem...
- Patent number 8,637,222
- Issue date Jan 28, 2014
- FUJIFILM Corporation
- Toru Tsuchihashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Organic solvent development or multiple development pattern-forming...
- Patent number 8,546,063
- Issue date Oct 1, 2013
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 8,080,362
- Issue date Dec 20, 2011
- FUJIFILM Corporation
- Koji Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resist composition
- Patent number 7,432,034
- Issue date Oct 7, 2008
- FUJIFILM Corporation
- Shoichiro Yasunami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 7,361,446
- Issue date Apr 22, 2008
- FUJIFILM Corporation
- Koji Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and process for forming pattern using t...
- Patent number 7,332,258
- Issue date Feb 19, 2008
- FUJIFILM Corporation
- Shoichiro Yasunami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive working resist composition
- Patent number 7,326,513
- Issue date Feb 5, 2008
- FUJIFILM Corporation
- Shoichiro Yasunami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working resist composition for electron beams or x-rays
- Patent number 6,887,647
- Issue date May 3, 2005
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition
- Patent number 6,773,862
- Issue date Aug 10, 2004
- Fuji Photo Film Co., Ltd.
- Koji Shirakawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative resist composition
- Patent number 6,746,813
- Issue date Jun 8, 2004
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition to be irradiated with one of an electro...
- Patent number 6,727,040
- Issue date Apr 27, 2004
- Fuji Photo Film Co., Ltd.
- Tomoya Sasaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative-working resist composition
- Patent number 6,673,512
- Issue date Jan 6, 2004
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition
- Patent number 6,489,080
- Issue date Dec 3, 2002
- Fuji Photo Film Co., Ltd.
- Kazuya Uenishi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Image forming method using strippable layer and light-sensitive pol...
- Patent number 5,714,303
- Issue date Feb 3, 1998
- Fuji Photo Film Co., Ltd.
- Hiroaki Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition containing alkali soluble resins a...
- Patent number 5,639,587
- Issue date Jun 17, 1997
- Fuji Photo Film Co., Ltd.
- Kenichiro Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition
- Patent number 5,629,128
- Issue date May 13, 1997
- Fuji Photo Film Co., Ltd.
- Koji Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image forming method using strippable layer and light-sensitive pol...
- Patent number 5,612,167
- Issue date Mar 18, 1997
- Fuji Photo Film Co., Ltd.
- Hiroaki Yokoya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20140227642
- Publication date Aug 14, 2014
- FUJIFILM CORPORATION
- Koji Shirakawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20120094235
- Publication date Apr 19, 2012
- FUJIFILM Corporation
- Toru Tsuchihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION MET...
- Publication number 20120006788
- Publication date Jan 12, 2012
- FUJIFILM CORPORATION
- Toru Fujimori
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...
- Publication number 20120003585
- Publication date Jan 5, 2012
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANIC SOLVENT DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING...
- Publication number 20110300485
- Publication date Dec 8, 2011
- FUJIFILM CORPORATION
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEM...
- Publication number 20110287234
- Publication date Nov 24, 2011
- FUJIFILM CORPORATION
- Toru Tsuchihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
- Publication number 20110171577
- Publication date Jul 14, 2011
- FUJIFILM CORPORATION
- Tomotaka TSUCHIMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
- Publication number 20080241745
- Publication date Oct 2, 2008
- FUJIFILM CORPORATION
- Koji Shirakawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POSITIVE RESIST COMPOSITION
- Publication number 20080096130
- Publication date Apr 24, 2008
- FUJIFILM Corporation
- Koji Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and pattern forming method using the same
- Publication number 20050277060
- Publication date Dec 15, 2005
- Fuji Photo Film Co., Ltd.
- Koji Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and process for forming pattern using t...
- Publication number 20050064327
- Publication date Mar 24, 2005
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20040197702
- Publication date Oct 7, 2004
- Fuji Photo Film Co., Ltd.
- Koji Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive working resist composition
- Publication number 20040175654
- Publication date Sep 9, 2004
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition
- Publication number 20040053160
- Publication date Mar 18, 2004
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition
- Publication number 20040033441
- Publication date Feb 19, 2004
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition
- Publication number 20030203305
- Publication date Oct 30, 2003
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition
- Publication number 20030124456
- Publication date Jul 3, 2003
- Fuji Photo Film Co., Ltd.
- Koji Shirakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative-working resist composition for electron beams or X-rays
- Publication number 20020192592
- Publication date Dec 19, 2002
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive resist composition to be irradiated with one of an electro...
- Publication number 20020136980
- Publication date Sep 26, 2002
- Fuji Photo Film Co., Ltd.
- Tomoya Sasaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
POSITIVE RESIST COMPOSITION
- Publication number 20020015916
- Publication date Feb 7, 2002
- KAZUYA UENISHI
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Koji SHIRAKAWA

Person

Patents Grantslast 30 patents

Chemical amplification resist composition, and mold preparation met...

Negative resist composition and pattern forming method using the same

Actinic ray-sensitive or radiation-sensitive resin composition and...

Negative resist pattern forming method, developer and negative chem...

Organic solvent development or multiple development pattern-forming...

Positive resist composition

Negative resist composition

Positive resist composition

Positive resist composition and process for forming pattern using t...

Positive working resist composition

Negative-working resist composition for electron beams or x-rays

Negative resist composition

Negative resist composition

Positive resist composition to be irradiated with one of an electro...

Negative-working resist composition

Positive resist composition

Image forming method using strippable layer and light-sensitive pol...

Positive photoresist composition containing alkali soluble resins a...

Positive photoresist composition

Image forming method using strippable layer and light-sensitive pol...

Patents Applicationslast 30 patents

NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION MET...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF...

ORGANIC SOLVENT DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING...

NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEM...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

POSITIVE RESIST COMPOSITION

Positive resist composition and pattern forming method using the same

Positive resist composition and process for forming pattern using t...

Positive resist composition

Positive working resist composition

Resist composition

Negative resist composition

Negative resist composition

Negative resist composition

Negative-working resist composition for electron beams or X-rays

Positive resist composition to be irradiated with one of an electro...

POSITIVE RESIST COMPOSITION